JPWO2021100144A1 - - Google Patents

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Publication number
JPWO2021100144A1
JPWO2021100144A1 JP2021558094A JP2021558094A JPWO2021100144A1 JP WO2021100144 A1 JPWO2021100144 A1 JP WO2021100144A1 JP 2021558094 A JP2021558094 A JP 2021558094A JP 2021558094 A JP2021558094 A JP 2021558094A JP WO2021100144 A1 JPWO2021100144 A1 JP WO2021100144A1
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2021558094A
Other languages
Japanese (ja)
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JP7389817B2 (ja
JPWO2021100144A5 (https=
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Publication of JPWO2021100144A1 publication Critical patent/JPWO2021100144A1/ja
Publication of JPWO2021100144A5 publication Critical patent/JPWO2021100144A5/ja
Application granted granted Critical
Publication of JP7389817B2 publication Critical patent/JP7389817B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/20Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00Sampling; Preparing specimens for investigation
    • G01N1/28Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00Sampling; Preparing specimens for investigation
    • G01N1/28Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G01N1/286Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q involving mechanical work, e.g. chopping, disintegrating, compacting, homogenising
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00Sampling; Preparing specimens for investigation
    • G01N1/28Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G01N1/32Polishing; Etching
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/2202Preparing specimens therefor
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/2204Specimen supports therefor; Sample conveying means therefore
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G01N23/2251Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00Sampling; Preparing specimens for investigation
    • G01N1/28Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G01N1/286Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q involving mechanical work, e.g. chopping, disintegrating, compacting, homogenising
    • G01N2001/2873Cutting or cleaving
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02Details
    • H01J2237/0203Protection arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2007Holding mechanisms
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/201Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated for mounting multiple objects
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/208Elements or methods for movement independent of sample stage for influencing or moving or contacting or transferring the sample or parts thereof, e.g. prober needles or transfer needles in FIB/SEM systems
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30Electron or ion beam tubes for processing objects
    • H01J2237/317Processing objects on a microscale
    • H01J2237/3174Etching microareas
    • H01J2237/31745Etching microareas for preparing specimen to be viewed in microscopes or analyzed in microanalysers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Plasma & Fusion (AREA)
  • Engineering & Computer Science (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Sampling And Sample Adjustment (AREA)
JP2021558094A 2019-11-20 2019-11-20 ラメラの作製方法、解析システムおよび試料の解析方法 Active JP7389817B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2019/045433 WO2021100144A1 (ja) 2019-11-20 2019-11-20 ラメラの作製方法、解析システムおよび試料の解析方法

Publications (3)

Publication Number Publication Date
JPWO2021100144A1 true JPWO2021100144A1 (https=) 2021-05-27
JPWO2021100144A5 JPWO2021100144A5 (https=) 2022-08-09
JP7389817B2 JP7389817B2 (ja) 2023-11-30

Family

ID=75980416

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021558094A Active JP7389817B2 (ja) 2019-11-20 2019-11-20 ラメラの作製方法、解析システムおよび試料の解析方法

Country Status (5)

Country Link
US (1) US12176180B2 (https=)
JP (1) JP7389817B2 (https=)
KR (1) KR102942497B1 (https=)
TW (1) TWI761997B (https=)
WO (1) WO2021100144A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230096171A (ko) 2021-12-22 2023-06-30 삼성전자주식회사 반도체 소자 검사 장치 및 이를 이용한 반도체 소자 검사 방법
JPWO2024134744A1 (https=) * 2022-12-20 2024-06-27

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06129962A (ja) * 1992-10-16 1994-05-13 Mitsubishi Electric Corp 透過形電子顕微鏡用試料
JP2001015058A (ja) * 1999-04-28 2001-01-19 Jeol Ltd 走査型荷電粒子ビーム装置における試料像観察方法及び装置
JP2004264145A (ja) * 2003-02-28 2004-09-24 Toshiba Corp 透過型電子顕微鏡観察試料の作製方法
KR20110108988A (ko) * 2010-03-30 2011-10-06 현대제철 주식회사 전자 탐침 미소 분석기용 시편 홀더 장치
JP2017072596A (ja) * 2015-10-06 2017-04-13 フラウンホファー ゲセルシャフト ツール フェールデルンク ダー アンゲヴァンテン フォルシュンク エー.ファオ. 微細構造診断のための試料を作製する方法及び微細構造診断用の試料

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6727911B1 (en) 1999-04-28 2004-04-27 Jeol Ltd. Method and apparatus for observing specimen image on scanning charged-particle beam instrument
JP2001124676A (ja) * 1999-10-25 2001-05-11 Hitachi Ltd 電子顕微鏡観察用試料支持部材
KR20030016910A (ko) 2001-08-23 2003-03-03 삼성전자주식회사 투과전자현미경 분석시료 및 그 제조 방법
KR20040031279A (ko) 2002-10-04 2004-04-13 삼성전자주식회사 투과 전자현미경 분석용 시편 제조방법
JP4517867B2 (ja) 2005-01-31 2010-08-04 株式会社Sumco シリコンウェーハ表面形状制御用エッチング液及び該エッチング液を用いたシリコンウェーハの製造方法
JP5039962B2 (ja) 2007-11-06 2012-10-03 エスアイアイ・ナノテクノロジー株式会社 透過電子顕微鏡用試料作製方法及び荷電粒子ビーム装置
EP2151848A1 (en) * 2008-08-07 2010-02-10 FEI Company Method of machining a work piece with a focused particle beam
US9281163B2 (en) 2014-04-14 2016-03-08 Fei Company High capacity TEM grid
US20150369710A1 (en) * 2014-06-24 2015-12-24 Fei Company Method and System of Creating a Symmetrical FIB Deposition
TW201903870A (zh) 2017-06-01 2019-01-16 鈦昇科技股份有限公司 晶圓切割方法
US10930514B2 (en) * 2018-06-11 2021-02-23 Fei Company Method and apparatus for the planarization of surfaces
US11088036B2 (en) * 2018-07-31 2021-08-10 Taiwan Semiconductor Manufacturing Co., Ltd. Atom probe tomography specimen preparation

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06129962A (ja) * 1992-10-16 1994-05-13 Mitsubishi Electric Corp 透過形電子顕微鏡用試料
JP2001015058A (ja) * 1999-04-28 2001-01-19 Jeol Ltd 走査型荷電粒子ビーム装置における試料像観察方法及び装置
JP2004264145A (ja) * 2003-02-28 2004-09-24 Toshiba Corp 透過型電子顕微鏡観察試料の作製方法
KR20110108988A (ko) * 2010-03-30 2011-10-06 현대제철 주식회사 전자 탐침 미소 분석기용 시편 홀더 장치
JP2017072596A (ja) * 2015-10-06 2017-04-13 フラウンホファー ゲセルシャフト ツール フェールデルンク ダー アンゲヴァンテン フォルシュンク エー.ファオ. 微細構造診断のための試料を作製する方法及び微細構造診断用の試料

Also Published As

Publication number Publication date
TWI761997B (zh) 2022-04-21
TW202121473A (zh) 2021-06-01
US20220367144A1 (en) 2022-11-17
KR102942497B1 (ko) 2026-03-24
WO2021100144A1 (ja) 2021-05-27
KR20220073799A (ko) 2022-06-03
JP7389817B2 (ja) 2023-11-30
US12176180B2 (en) 2024-12-24

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