JP7389817B2 - ラメラの作製方法、解析システムおよび試料の解析方法 - Google Patents
ラメラの作製方法、解析システムおよび試料の解析方法 Download PDFInfo
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- JP7389817B2 JP7389817B2 JP2021558094A JP2021558094A JP7389817B2 JP 7389817 B2 JP7389817 B2 JP 7389817B2 JP 2021558094 A JP2021558094 A JP 2021558094A JP 2021558094 A JP2021558094 A JP 2021558094A JP 7389817 B2 JP7389817 B2 JP 7389817B2
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N1/00—Sampling; Preparing specimens for investigation
- G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N1/00—Sampling; Preparing specimens for investigation
- G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
- G01N1/286—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q involving mechanical work, e.g. chopping, disintegrating, compacting, homogenising
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N1/00—Sampling; Preparing specimens for investigation
- G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
- G01N1/32—Polishing; Etching
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/2202—Preparing specimens therefor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/2204—Specimen supports therefor; Sample conveying means therefore
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
- G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N1/00—Sampling; Preparing specimens for investigation
- G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
- G01N1/286—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q involving mechanical work, e.g. chopping, disintegrating, compacting, homogenising
- G01N2001/2873—Cutting or cleaving
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/02—Details
- H01J2237/0203—Protection arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/2007—Holding mechanisms
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/201—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated for mounting multiple objects
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/208—Elements or methods for movement independent of sample stage for influencing or moving or contacting or transferring the sample or parts thereof, e.g. prober needles or transfer needles in FIB/SEM systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3174—Etching microareas
- H01J2237/31745—Etching microareas for preparing specimen to be viewed in microscopes or analyzed in microanalysers
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Plasma & Fusion (AREA)
- Engineering & Computer Science (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Sampling And Sample Adjustment (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2019/045433 WO2021100144A1 (ja) | 2019-11-20 | 2019-11-20 | ラメラの作製方法、解析システムおよび試料の解析方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2021100144A1 JPWO2021100144A1 (https=) | 2021-05-27 |
| JPWO2021100144A5 JPWO2021100144A5 (https=) | 2022-08-09 |
| JP7389817B2 true JP7389817B2 (ja) | 2023-11-30 |
Family
ID=75980416
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021558094A Active JP7389817B2 (ja) | 2019-11-20 | 2019-11-20 | ラメラの作製方法、解析システムおよび試料の解析方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US12176180B2 (https=) |
| JP (1) | JP7389817B2 (https=) |
| KR (1) | KR102942497B1 (https=) |
| TW (1) | TWI761997B (https=) |
| WO (1) | WO2021100144A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20230096171A (ko) | 2021-12-22 | 2023-06-30 | 삼성전자주식회사 | 반도체 소자 검사 장치 및 이를 이용한 반도체 소자 검사 방법 |
| JPWO2024134744A1 (https=) * | 2022-12-20 | 2024-06-27 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001015058A (ja) | 1999-04-28 | 2001-01-19 | Jeol Ltd | 走査型荷電粒子ビーム装置における試料像観察方法及び装置 |
| JP2004264145A (ja) | 2003-02-28 | 2004-09-24 | Toshiba Corp | 透過型電子顕微鏡観察試料の作製方法 |
| JP2017072596A (ja) | 2015-10-06 | 2017-04-13 | フラウンホファー ゲセルシャフト ツール フェールデルンク ダー アンゲヴァンテン フォルシュンク エー.ファオ. | 微細構造診断のための試料を作製する方法及び微細構造診断用の試料 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06129962A (ja) * | 1992-10-16 | 1994-05-13 | Mitsubishi Electric Corp | 透過形電子顕微鏡用試料 |
| US6727911B1 (en) | 1999-04-28 | 2004-04-27 | Jeol Ltd. | Method and apparatus for observing specimen image on scanning charged-particle beam instrument |
| JP2001124676A (ja) * | 1999-10-25 | 2001-05-11 | Hitachi Ltd | 電子顕微鏡観察用試料支持部材 |
| KR20030016910A (ko) | 2001-08-23 | 2003-03-03 | 삼성전자주식회사 | 투과전자현미경 분석시료 및 그 제조 방법 |
| KR20040031279A (ko) | 2002-10-04 | 2004-04-13 | 삼성전자주식회사 | 투과 전자현미경 분석용 시편 제조방법 |
| JP4517867B2 (ja) | 2005-01-31 | 2010-08-04 | 株式会社Sumco | シリコンウェーハ表面形状制御用エッチング液及び該エッチング液を用いたシリコンウェーハの製造方法 |
| JP5039962B2 (ja) | 2007-11-06 | 2012-10-03 | エスアイアイ・ナノテクノロジー株式会社 | 透過電子顕微鏡用試料作製方法及び荷電粒子ビーム装置 |
| EP2151848A1 (en) * | 2008-08-07 | 2010-02-10 | FEI Company | Method of machining a work piece with a focused particle beam |
| KR101109848B1 (ko) * | 2010-03-30 | 2012-02-14 | 현대제철 주식회사 | 전자 탐침 미소 분석기용 시편 홀더 장치 |
| US9281163B2 (en) | 2014-04-14 | 2016-03-08 | Fei Company | High capacity TEM grid |
| US20150369710A1 (en) * | 2014-06-24 | 2015-12-24 | Fei Company | Method and System of Creating a Symmetrical FIB Deposition |
| TW201903870A (zh) | 2017-06-01 | 2019-01-16 | 鈦昇科技股份有限公司 | 晶圓切割方法 |
| US10930514B2 (en) * | 2018-06-11 | 2021-02-23 | Fei Company | Method and apparatus for the planarization of surfaces |
| US11088036B2 (en) * | 2018-07-31 | 2021-08-10 | Taiwan Semiconductor Manufacturing Co., Ltd. | Atom probe tomography specimen preparation |
-
2019
- 2019-11-20 JP JP2021558094A patent/JP7389817B2/ja active Active
- 2019-11-20 US US17/773,433 patent/US12176180B2/en active Active
- 2019-11-20 KR KR1020227014384A patent/KR102942497B1/ko active Active
- 2019-11-20 WO PCT/JP2019/045433 patent/WO2021100144A1/ja not_active Ceased
-
2020
- 2020-10-20 TW TW109136231A patent/TWI761997B/zh active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001015058A (ja) | 1999-04-28 | 2001-01-19 | Jeol Ltd | 走査型荷電粒子ビーム装置における試料像観察方法及び装置 |
| JP2004264145A (ja) | 2003-02-28 | 2004-09-24 | Toshiba Corp | 透過型電子顕微鏡観察試料の作製方法 |
| JP2017072596A (ja) | 2015-10-06 | 2017-04-13 | フラウンホファー ゲセルシャフト ツール フェールデルンク ダー アンゲヴァンテン フォルシュンク エー.ファオ. | 微細構造診断のための試料を作製する方法及び微細構造診断用の試料 |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI761997B (zh) | 2022-04-21 |
| TW202121473A (zh) | 2021-06-01 |
| US20220367144A1 (en) | 2022-11-17 |
| KR102942497B1 (ko) | 2026-03-24 |
| WO2021100144A1 (ja) | 2021-05-27 |
| JPWO2021100144A1 (https=) | 2021-05-27 |
| KR20220073799A (ko) | 2022-06-03 |
| US12176180B2 (en) | 2024-12-24 |
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