JPWO2021054413A1 - - Google Patents
Info
- Publication number
- JPWO2021054413A1 JPWO2021054413A1 JP2021546959A JP2021546959A JPWO2021054413A1 JP WO2021054413 A1 JPWO2021054413 A1 JP WO2021054413A1 JP 2021546959 A JP2021546959 A JP 2021546959A JP 2021546959 A JP2021546959 A JP 2021546959A JP WO2021054413 A1 JPWO2021054413 A1 JP WO2021054413A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
- C03C17/30—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with silicon-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C21/00—Acyclic unsaturated compounds containing halogen atoms
- C07C21/02—Acyclic unsaturated compounds containing halogen atoms containing carbon-to-carbon double bonds
- C07C21/215—Halogenated polyenes with more than two carbon-to-carbon double bonds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C33/00—Unsaturated compounds having hydroxy or O-metal groups bound to acyclic carbon atoms
- C07C33/02—Acyclic alcohols with carbon-to-carbon double bonds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C43/00—Ethers; Compounds having groups, groups or groups
- C07C43/02—Ethers
- C07C43/03—Ethers having all ether-oxygen atoms bound to acyclic carbon atoms
- C07C43/14—Unsaturated ethers
- C07C43/17—Unsaturated ethers containing halogen
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/52—Esters of acyclic unsaturated carboxylic acids having the esterified carboxyl group bound to an acyclic carbon atom
- C07C69/587—Monocarboxylic acid esters having at least two carbon-to-carbon double bonds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F3/00—Compounds containing elements of Groups 2 or 12 of the Periodic System
- C07F3/02—Magnesium compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
- C07F7/1872—Preparation; Treatments not provided for in C07F7/20
- C07F7/1876—Preparation; Treatments not provided for in C07F7/20 by reactions involving the formation of Si-C linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/002—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds
- C08G65/005—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens
- C08G65/007—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/32—Polymers modified by chemical after-treatment
- C08G65/329—Polymers modified by chemical after-treatment with organic compounds
- C08G65/336—Polymers modified by chemical after-treatment with organic compounds containing silicon
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D171/00—Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D171/00—Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
- C09D171/02—Polyalkylene oxides
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/76—Hydrophobic and oleophobic coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/78—Coatings specially designed to be durable, e.g. scratch-resistant
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/151—Deposition methods from the vapour phase by vacuum evaporation
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019171550 | 2019-09-20 | ||
PCT/JP2020/035358 WO2021054413A1 (ja) | 2019-09-20 | 2020-09-17 | 含フッ素エーテル化合物、表面処理剤、含フッ素エーテル組成物、コーティング液、物品、及び化合物 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPWO2021054413A1 true JPWO2021054413A1 (ja) | 2021-03-25 |
Family
ID=74884050
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2021546959A Pending JPWO2021054413A1 (ja) | 2019-09-20 | 2020-09-17 |
Country Status (7)
Country | Link |
---|---|
US (1) | US20220213345A1 (ja) |
EP (1) | EP4032933A4 (ja) |
JP (1) | JPWO2021054413A1 (ja) |
KR (1) | KR20220066125A (ja) |
CN (1) | CN114450325A (ja) |
TW (1) | TW202124522A (ja) |
WO (1) | WO2021054413A1 (ja) |
Family Cites Families (45)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6118901A (ja) * | 1984-07-06 | 1986-01-27 | Asahi Glass Co Ltd | 低反射加工剤 |
JPH07278547A (ja) * | 1994-04-08 | 1995-10-24 | Idemitsu Kosan Co Ltd | 強誘電性高分子液晶組成物 |
JP2874715B2 (ja) | 1995-08-11 | 1999-03-24 | ダイキン工業株式会社 | ケイ素含有有機含フッ素ポリマー及びその製造方法 |
IT1290462B1 (it) | 1997-04-08 | 1998-12-03 | Ausimont Spa | Polimeri idrogenati modificati |
JPH1129585A (ja) | 1997-07-04 | 1999-02-02 | Shin Etsu Chem Co Ltd | パーフルオロポリエーテル変性アミノシラン及び表面処理剤 |
US6277485B1 (en) | 1998-01-27 | 2001-08-21 | 3M Innovative Properties Company | Antisoiling coatings for antireflective surfaces and methods of preparation |
JP4733798B2 (ja) | 1998-01-31 | 2011-07-27 | 凸版印刷株式会社 | 防汚剤、防汚層の形成方法、光学部材、反射防止光学部材、光学機能性部材及び表示装置 |
JP3601580B2 (ja) | 1999-05-20 | 2004-12-15 | 信越化学工業株式会社 | パーフルオロポリエーテル変性アミノシラン及び表面処理剤並びに該アミノシランの被膜が形成された物品 |
CN101736346A (zh) | 2008-11-24 | 2010-06-16 | 3M创新有限公司 | 在不锈钢表面形成易清洁层的制品及其制备方法 |
WO2011059430A1 (en) | 2009-11-11 | 2011-05-19 | Essilor International | Surface treatment composition, process for producing the same, and surface-treated article |
JP5235026B2 (ja) | 2010-09-28 | 2013-07-10 | 信越化学工業株式会社 | フルオロオキシアルキレン基含有ポリマー組成物および該組成物を含む表面処理剤並びに該表面処理剤で表面処理された物品 |
EP2638116B1 (en) | 2010-11-10 | 2015-08-12 | 3M Innovative Properties Company | Optical device surface treatment process and smudge-resistant article produced thereby |
JP6107659B2 (ja) | 2011-09-21 | 2017-04-05 | 旭硝子株式会社 | 含フッ素エーテル化合物、コーティング液、および表面処理層を有する基材の製造方法 |
JP6127985B2 (ja) | 2012-02-17 | 2017-05-17 | 旭硝子株式会社 | 含フッ素エーテル化合物、含フッ素エーテル組成物およびコーティング液、ならびに表面処理層を有する基材およびその製造方法 |
TWI586705B (zh) | 2012-02-17 | 2017-06-11 | Asahi Glass Co Ltd | A fluorine-containing ether compound, a fluorine-containing ether composition and a coating liquid, and a substrate having a surface treatment layer and a method for producing the same (II) |
CN104114565B (zh) | 2012-02-17 | 2016-10-26 | 旭硝子株式会社 | 含氟醚化合物、含氟醚组合物及涂覆液以及具有表面处理层的基材及其制造方法 |
JP2014070163A (ja) | 2012-09-28 | 2014-04-21 | Fujifilm Corp | 表面改質剤、処理基材、化合物の製造方法、及び化合物 |
JP6127438B2 (ja) | 2012-10-15 | 2017-05-17 | 旭硝子株式会社 | 含フッ素エーテル組成物、該組成物から形成された表面層を有する基材およびその製造方法 |
EP2915833B1 (en) | 2012-11-05 | 2018-06-06 | Daikin Industries, Ltd. | Silane compound containing perfluoro(poly)ether group |
EP2957615A4 (en) | 2013-02-15 | 2016-08-03 | Asahi Glass Co Ltd | COMPOSITION FOR FORMATION OF HYDROFUGGED FILMS AND USE THEREOF |
WO2014163004A1 (ja) | 2013-04-04 | 2014-10-09 | 旭硝子株式会社 | 含フッ素エーテル化合物、含フッ素エーテル組成物およびコーティング液、ならびに表面層を有する基材およびその製造方法 |
KR102268202B1 (ko) | 2013-12-13 | 2021-06-22 | 에이지씨 가부시키가이샤 | 규소 화합물의 제조 방법 |
JP6451279B2 (ja) | 2014-03-31 | 2019-01-16 | 信越化学工業株式会社 | フルオロポリエーテル基含有ポリマー変性シラン、表面処理剤及び物品 |
JP6248858B2 (ja) | 2014-08-07 | 2017-12-20 | 信越化学工業株式会社 | フッ素系表面処理剤及び該表面処理剤で表面処理された物品 |
EP3085749B1 (en) | 2015-04-20 | 2017-06-28 | Shin-Etsu Chemical Co., Ltd. | Fluoropolyether-containing polymer-modified silane, surface treating agent, and treated article |
JP6260579B2 (ja) | 2015-05-01 | 2018-01-17 | 信越化学工業株式会社 | フルオロポリエーテル基含有ポリマー変性シラン、表面処理剤及び物品 |
JP6390521B2 (ja) | 2015-06-03 | 2018-09-19 | 信越化学工業株式会社 | フルオロポリエーテル基含有ポリマー変性シラン |
JP6123939B1 (ja) | 2015-07-31 | 2017-05-10 | ダイキン工業株式会社 | パーフルオロ(ポリ)エーテル基含有シラン化合物 |
CN107922445B (zh) | 2015-09-01 | 2020-07-28 | Agc株式会社 | 含氟醚化合物、含氟醚组合物、涂布液和物品 |
WO2017038832A1 (ja) | 2015-09-01 | 2017-03-09 | 旭硝子株式会社 | 含フッ素エーテル化合物、含フッ素エーテル組成物、コーティング液および物品 |
KR20180138203A (ko) | 2016-04-25 | 2018-12-28 | 에이지씨 가부시키가이샤 | 함불소 에테르 화합물, 코팅액, 물품 및 신규 화합물 |
KR102159594B1 (ko) | 2016-10-27 | 2020-09-25 | 다이킨 고교 가부시키가이샤 | 퍼플루오로(폴리)에테르기 함유 실란 화합물 |
CN110248983B (zh) | 2017-02-03 | 2022-04-22 | 大金工业株式会社 | 含有全氟(聚)醚基的化合物、含有其的表面处理剂和物品 |
WO2018146779A1 (ja) * | 2017-02-09 | 2018-08-16 | 日立化成株式会社 | 有機エレクトロニクス材料、有機エレクトロニクス素子、及び有機エレクトロルミネセンス素子 |
KR102262121B1 (ko) * | 2017-03-17 | 2021-06-09 | 다이킨 고교 가부시키가이샤 | 퍼플루오로(폴리)에테르기 함유 실란 화합물 |
CN115215999A (zh) | 2017-05-26 | 2022-10-21 | Agc株式会社 | 含氟醚化合物、含氟醚组合物、涂布液、物品及其制造方法 |
KR102582200B1 (ko) | 2017-08-22 | 2023-09-22 | 에이지씨 가부시키가이샤 | 함불소 에테르 화합물, 함불소 에테르 조성물, 코팅액, 물품 및 그 제조 방법 |
JP7136109B2 (ja) | 2017-08-22 | 2022-09-13 | Agc株式会社 | 含フッ素エーテル化合物、含フッ素エーテル組成物、コーティング液、物品およびその製造方法 |
KR102588033B1 (ko) | 2017-08-22 | 2023-10-11 | 에이지씨 가부시키가이샤 | 함불소 에테르 화합물, 함불소 에테르 조성물, 코팅액, 물품 및 그 제조 방법 |
WO2019044479A1 (ja) | 2017-08-31 | 2019-03-07 | Agc株式会社 | 含フッ素エーテル化合物、含フッ素エーテル組成物、コーティング液、物品およびその製造方法 |
JP7056462B2 (ja) * | 2017-08-31 | 2022-04-19 | Agc株式会社 | 含フッ素エーテル化合物、含フッ素エーテル組成物、コーティング液、物品およびその製造方法 |
WO2019049753A1 (ja) * | 2017-09-05 | 2019-03-14 | Agc株式会社 | 含フッ素エーテル化合物、組成物および物品 |
WO2019163282A1 (ja) | 2017-12-27 | 2019-08-29 | Agc株式会社 | 含フッ素エーテル化合物、含フッ素エーテル組成物、コーティング液、物品及びその製造方法 |
CN108440593B (zh) * | 2018-03-16 | 2020-04-14 | 深圳怡钛积科技股份有限公司 | 一种抗指纹化合物及其制备方法和应用 |
JP2019171550A (ja) | 2018-03-29 | 2019-10-10 | エーアイ・マシンテック株式会社 | 研磨体 |
-
2020
- 2020-09-17 CN CN202080065686.6A patent/CN114450325A/zh active Pending
- 2020-09-17 EP EP20864729.7A patent/EP4032933A4/en active Pending
- 2020-09-17 KR KR1020227012925A patent/KR20220066125A/ko unknown
- 2020-09-17 WO PCT/JP2020/035358 patent/WO2021054413A1/ja unknown
- 2020-09-17 JP JP2021546959A patent/JPWO2021054413A1/ja active Pending
- 2020-09-18 TW TW109132450A patent/TW202124522A/zh unknown
-
2022
- 2022-03-17 US US17/655,224 patent/US20220213345A1/en active Pending
Also Published As
Publication number | Publication date |
---|---|
TW202124522A (zh) | 2021-07-01 |
EP4032933A4 (en) | 2024-03-20 |
EP4032933A1 (en) | 2022-07-27 |
WO2021054413A1 (ja) | 2021-03-25 |
US20220213345A1 (en) | 2022-07-07 |
KR20220066125A (ko) | 2022-05-23 |
CN114450325A (zh) | 2022-05-06 |
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