IL292787A - Diffraction based overlay metrology tool and method - Google Patents

Diffraction based overlay metrology tool and method

Info

Publication number
IL292787A
IL292787A IL292787A IL29278722A IL292787A IL 292787 A IL292787 A IL 292787A IL 292787 A IL292787 A IL 292787A IL 29278722 A IL29278722 A IL 29278722A IL 292787 A IL292787 A IL 292787A
Authority
IL
Israel
Prior art keywords
grating
diffracted beam
composite grating
image
intensity
Prior art date
Application number
IL292787A
Other languages
Hebrew (he)
Other versions
IL292787B2 (en
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of IL292787A publication Critical patent/IL292787A/en
Publication of IL292787B2 publication Critical patent/IL292787B2/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/706843—Metrology apparatus
    • G03F7/706849—Irradiation branch, e.g. optical system details, illumination mode or polarisation control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Pathology (AREA)
  • Biochemistry (AREA)
  • Immunology (AREA)
  • General Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Claims (21)

- 24 - Claims
1. A method comprising: illuminating a composite grating on a surface of a substrate under a normal angle of incidence, the composite grating comprising first and second gratings with similar pitch; determining a first intensity of a diffracted beam from the composite grating based on a first image of the composite grating; determining a second intensity of a diffracted beam from the composite grating based on a second image of the composite grating; and determining, using an image detector, an overlay error between the first and second gratings based on the first and second determined intensities.
2. The method of claim 1, further comprising: determining an intensity difference between the first intensity and the second intensity, the intensity difference being proportional to the overlay error between the first grating and the second grating.
3. The method of claim 1, wherein: determining the first intensity comprises using pattern recognition to detect the first image of the composite grating obtained by a positive first order diffracted beam, and determining the second intensity comprises using pattern recognition to detect the second image of the composite grating obtained by a negative first order diffracted beam.
4. The method of claim 3, further comprising: blocking diffraction orders other than the first diffraction order.
5. The method of claim 1, wherein: - 25 - determining the first intensity comprises using pattern recognition to detect the first image of the composite grating obtained by a zero order diffracted beam, and determining the second intensity comprises using pattern recognition to detect the second image of the composite grating obtained by a zero order diffracted beam.
6. The method of claim 1, further comprising: illuminating an additional composite grating on the substrate under a normal angle of incidence, wherein: the additional composite grating comprising third and fourth gratings, the third grating and the fourth grating having a substantially identical pitch as the first and the second grating, the composite grating is biased with a first shift in a shift direction along a grating direction, and the additional composite grating is biased with a second shift in the shift direction along the grating direction, the first shift being equal to but with opposite sign than the second shift.
7. The method of claim 6, further comprising: determining a third intensity of a diffracted beam from the additional composite grating based on a third image of the additional composite grating; and determining a fourth intensity of a diffracted beam from the additional composite grating based on a fourth image of the additional composite grating.
8. A detection system comprising: an illumination source configured to direct an illumination beam to diffract from a composite grating on a surface of a substrate under a normal angle of incidence, the composite grating comprising first and second gratings having a similar pitch; an image detector configured to receive a first diffracted beam and a second diffracted beam from the composite grating and determine their intensities based on images of - 26 - the composite grating; a lens arranged along an optical path between the substrate position and the image detector; and an aperture stop, wherein the image detector is further configured to determine an overlay error between the first and second gratings based on the determined intensities of the first and second diffracted beams.
9. The detection system of claim 8, wherein: the first diffracted beam comprises a positive first order diffracted beam and the second diffracted beam comprises a negative first order diffracted beam, and the image detector is configured to use pattern recognition to detect an image of the composite grating using the positive first order diffracted beam and the negative first order diffracted beam.
10. The detection system of claim 8, wherein the image detector is configured to use pattern recognition to detect an image of the composite grating using only a zero order diffraction beam.
11. The detection system of claim 8, wherein: the lens comprises an objective lens adjacent to the surface of the substrate and a projection lens adjacent to the image detector, the aperture stop is arranged along an optical path between the objective lens and the projection lens, and the objective lens has a first numerical aperture value and the aperture stop has a second numerical aperture value, the second numerical aperture value being smaller than the first numerical aperture value. - 27 -
12. The detection system of claim 8, wherein the image detector is further configured to determine an intensity difference between the determined intensities of the first diffracted beam and the second diffracted beam, the intensity difference being proportional to the overlay error between the first grating and the second grating.
13. A lithographic apparatus comprising a detection system, comprising: an illumination source configured to direct an illumination beam to diffract from a composite grating on a surface of a substrate under a normal angle of incidence, the composite grating comprising first and second gratings with similar pitch; an image detector configured to receive a first diffracted beam and a second diffracted beam from the composite grating and determine their intensities based on images of the composite grating; a lens arranged along an optical path between the substrate position and the image detector; and an aperture stop, wherein the image detector is further configured to determine an overlay error between the first and second gratings based on the determined intensities of the first and second diffracted beams.
14. The lithographic apparatus according to claim 13, further comprising: an illumination system configured to condition a beam of radiation; a patterning device support configured to hold a patterning device, the patterning device configured to pattern the beam of radiation to form a patterned beam of radiation; a substrate table configured to hold the substrate; and a projection system configured to projected the patterned beam of radiation onto the substrate.
15. The lithographic apparatus according to claim 13, wherein: - 28 - the first diffracted beam comprises a positive first order diffracted beam and the second diffracted beam comprises a negative first order diffracted beam, and the image detector is configured to detect an image of the composite grating using the positive first order diffracted beam and the negative first order diffracted beam by a pattern recognition method.
16. The lithographic apparatus according to claim 15, wherein the aperture stop is configured to block beams of diffraction order other than the positive first diffraction order and the negative first diffraction order.
17. The lithographic apparatus according to claim 13, wherein the image detector is configured to detect an image of the composite grating using only a zero order diffraction beam by a pattern recognition method.
18. The lithographic apparatus according to claim 13, wherein: the lens comprises an objective lens adjacent to the surface of the substrate and a projection lens adjacent to the image detector, the aperture stop is arranged along an optical path between the objective lens and the projection lens, and the objective lens has a first numerical aperture value and the aperture stop has a second numerical aperture value, the second numerical aperture value being smaller than the first numerical aperture value.
19. The lithographic apparatus according to claim 13, wherein the image detector is further configured to: determine an intensity difference between the determined intensities of the first diffracted beam and the second diffracted beam, the intensity difference being proportional to the overlay error between the first grating and the second grating.
20. A non-transitory computer program product comprising machine-readable instructions, the instructions, upon execution by a computer system, configured to cause the computer system to perform the method of any one of claims 1 to 7. - 29 -
21. A system comprising: the lithographic apparatus according to any one of claims 13 to 19; and the non-transitory computer program product of claim 20.
IL292787A 2007-12-17 2008-12-09 Diffraction based overlay metrology tool and method IL292787B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US607307P 2007-12-17 2007-12-17
PCT/NL2008/050785 WO2009078708A1 (en) 2007-12-17 2008-12-09 Diffraction based overlay metrology tool and method

Publications (2)

Publication Number Publication Date
IL292787A true IL292787A (en) 2022-07-01
IL292787B2 IL292787B2 (en) 2023-06-01

Family

ID=40418855

Family Applications (5)

Application Number Title Priority Date Filing Date
IL298089A IL298089A (en) 2007-12-17 2008-12-09 Diffraction based overlay metrology tool and method
IL270014A IL270014B (en) 2007-12-17 2008-12-09 Diffraction based overlay metrology tool and method
IL292787A IL292787B2 (en) 2007-12-17 2008-12-09 Diffraction based overlay metrology tool and method
IL206290A IL206290A0 (en) 2007-12-17 2010-06-10 Diffraction based overlay metrology tool and method
IL24302015A IL243020B (en) 2007-12-17 2015-12-10 Diffraction based overlay metrology tool and method

Family Applications Before (2)

Application Number Title Priority Date Filing Date
IL298089A IL298089A (en) 2007-12-17 2008-12-09 Diffraction based overlay metrology tool and method
IL270014A IL270014B (en) 2007-12-17 2008-12-09 Diffraction based overlay metrology tool and method

Family Applications After (2)

Application Number Title Priority Date Filing Date
IL206290A IL206290A0 (en) 2007-12-17 2010-06-10 Diffraction based overlay metrology tool and method
IL24302015A IL243020B (en) 2007-12-17 2015-12-10 Diffraction based overlay metrology tool and method

Country Status (10)

Country Link
US (7) US8339595B2 (en)
EP (1) EP2223186B1 (en)
JP (1) JP5232871B2 (en)
KR (11) KR102328016B1 (en)
CN (2) CN101903832A (en)
IL (5) IL298089A (en)
NL (1) NL1036245A1 (en)
SG (2) SG10201607528VA (en)
TW (1) TWI414910B (en)
WO (1) WO2009078708A1 (en)

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