JPWO2021131321A1 - - Google Patents

Info

Publication number
JPWO2021131321A1
JPWO2021131321A1 JP2021566875A JP2021566875A JPWO2021131321A1 JP WO2021131321 A1 JPWO2021131321 A1 JP WO2021131321A1 JP 2021566875 A JP2021566875 A JP 2021566875A JP 2021566875 A JP2021566875 A JP 2021566875A JP WO2021131321 A1 JPWO2021131321 A1 JP WO2021131321A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021566875A
Other languages
Japanese (ja)
Other versions
JP7400835B2 (ja
JPWO2021131321A5 (https=
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021131321A1 publication Critical patent/JPWO2021131321A1/ja
Publication of JPWO2021131321A5 publication Critical patent/JPWO2021131321A5/ja
Application granted granted Critical
Publication of JP7400835B2 publication Critical patent/JP7400835B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02—Elements
    • C30B29/06—Silicon
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/10—Crucibles or containers for supporting the melt
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/09—Other methods of shaping glass by fusing powdered glass in a shaping mould
    • C03B19/095—Other methods of shaping glass by fusing powdered glass in a shaping mould by centrifuging, e.g. arc discharge in rotating mould
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/50—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with alkali metals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/54—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with beryllium, magnesium or alkaline earth metals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/50—Doped silica-based glasses containing metals containing alkali metals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/54—Doped silica-based glasses containing metals containing beryllium, magnesium or alkaline earth metals
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Metallurgy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Glass Melting And Manufacturing (AREA)
JP2021566875A 2019-12-23 2020-10-30 石英ガラスルツボ及びその製造方法 Active JP7400835B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019231815 2019-12-23
JP2019231815 2019-12-23
PCT/JP2020/040832 WO2021131321A1 (ja) 2019-12-23 2020-10-30 石英ガラスルツボ及びその製造方法

Publications (3)

Publication Number Publication Date
JPWO2021131321A1 true JPWO2021131321A1 (https=) 2021-07-01
JPWO2021131321A5 JPWO2021131321A5 (https=) 2022-08-09
JP7400835B2 JP7400835B2 (ja) 2023-12-19

Family

ID=76574082

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021566875A Active JP7400835B2 (ja) 2019-12-23 2020-10-30 石英ガラスルツボ及びその製造方法

Country Status (7)

Country Link
US (2) US12371812B2 (https=)
JP (1) JP7400835B2 (https=)
KR (1) KR102723301B1 (https=)
CN (1) CN114846180B (https=)
DE (1) DE112020006320T5 (https=)
TW (1) TWI762073B (https=)
WO (1) WO2021131321A1 (https=)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1143392A (ja) * 1997-07-24 1999-02-16 Kusuwa Kuorutsu:Kk 単結晶引き上げ用石英ガラスルツボの洗浄方法
JP2010280567A (ja) * 2010-09-17 2010-12-16 Covalent Materials Corp シリカガラスルツボの製造方法
JP2012136379A (ja) * 2010-12-27 2012-07-19 Covalent Materials Corp シリカガラスルツボ

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2840195B2 (ja) 1994-05-31 1998-12-24 信越石英株式会社 単結晶引上用石英ガラスルツボの製造方法
JP3552401B2 (ja) 1996-03-22 2004-08-11 信越半導体株式会社 ルツボの洗浄方法
JP4437368B2 (ja) * 2000-12-12 2010-03-24 コバレントマテリアル株式会社 シリコン単結晶引上げ用石英ガラスルツボの製造方法
JP4233059B2 (ja) 2003-05-01 2009-03-04 信越石英株式会社 シリコン単結晶引上げ用石英ガラスルツボ及びその製造方法
JP2005306708A (ja) 2004-03-26 2005-11-04 Kuramoto Seisakusho Co Ltd 石英ルツボ
JP4995069B2 (ja) 2007-12-28 2012-08-08 ジャパンスーパークォーツ株式会社 内面結晶化ルツボおよび該ルツボを用いた引上げ方法
JP5072933B2 (ja) 2008-10-31 2012-11-14 ジャパンスーパークォーツ株式会社 シリコン単結晶引き上げ用石英ガラスルツボ及びその製造方法並びにシリコン単結晶の製造方法
JP5500689B2 (ja) * 2010-12-03 2014-05-21 株式会社Ｓｕｍｃｏ シリカガラスルツボ
JP5508251B2 (ja) 2010-12-24 2014-05-28 コバレントマテリアル株式会社 シリコン単結晶引上げ用シリカガラスルツボの洗浄方法
JP5543326B2 (ja) 2010-12-27 2014-07-09 コバレントマテリアル株式会社 シリコン単結晶引上げ用シリカガラスルツボ
CN103502513A (zh) * 2012-01-13 2014-01-08 信越石英株式会社 单晶硅提拉用二氧化硅容器及其制造方法
JP6773121B2 (ja) * 2016-09-23 2020-10-21 株式会社Sumco 石英ガラスルツボ及びその製造方法並びに石英ガラスルツボを用いたシリコン単結晶の製造方法
JP6885287B2 (ja) * 2017-09-29 2021-06-09 株式会社Sumco 石英ルツボの不純物分析方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1143392A (ja) * 1997-07-24 1999-02-16 Kusuwa Kuorutsu:Kk 単結晶引き上げ用石英ガラスルツボの洗浄方法
JP2010280567A (ja) * 2010-09-17 2010-12-16 Covalent Materials Corp シリカガラスルツボの製造方法
JP2012136379A (ja) * 2010-12-27 2012-07-19 Covalent Materials Corp シリカガラスルツボ

Also Published As

Publication number Publication date
US20230010489A1 (en) 2023-01-12
US20250313985A1 (en) 2025-10-09
KR102723301B1 (ko) 2024-10-31
JP7400835B2 (ja) 2023-12-19
KR20220107274A (ko) 2022-08-02
TW202129089A (zh) 2021-08-01
CN114846180B (zh) 2024-07-05
US12371812B2 (en) 2025-07-29
TWI762073B (zh) 2022-04-21
CN114846180A (zh) 2022-08-02
WO2021131321A1 (ja) 2021-07-01
DE112020006320T5 (de) 2022-10-06

Similar Documents

Publication Publication Date Title
BR112019017762A2 (https=)
BR112021017339A2 (https=)
BR112021018450A2 (https=)
BR112021017637A2 (https=)
BR112021017892A2 (https=)
BR112021017782A2 (https=)
BR112021016821A2 (https=)
BR112021017939A2 (https=)
BR112021017738A2 (https=)
BR112021016996A2 (https=)
BR112021008711A2 (https=)
BR112019016141A2 (https=)
BR112021017728A2 (https=)
BR112021013944A2 (https=)
BR112021018452A2 (https=)
BR112021017703A2 (https=)
BR112021018102A2 (https=)
BR112019016142A2 (https=)
BR112019016138A2 (https=)
BR112021017732A2 (https=)
BR112021017234A2 (https=)
BR112021017355A2 (https=)
BR112021018168A2 (https=)
BR112021018093A2 (https=)
BR112021017173A2 (https=)

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20220603

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20220603

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20221227

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20230203

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20230530

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20230621

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20230912

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20231006

A911 Transfer to examiner for re-examination before appeal (zenchi)

Free format text: JAPANESE INTERMEDIATE CODE: A911

Effective date: 20231016

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20231107

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20231120

R150 Certificate of patent or registration of utility model

Ref document number: 7400835

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150