JPWO2021100144A5 - - Google Patents

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JPWO2021100144A5
JPWO2021100144A5 JP2021558094A JP2021558094A JPWO2021100144A5 JP WO2021100144 A5 JPWO2021100144 A5 JP WO2021100144A5 JP 2021558094 A JP2021558094 A JP 2021558094A JP 2021558094 A JP2021558094 A JP 2021558094A JP WO2021100144 A5 JPWO2021100144 A5 JP WO2021100144A5
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Japan
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lamella
analysis
width
cutting portion
sample
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JP2021558094A
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Japanese (ja)
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JPWO2021100144A1 (https=
JP7389817B2 (ja
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Priority claimed from PCT/JP2019/045433 external-priority patent/WO2021100144A1/ja
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JP2021558094A 2019-11-20 2019-11-20 ラメラの作製方法、解析システムおよび試料の解析方法 Active JP7389817B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2019/045433 WO2021100144A1 (ja) 2019-11-20 2019-11-20 ラメラの作製方法、解析システムおよび試料の解析方法

Publications (3)

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JPWO2021100144A1 JPWO2021100144A1 (https=) 2021-05-27
JPWO2021100144A5 true JPWO2021100144A5 (https=) 2022-08-09
JP7389817B2 JP7389817B2 (ja) 2023-11-30

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JP2021558094A Active JP7389817B2 (ja) 2019-11-20 2019-11-20 ラメラの作製方法、解析システムおよび試料の解析方法

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US (1) US12176180B2 (https=)
JP (1) JP7389817B2 (https=)
KR (1) KR102942497B1 (https=)
TW (1) TWI761997B (https=)
WO (1) WO2021100144A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230096171A (ko) 2021-12-22 2023-06-30 삼성전자주식회사 반도체 소자 검사 장치 및 이를 이용한 반도체 소자 검사 방법
JPWO2024134744A1 (https=) * 2022-12-20 2024-06-27

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06129962A (ja) * 1992-10-16 1994-05-13 Mitsubishi Electric Corp 透過形電子顕微鏡用試料
JP2001015058A (ja) * 1999-04-28 2001-01-19 Jeol Ltd 走査型荷電粒子ビーム装置における試料像観察方法及び装置
US6727911B1 (en) 1999-04-28 2004-04-27 Jeol Ltd. Method and apparatus for observing specimen image on scanning charged-particle beam instrument
JP2001124676A (ja) * 1999-10-25 2001-05-11 Hitachi Ltd 電子顕微鏡観察用試料支持部材
KR20030016910A (ko) 2001-08-23 2003-03-03 삼성전자주식회사 투과전자현미경 분석시료 및 그 제조 방법
KR20040031279A (ko) 2002-10-04 2004-04-13 삼성전자주식회사 투과 전자현미경 분석용 시편 제조방법
JP3768197B2 (ja) 2003-02-28 2006-04-19 株式会社東芝 透過型電子顕微鏡観察試料の作製方法
JP4517867B2 (ja) 2005-01-31 2010-08-04 株式会社Sumco シリコンウェーハ表面形状制御用エッチング液及び該エッチング液を用いたシリコンウェーハの製造方法
JP5039962B2 (ja) 2007-11-06 2012-10-03 エスアイアイ・ナノテクノロジー株式会社 透過電子顕微鏡用試料作製方法及び荷電粒子ビーム装置
EP2151848A1 (en) * 2008-08-07 2010-02-10 FEI Company Method of machining a work piece with a focused particle beam
KR101109848B1 (ko) * 2010-03-30 2012-02-14 현대제철 주식회사 전자 탐침 미소 분석기용 시편 홀더 장치
US9281163B2 (en) 2014-04-14 2016-03-08 Fei Company High capacity TEM grid
US20150369710A1 (en) * 2014-06-24 2015-12-24 Fei Company Method and System of Creating a Symmetrical FIB Deposition
EP3153838B1 (de) * 2015-10-06 2022-07-06 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur präparation einer probe für die mikrostrukturdiagnostik sowie probe für die mikrostrukturdiagnostik
TW201903870A (zh) 2017-06-01 2019-01-16 鈦昇科技股份有限公司 晶圓切割方法
US10930514B2 (en) * 2018-06-11 2021-02-23 Fei Company Method and apparatus for the planarization of surfaces
US11088036B2 (en) * 2018-07-31 2021-08-10 Taiwan Semiconductor Manufacturing Co., Ltd. Atom probe tomography specimen preparation

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