JPWO2021090794A5 - - Google Patents
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- JPWO2021090794A5 JPWO2021090794A5 JP2021554934A JP2021554934A JPWO2021090794A5 JP WO2021090794 A5 JPWO2021090794 A5 JP WO2021090794A5 JP 2021554934 A JP2021554934 A JP 2021554934A JP 2021554934 A JP2021554934 A JP 2021554934A JP WO2021090794 A5 JPWO2021090794 A5 JP WO2021090794A5
- Authority
- JP
- Japan
- Prior art keywords
- gas
- film
- reaction vessel
- ald
- reaction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019201441 | 2019-11-06 | ||
| JP2019201441 | 2019-11-06 | ||
| PCT/JP2020/041016 WO2021090794A1 (ja) | 2019-11-06 | 2020-11-02 | 成膜方法及び成膜装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2021090794A1 JPWO2021090794A1 (https=) | 2021-05-14 |
| JPWO2021090794A5 true JPWO2021090794A5 (https=) | 2022-03-17 |
| JP7112793B2 JP7112793B2 (ja) | 2022-08-04 |
Family
ID=75848503
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021554934A Expired - Fee Related JP7112793B2 (ja) | 2019-11-06 | 2020-11-02 | 成膜方法及び成膜装置 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20220259732A1 (https=) |
| EP (1) | EP4056731A4 (https=) |
| JP (1) | JP7112793B2 (https=) |
| KR (1) | KR20220097444A (https=) |
| CN (1) | CN114651087A (https=) |
| TW (1) | TW202124761A (https=) |
| WO (1) | WO2021090794A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7039085B1 (ja) * | 2021-08-30 | 2022-03-22 | 株式会社クリエイティブコーティングス | 成膜装置 |
| CN113862644A (zh) * | 2021-09-22 | 2021-12-31 | 江苏微导纳米科技股份有限公司 | 镀膜设备 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6482733B2 (en) | 2000-05-15 | 2002-11-19 | Asm Microchemistry Oy | Protective layers prior to alternating layer deposition |
| CN101657564A (zh) * | 2007-02-12 | 2010-02-24 | 莲花应用技术有限责任公司 | 用原子层沉积制备复合材料 |
| US8017182B2 (en) * | 2007-06-21 | 2011-09-13 | Asm International N.V. | Method for depositing thin films by mixed pulsed CVD and ALD |
| JP5513767B2 (ja) * | 2008-06-25 | 2014-06-04 | 株式会社日立国際電気 | 半導体装置の製造方法、基板処理方法、基板処理装置および半導体装置 |
| JP5801916B2 (ja) | 2008-06-25 | 2015-10-28 | 株式会社日立国際電気 | 半導体装置の製造方法、基板処理方法、および基板処理装置 |
| WO2013046157A1 (en) * | 2011-09-27 | 2013-04-04 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Nickel bis diazabutadiene precursors, their synthesis, and their use for nickel containing film depositions |
| EP2628817B1 (en) | 2012-02-15 | 2016-11-02 | IHI Hauzer Techno Coating B.V. | A coated article of martensitic steel and a method of forming a coated article of steel |
| JP2014135311A (ja) | 2013-01-08 | 2014-07-24 | Ps4 Luxco S A R L | 半導体装置 |
| JP2014229680A (ja) * | 2013-05-21 | 2014-12-08 | ピーエスフォー ルクスコ エスエイアールエルＰＳ４ Ｌｕｘｃｏ Ｓ．ａ．ｒ．ｌ． | 半導体装置及びその製造方法 |
| WO2015145486A1 (ja) | 2014-03-28 | 2015-10-01 | 国立大学法人東北大学 | プラズマ処理装置およびプラズマ処理方法 |
| JP6486696B2 (ja) | 2015-01-15 | 2019-03-20 | 国立大学法人山形大学 | 薄膜堆積方法及び薄膜堆積装置 |
| US10573522B2 (en) * | 2016-08-16 | 2020-02-25 | Lam Research Corporation | Method for preventing line bending during metal fill process |
| US10049911B2 (en) * | 2016-09-16 | 2018-08-14 | Lam Research Corporation | Temporally pulsed and kinetically modulated CVD dielectrics for gapfill applications |
| JP6935667B2 (ja) | 2016-10-07 | 2021-09-15 | 東京エレクトロン株式会社 | 成膜方法 |
-
2020
- 2020-11-02 WO PCT/JP2020/041016 patent/WO2021090794A1/ja not_active Ceased
- 2020-11-02 CN CN202080076110.XA patent/CN114651087A/zh active Pending
- 2020-11-02 EP EP20885070.1A patent/EP4056731A4/en not_active Withdrawn
- 2020-11-02 JP JP2021554934A patent/JP7112793B2/ja not_active Expired - Fee Related
- 2020-11-02 KR KR1020227018405A patent/KR20220097444A/ko not_active Withdrawn
- 2020-11-05 TW TW109138560A patent/TW202124761A/zh unknown
-
2022
- 2022-05-03 US US17/735,897 patent/US20220259732A1/en not_active Abandoned
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