JPWO2021006011A1 - - Google Patents
Info
- Publication number
- JPWO2021006011A1 JPWO2021006011A1 JP2021530567A JP2021530567A JPWO2021006011A1 JP WO2021006011 A1 JPWO2021006011 A1 JP WO2021006011A1 JP 2021530567 A JP2021530567 A JP 2021530567A JP 2021530567 A JP2021530567 A JP 2021530567A JP WO2021006011 A1 JPWO2021006011 A1 JP WO2021006011A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/56—Ring systems containing three or more rings
- C07D209/80—[b, c]- or [b, d]-condensed
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
- C07D405/02—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
- C07D405/04—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings directly linked by a ring-member-to-ring-member bond
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
- C07D405/02—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
- C07D405/06—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/12—Esters of monohydric alcohols or phenols
- C08F20/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F20/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
- C08F22/10—Esters
- C08F22/1006—Esters of polyhydric alcohols or polyhydric phenols, e.g. ethylene glycol dimethacrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F263/00—Macromolecular compounds obtained by polymerising monomers on to polymers of esters of unsaturated alcohols with saturated acids as defined in group C08F18/00
- C08F263/02—Macromolecular compounds obtained by polymerising monomers on to polymers of esters of unsaturated alcohols with saturated acids as defined in group C08F18/00 on to polymers of vinyl esters with monocarboxylic acids
- C08F263/04—Macromolecular compounds obtained by polymerising monomers on to polymers of esters of unsaturated alcohols with saturated acids as defined in group C08F18/00 on to polymers of vinyl esters with monocarboxylic acids on to polymers of vinyl acetate
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
- C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
- G02B1/041—Lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H2001/026—Recording materials or recording processes
- G03H2001/0264—Organic recording material
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2260/00—Recording materials or recording processes
- G03H2260/12—Photopolymer
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019126973 | 2019-07-08 | ||
PCT/JP2020/024149 WO2021006011A1 (ja) | 2019-07-08 | 2020-06-19 | 化合物、ポリマー及び有機材料、並びにこれを用いた光学装置、光学部品及び画像表示装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPWO2021006011A1 true JPWO2021006011A1 (ja) | 2021-01-14 |
Family
ID=74114873
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2021530567A Pending JPWO2021006011A1 (ja) | 2019-07-08 | 2020-06-19 |
Country Status (7)
Country | Link |
---|---|
US (1) | US20220289678A1 (ja) |
EP (1) | EP3995491A4 (ja) |
JP (1) | JPWO2021006011A1 (ja) |
KR (1) | KR20220029590A (ja) |
CN (1) | CN114174262A (ja) |
TW (1) | TW202110797A (ja) |
WO (1) | WO2021006011A1 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113316746B (zh) * | 2019-01-31 | 2024-01-09 | 索尼集团公司 | 全息记录组合物、全息记录介质、全息图、以及使用该全息图的光学装置和光学部件 |
CN114174923A (zh) * | 2019-07-08 | 2022-03-11 | 索尼集团公司 | 光敏组合物、使用该光敏组合物的全息记录介质、全息光学元件、和形成全息衍射光栅的方法 |
CN115087648A (zh) * | 2020-02-18 | 2022-09-20 | 三菱化学株式会社 | 化合物、热塑性树脂、光学构件、光学透镜 |
WO2024005140A1 (ja) * | 2022-06-30 | 2024-01-04 | 三菱ケミカル株式会社 | 化合物、重合性組成物、重合物、ホログラム記録媒体、光学材料、並びに光学部品 |
Family Cites Families (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3751246A (en) * | 1971-09-07 | 1973-08-07 | Addressograph Multigraph | Photoconductive elements employing n-vinyl carbazoles having fused condensed arenic ring structures |
SU777027A1 (ru) * | 1979-01-16 | 1980-11-07 | Киевский Ордена Ленина Государственный Университет Им.Т.Г.Шевченко | -Глицидил-7н-бензо-/с/-карбазолмономер дл получени полимерных фотополупроводников, пригодных дл фотопластической записи изображени |
SU1641812A1 (ru) * | 1988-11-23 | 1991-04-15 | Каунасский Политехнический Институт Им.Антанаса Снечкуса | Способ получени 7-(2-гидроксиэтил)-7Н-бензо[с]карбазола |
JPH11202740A (ja) * | 1998-01-20 | 1999-07-30 | Fujitsu Ltd | 屈折率分布形成材料及びホログラフィ乾板 |
JP2000286056A (ja) * | 1999-03-30 | 2000-10-13 | Fuji Photo Film Co Ltd | エレクトロルミネッセンス素子材料およびエレクトロルミネッセンス素子 |
US7521155B2 (en) * | 2003-06-10 | 2009-04-21 | Dai Nippon Printing Co., Ltd. | Volume hologram layer and volume hologram transfer foil |
JP2007277467A (ja) * | 2006-04-10 | 2007-10-25 | Sony Chemical & Information Device Corp | 硬化性樹脂組成物 |
US7481955B2 (en) * | 2006-05-31 | 2009-01-27 | Transitions Optical, Inc. | Photochromic materials comprising metallocenyl groups |
JPWO2008156089A1 (ja) * | 2007-06-18 | 2010-08-26 | 出光興産株式会社 | 芳香族アミン誘導体及びそれを用いた有機エレクトロルミネッセンス素子 |
JP2009215425A (ja) * | 2008-03-10 | 2009-09-24 | Tokyo Univ Of Agriculture & Technology | ジナフトフラン単位を有するπ共役電子系ポリアリーレンエチニレン及びその製造方法 |
JPWO2010137501A1 (ja) * | 2009-05-25 | 2012-11-15 | 日本化薬株式会社 | 光学レンズシート用エネルギー線硬化型樹脂組成物及びその硬化物 |
JP5240798B2 (ja) | 2010-02-04 | 2013-07-17 | 学校法人神奈川大学 | 屈折率向上剤、並びにそれを含む樹脂組成物、重合若しくは硬化性組成物及び光学材料 |
JP5493088B2 (ja) | 2010-02-04 | 2014-05-14 | 学校法人神奈川大学 | ジベンゾチオフェン骨格を有する化合物における屈折率付与効果を増大させる方法 |
JP2011238306A (ja) * | 2010-05-06 | 2011-11-24 | Sony Chemical & Information Device Corp | 光記録用重合性組成物及び光記録媒体 |
KR101477614B1 (ko) * | 2010-09-17 | 2014-12-31 | 롬엔드하스전자재료코리아유한회사 | 신규한 유기 발광 화합물 및 이를 채용하고 있는 유기 전계 발광 소자 |
US9847490B2 (en) * | 2012-10-09 | 2017-12-19 | Idemitsu Kosan Co., Ltd. | Copolymer, material for organic electronic element, material for organic electroluminescent element, and organic electroluminescent element |
JP6059754B2 (ja) * | 2014-03-20 | 2017-01-11 | 富士フイルム株式会社 | 組成物、硬化性組成物、透明膜、固体撮像素子および表示装置 |
EP3137930B1 (en) * | 2014-04-30 | 2020-06-17 | DIC Corporation | Bicarbazole compound, photo-curable composition, cured produc thereof, curable composition for plastic lens, and plastic lens |
JP6530694B2 (ja) * | 2014-11-07 | 2019-06-12 | 富士フイルム株式会社 | ポリマーフィルム、積層フィルム、ポリマーフィルムの製造方法、偏光板および画像表示装置 |
CN107188906B (zh) * | 2016-03-14 | 2019-06-14 | 华东师范大学 | 二苯并磷杂茂化合物及其合成方法和应用 |
CN105777810A (zh) * | 2016-03-25 | 2016-07-20 | 南京邮电大学 | 基于磷芴结构的光电功能材料及其制备方法和应用 |
KR101941154B1 (ko) * | 2016-08-23 | 2019-01-23 | 주식회사 엘지화학 | 화합물 및 이를 포함하는 유기 발광 소자 |
WO2018043593A1 (ja) * | 2016-08-30 | 2018-03-08 | ソニー株式会社 | ホログラム記録用感光性組成物、ホログラム記録媒体及びホログラム |
US11177446B2 (en) * | 2017-09-14 | 2021-11-16 | Beijing Summer Sprout Technology Co., Ltd. | Silicon containing organic fluorescent materials |
CN108047264A (zh) * | 2017-12-28 | 2018-05-18 | 江南大学 | 一种蓝光发射有机发光材料及其制备方法 |
CN113316746B (zh) * | 2019-01-31 | 2024-01-09 | 索尼集团公司 | 全息记录组合物、全息记录介质、全息图、以及使用该全息图的光学装置和光学部件 |
CN114174923A (zh) * | 2019-07-08 | 2022-03-11 | 索尼集团公司 | 光敏组合物、使用该光敏组合物的全息记录介质、全息光学元件、和形成全息衍射光栅的方法 |
JP7468544B2 (ja) * | 2019-11-11 | 2024-04-16 | ソニーグループ株式会社 | ホログラム記録用組成物、ホログラム記録媒体、ホログラム、及びこれを用いた光学装置、光学部品 |
-
2020
- 2020-06-19 EP EP20836829.0A patent/EP3995491A4/en active Pending
- 2020-06-19 US US17/625,674 patent/US20220289678A1/en active Pending
- 2020-06-19 JP JP2021530567A patent/JPWO2021006011A1/ja active Pending
- 2020-06-19 KR KR1020217042887A patent/KR20220029590A/ko active Search and Examination
- 2020-06-19 WO PCT/JP2020/024149 patent/WO2021006011A1/ja unknown
- 2020-06-19 CN CN202080048914.9A patent/CN114174262A/zh active Pending
- 2020-07-01 TW TW109122304A patent/TW202110797A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
TW202110797A (zh) | 2021-03-16 |
EP3995491A1 (en) | 2022-05-11 |
EP3995491A4 (en) | 2023-01-11 |
WO2021006011A1 (ja) | 2021-01-14 |
CN114174262A (zh) | 2022-03-11 |
KR20220029590A (ko) | 2022-03-08 |
US20220289678A1 (en) | 2022-09-15 |
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