JP2009016761A5

JP2009016761A5 -

Info

Publication number: JP2009016761A5
Application number: JP2007180152A
Authority: JP
Filing date: 2007-07-09
Publication date: 2010-08-26
Anticipated expiration: 2027-07-09

Claims

An adjustment method of a position detection device that includes an optical system including a first optical member and a second optical member that can change positions, and detects the position of a test object,
A setting step of setting a plurality of different positions as positions where the first optical member should be positioned in a direction perpendicular to the optical axis of the optical system;
For each of the plurality of positions set in said setting step, said while moving in the direction of relative the optical axis a test object with respect to the photoelectric conversion element, the photoelectric conversion element via the optical system A detection step for detecting incident light;
A calculation step for calculating an evaluation value indicating the asymmetry of the detection signal of the light detected in the detection step for each of the plurality of positions;
A specifying step of specifying a position in the direction of the optical axis of the object to be tested, in which the evaluation value calculated in the calculating step is insensitive to the plurality of positions;
A position of the second optical member in a direction perpendicular to the optical axis is adjusted based on the evaluation value at a position in the direction of the optical axis of the test object specified in the specifying step. And an adjusting step.

The position of the first optical member in the direction perpendicular to the optical axis is adjusted based on the evaluation value at a position different from the position in the optical axis direction of the test object specified in the specifying step. The adjustment method according to claim 1, further comprising a second adjustment step.

The first optical member includes a light source that emits light for illuminating the object to be examined or an aperture stop disposed on a pupil plane of the optical system,
The second optical member includes an optical member for adjusting the aberration of the optical system,
In the setting step, a plurality of optical axis deviations different from each other are set by setting a position in a direction perpendicular to the optical axis of the light source or the aperture stop,
In the first adjustment step, the aberration of the optical system is adjusted by driving the optical member in a direction perpendicular to the optical axis,
3. The adjustment method according to claim 2, wherein in the second adjustment step, an optical axis shift of the optical system is adjusted by driving the light source or the aperture stop in a direction perpendicular to the optical axis.

The adjustment method according to claim 3, wherein in the first adjustment step, the optical member is driven by a drive unit based on the evaluation value.

The first optical member includes an optical member that adjusts the aberration of the optical system,
The second optical member includes a light source that emits light for illuminating the object to be examined or an aperture stop disposed on a pupil plane of the optical system,
In the setting step, a plurality of different aberrations are set by setting a position of the optical member in a direction perpendicular to the optical axis,
In the first adjustment step, the optical axis deviation of the optical system is adjusted by driving the light source or the aperture stop in a direction perpendicular to the optical axis,
The adjusting method according to claim 2, wherein in the second adjusting step, the aberration of the optical system is adjusted by driving the optical member in a direction perpendicular to the optical axis.

6. The adjustment method according to claim 5, wherein, in the first adjustment step, the light source or the aperture stop is driven by a drive unit based on the evaluation value.

2. The moving step of moving the test object to a position in the direction of the optical axis of the test object specified in the specifying step on the basis of the contrast of the detection signal. Adjustment method.

The method further comprises a moving step of moving the test object to a position in the direction of the optical axis of the test object specified in the specifying step with reference to a position where the contrast of the detection signal is maximum. The adjusting method according to claim 1.

The adjustment method according to claim 3, wherein the test object has a step that is an odd multiple of λ / 4, where λ is a wavelength of light that illuminates the test object.

6. The adjustment method according to claim 5, wherein the test object has a step difference of an odd multiple of λ / 8 where λ is a wavelength of light for illuminating the test object.

An optical system that is used in an exposure apparatus that exposes a substrate through a reticle and includes a first optical member and a second optical member whose positions can be changed, and at least one of the position of the reticle and the position of the substrate is provided. A position detecting device for detecting,
Setting means for setting a plurality of different positions as positions to position the first optical member in a direction perpendicular to the optical axis of the optical system;
For each of the plurality of positions set by the setting means, the optical system is moved while moving a mark indicating the position of the reticle or the position of the substrate relative to the photoelectric conversion element in the direction of the optical axis. detection means for detecting the light incident on the photoelectric conversion element via,
For each of the plurality of positions, calculation means for calculating an evaluation value indicating the asymmetry of the detection signal of the light detected by the detection means;
Specifying means for specifying the position of the mark in the direction of the optical axis where the evaluation value calculated by the calculating means is insensitive to the plurality of positions;
Adjusting means for adjusting the position of the second optical member in the direction perpendicular to the optical axis based on the evaluation value at the position of the mark specified by the specifying means in the direction of the optical axis. A position detecting device characterized by that.

An exposure apparatus that exposes a substrate through a reticle,
An exposure apparatus comprising the position detection apparatus according to claim 11.

Exposing the substrate using the exposure apparatus according to claim 12 ;
And developing the exposed substrate. A device manufacturing method comprising: