JPWO2019078370A1 - 皮膚障害改善用組成物 - Google Patents
皮膚障害改善用組成物 Download PDFInfo
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Abstract
Description
[1]IL−8発現抑制物質を少なくとも1種以上含有する、大気汚染物質による皮膚障害改善用組成物。
[2]前記皮膚障害が、皮膚炎症及び/又はかゆみである、[1]に記載の組成物。
[3]前記IL−8発現抑制物質が、ヒアルロン酸及びその塩、ヒアルロン酸の誘導体及びその塩、アーティチョークエキス、トラネキサム酸及びその塩、クマザサ葉エキス、ツバキエキス、バラエキス、シソエキス、オウゴンエキス、甘草エキス、アマチャエキス、アロエ葉エキス、ノイバラ果実エキス、オウレンエキス、ビワ葉エキス、サクラ葉エキス、ローズマリー葉エキス、コンフリー葉エキス、セージ葉エキス、タイムエキス、ニンジン根エキス、アラントイン、ウフェナマート、グリチルリチン酸及びその塩、グリチルレチン酸及びその塩、グリチルレチン酸ステアリル、並びに、コレステロール類からなる群より選ばれる1種又は2種以上である、[1]又は[2]に記載の組成物。
[4]Claudin発現促進物質及び/又はOcculudin発現促進物質を少なくとも1種以上含有する、大気汚染物質による皮膚障害改善用組成物。
[5]前記皮膚障害が、皮膚バリア機能の低下及び/又は未熟によるものである、[4]に記載の組成物。
[6]前記Claudin発現促進物質及び/又はOcculudin発現促進物質が、オレンジ果皮エキス、ビルベリー葉エキス、セイヨウシロヤナギ樹皮エキス、アルニカエキス、アシタバエキス、ハトムギエキス、イチョウ葉エキス、ウコンエキス、ノイバラエキス(エイジツエキス)、オウゴンエキス、ヨモギエキス、カミツレエキス、シソ葉エキス、モモエキス、メリッサエキス、ラベンダーエキス及びN‐ラウロイル‐L‐グルタミン酸とL‐リジンとの縮合物のナトリウム塩からなる群から選ばれる1種又は2種以上である、[4]又は[5]に記載の組成物。
[7]酸化ストレス抑制物質を少なくとも1種以上含有する、大気汚染物質による皮膚障害改善用組成物。
[8]前記皮膚障害が、肌のしわ、しみ、にきび及びたるみからなる群より選択される少なくとも1種である、[7]に記載の組成物。
[9]前記酸化ストレス抑制物質が、オウゴンエキス、ビルベリーエキス、加水分解ローヤルゼリー、ヒマワリオイル、ニガハッカ、グリセリルグルコシド、マタタビエキス、ニコチン酸アミド、グリコーゲン、ツボクサエキス、ゼニアオイエキス、ドクダミエキス、メリアアザジラクタエキス、アルゲエキス、オウバクエキス、アスコルビン酸、イチョウ葉エキス、アマチャエキス、緑茶エキス、アロエ葉エキス、ハイビスカス花エキス、シソ葉エキス、ローズマリー葉エキス、セージ葉エキス、シトラスエキス、カミツレエキス、カンゾウエキス、アーティチョークエキス及びユーカリエキスからなる群から選ばれる1種又は2種以上である、[7]又は[8]に記載の組成物。
[10]IL−33発現抑制物質を少なくとも1種以上含有する、大気汚染物質による皮膚障害改善用組成物。
[11]前記皮膚障害が、かゆみ、湿疹、皮膚炎、かぶれ、蕁麻疹、及び、ただれからなる群より選択される少なくとも1種である、[10]に記載の組成物。
[12]前記IL−33発現抑制物質が、アラントイン、リドカイン、イソプロピルメチルフェノール、ジフェンヒドラミン及びその塩、ヒアルロン酸及びその塩、ヒアルロン酸の誘導体及びその塩、塩化マグネシウム、コレステロール類、グリチルリチン酸及びその塩、グリチルレチン酸及びその塩、グリチルレチン酸ステアリル、並びに、ウフェナマートからなる群より選ばれる1種又は2種以上である、[10]又は[11]に記載の組成物。
[13]前記大気汚染物質が、自動車排気ガス、都市大気粉塵、花粉、及び、砂塵からなる群より選択される少なくとも1種である、[1]〜[12]のいずれかに記載の組成物。
一つの実施形態において、本発明の皮膚障害改善用組成物は、IL−8発現抑制物質を少なくとも1種以上含有する。また、本発明の皮膚障害改善用組成物は、特に大気汚染物質による皮膚障害の改善に適している。
本発明の皮膚障害改善用組成物は、特に大気汚染物質による皮膚障害の改善に適している。大気汚染物質としては、例えば、二酸化硫黄、二酸化窒素、浮遊粒子状物質、光化学オキシダント、トリクロロエチレンなどが挙げられる。この他、大気汚染防止法(1968年)により固定発生源からの排出が規制されている硫黄酸化物、窒素酸化物、ばいじん、カドミウム、塩素、鉛、塩化水素、フッ化水素などの「ばい煙」、鉱物などの堆積場から飛散する「一般粉じん」、「特定粉じん」であるアスベスト、「特定物質」として定められているベンゼンなどである。また、移動発生源からの排出が規制されている一酸化炭素、炭化水素も該当する。近年、シックハウス症候群の原因物質とされているホルムアルデヒドなども含まれる。また、悪臭は大気汚染の1形態と考えることもでき、その原因物質もまた大気汚染物質として挙げられる。浮遊粒子状物質(Suspended Particulate Matter、SPM)とは、大気中に浮遊する固体及び液体粒子のことをいい、粒子の大きさにより分類され(大気エアロゾルとも呼ばれる)、自動車排気ガス、都市大気粉塵、及び、砂塵(黄砂など)も含まれる。環境基準においては、粒子の大きさが10μm以下のPM10や、粒子の大きさが2.5μm以下である微小粒子状物質PM2.5が規定されている。浮遊粒子状物質には、炭素成分、硝酸塩、硫酸塩、アンモニウム塩のほか、ケイ素、ナトリウム、アルミニウムなどの無機元素等が含まれ得る。また、浮遊粒子状物質には、放射性セシウム等の放射性物質が運搬される担体となるものも含まれ得る。ここで「黄砂」とは一般に、黄河流域及び砂漠等から風によって運ばれてくる砂塵をいい、粒子の大きさが4μm付近のものをいう。本発明においては、皮膚に与える作用の点から、大気汚染物質としては、二酸化硫黄、二酸化窒素、浮遊粒子状物質、光化学オキシダント、トリクロロエチレン、ばい煙、一般粉じん、特定粉じん(アスベストなど)、特定物質(ベンゼンなど)、一酸化炭素、炭化水素、ホルムアルデヒド、及び悪臭からなる群より選択される少なくとも1種が影響することがあり、特には、自動車排気ガス、都市大気粉塵、花粉、又は砂塵が影響し得る。
本発明の皮膚障害改善用組成物は、皮膚外用剤として、医薬品、医薬部外品、あるいは化粧品の形態で使用され得る。皮膚外用剤においては、本発明の効果を損なわない範囲で、皮膚外用剤(化粧料、医薬部外品、医薬品)に添加される公知の基剤又は担体と共に混合して組成物とすることができる。
本発明の皮膚障害改善用組成物のpHについては、医薬上、薬理学的に又は生理学的に許容される範囲内であれば特に限定されるものではないが、一例としては、pHが3.0〜9.5、好ましくは3〜8、より好ましくは、3〜7、更に好ましくは3〜6、特に好ましくは4〜6となる範囲が挙げられる。
別の実施形態において、本発明は、ヒアルロン酸及びその塩、ヒアルロン酸の誘導体及びその塩、アーティチョークエキス、トラネキサム酸及びその塩、クマザサ葉エキス、ツバキエキス、バラエキス、シソエキス、オウゴンエキス、甘草エキス、アマチャエキス、アロエ葉エキス、ノイバラ果実エキス、オウレンエキス、ビワ葉エキス、サクラ葉エキス、ローズマリー葉エキス、コンフリー葉エキス、セージ葉エキス、タイムエキス、ニンジン根エキス、アラントイン、ウフェナマート、グリチルリチン酸及びその塩、グリチルレチン酸及びその塩、グリチルレチン酸ステアリル、並びに、コレステロール類からなる群より選択される少なくとも1種以上を含有する、IL−8発現抑制剤を提供することも可能である。
別の実施形態において、本発明は、アラントイン、リドカイン、イソプロピルメチルフェノール、ジフェンヒドラミン及びその塩、ヒアルロン酸及びその塩、ヒアルロン酸の誘導体及びその塩の、塩化マグネシウム、コレステロール類、グリチルリチン酸及びその塩、グリチルレチン酸及びその塩、グリチルレチン酸ステアリル、並びに、ウフェナマートからなる群より選ばれる少なくとも1種以上を含有する、IL−33発現抑制剤を提供することも可能である。
上記の他、別の実施形態において、本発明は、IL−8発現抑制物質を少なくとも1種以上含有する組成物の、大気汚染物質による皮膚障害改善剤の製造のための使用;
ヒアルロン酸及びその塩、ヒアルロン酸の誘導体及びその塩、アーティチョークエキス、トラネキサム酸及びその塩、クマザサ葉エキス、ツバキエキス、バラエキス、シソエキス、オウゴンエキス、甘草エキス、アマチャエキス、アロエ葉エキス、ノイバラ果実エキス、オウレンエキス、ビワ葉エキス、サクラ葉エキス、ローズマリー葉エキス、コンフリー葉エキス、セージ葉エキス、タイムエキス、ニンジン根エキス、アラントイン、ウフェナマート、グリチルリチン酸及びその塩、グリチルレチン酸及びその塩、グリチルレチン酸ステアリル、並びに、コレステロール類からなる群より選ばれる1種又は2種以上を含有する組成物の、大気汚染物質による皮膚障害改善剤の製造のための使用;
Claudin発現促進物質及び/又はOcculudin発現促進物質を少なくとも1種以上含有する組成物の、大気汚染物質による皮膚障害改善剤の製造のための使用;
オレンジ果皮エキス、ビルベリー葉エキス、セイヨウシロヤナギ樹皮エキス、アルニカエキス、アシタバエキス、ハトムギエキス、イチョウ葉エキス、ウコンエキス、ノイバラエキス(エイジツエキス)、オウゴンエキス、ヨモギエキス、カミツレエキス、シソ葉エキス、モモエキス、メリッサエキス、ラベンダーエキス、及び、N‐ラウロイル‐L‐グルタミン酸とL‐リジンとの縮合物のナトリウム塩からなる群から選ばれる1種又は2種以上を含有する組成物の、大気汚染物質による皮膚障害改善剤の製造のための使用;
酸化ストレス抑制物質を少なくとも1種以上含有する組成物の、大気汚染物質による皮膚障害改善剤の製造のための使用;
オウゴンエキス、ビルベリーエキス、加水分解ローヤルゼリー、ヒマワリオイル、ニガハッカ、グリセリルグルコシド、マタタビエキス、ニコチン酸アミド、グリコーゲン、ツボクサエキス、ゼニアオイエキス、ドクダミエキス、メリアアザジラクタエキス、アルゲエキス、オウバクエキス、アスコルビン酸、イチョウ葉エキス、アマチャエキス、緑茶エキス、アロエ葉エキス、ハイビスカス花エキス、シソ葉エキス、ローズマリー葉エキス、セージ葉エキス、シトラスエキス、カミツレエキス、カンゾウエキス、アーティチョークエキス、及びユーカリエキスからなる群から選ばれる1種又は2種以上を含有する組成物の、大気汚染物質による皮膚障害改善剤の製造のための使用;
IL−33発現抑制物質を少なくとも1種以上含有する組成物の、大気汚染物質による皮膚障害改善剤の製造のための使用;
アラントイン、リドカイン、イソプロピルメチルフェノール、ジフェンヒドラミン及びその塩、ヒアルロン酸及びその塩、ヒアルロン酸の誘導体及びその塩、塩化マグネシウム、コレステロール類、グリチルリチン酸及びその塩、グリチルレチン酸及びその塩、グリチルレチン酸ステアリル、並びに、ウフェナマートからなる群より選ばれる1種又は2種以上を含有する組成物の、大気汚染物質による皮膚障害改善剤の製造のための使用;
IL−8発現抑制物質を少なくとも1種以上含有する組成物を、皮膚に適用することを含む、大気汚染物質による皮膚障害の改善方法;
ヒアルロン酸及びその塩、ヒアルロン酸の誘導体及びその塩の、アーティチョークエキス、トラネキサム酸及びその塩、クマザサ葉エキス、ツバキエキス、バラエキス、シソエキス、オウゴンエキス、甘草エキス、アマチャエキス、アロエ葉エキス、ノイバラ果実エキス、オウレンエキス、ビワ葉エキス、サクラ葉エキス、ローズマリー葉エキス、コンフリー葉エキス、セージ葉エキス、タイムエキス、ニンジン根エキス、アラントイン、ウフェナマート、グリチルリチン酸及びその塩、グリチルレチン酸及びその塩、グリチルレチン酸ステアリル、並びに、コレステロール類からなる群より選ばれる1種又は2種以上を含有する組成物を、皮膚に適用することを含む、大気汚染物質による皮膚障害の改善方法;
Claudin発現促進物質及び/又はOcculudin発現促進物質を少なくとも1種以上含有する組成物を、皮膚に適用することを含む、大気汚染物質による皮膚障害の改善方法;
オレンジ果皮エキス、ビルベリー葉エキス、セイヨウシロヤナギ樹皮エキス、アルニカエキス、アシタバエキス、ハトムギエキス、イチョウ葉エキス、ウコンエキス、ノイバラエキス(エイジツエキス)、オウゴンエキス、ヨモギエキス、カミツレエキス、シソ葉エキス、モモエキス、メリッサエキス、ラベンダーエキス、及び、N‐ラウロイル‐L‐グルタミン酸とL‐リジンとの縮合物のナトリウム塩からなる群から選ばれる1種又は2種以上を含有する組成物を、皮膚に適用することを含む、大気汚染物質による皮膚障害の改善方法;
酸化ストレス抑制物質を少なくとも1種以上含有する組成物を、皮膚に適用することを含む、大気汚染物質による皮膚障害の改善方法;
オウゴンエキス、ビルベリーエキス、加水分解ローヤルゼリー、ヒマワリオイル、ニガハッカ、グリセリルグルコシド、マタタビエキス、ニコチン酸アミド、グリコーゲン、ツボクサエキス、ゼニアオイエキス、ドクダミエキス、メリアアザジラクタエキス、アルゲエキス、オウバクエキス、アスコルビン酸、イチョウ葉エキス、アマチャエキス、緑茶エキス、アロエ葉エキス、ハイビスカス花エキス、シソ葉エキス、ローズマリー葉エキス、セージ葉エキス、シトラスエキス、カミツレエキス、カンゾウエキス、アーティチョークエキス、及び、ユーカリエキスからなる群から選ばれる1種又は2種以上を含有する組成物を、皮膚に適用することを含む、大気汚染物質による皮膚障害の改善方法;
IL−33発現抑制物質を少なくとも1種以上含有する組成物を、皮膚に適用することを含む、大気汚染物質による皮膚障害の改善方法;又は、
アラントイン、リドカイン、イソプロピルメチルフェノール、ジフェンヒドラミン及びその塩、ヒアルロン酸及びその塩、ヒアルロン酸の誘導体及びその塩、塩化マグネシウム、コレステロール類、グリチルリチン酸及びその塩、グリチルレチン酸及びその塩、グリチルレチン酸ステアリル、並びに、ウフェナマートからなる群より選ばれる1種又は2種以上を含有する組成物を、皮膚に適用することを含む、大気汚染物質による皮膚障害の改善方法、を提供することも可能である。
24well plate(Cell Bind、Corning社)に、正常ヒト表皮角化細胞増殖用培地(倉敷紡績株式会社(クラボウ社))を用い、正常ヒト表皮角化細胞(クラボウ社、Human Epidermal Keratinocyte:NHEK)を、細胞数80000cells/wellで播種した。37℃、5%炭酸ガス及び95%空気の環境下で24時間培養後、4種の大気汚染物質を各濃度にて溶解させた培地に交換し、さらに1日培養した。
24well plate(Cell Bind、Corning社)にNHEKを細胞数80000cells/wellで播種した。37℃、5%炭酸ガス及び95%空気の環境下で24時間培養後、4種の大気汚染物質を各濃度にて溶解させた培地に交換し、さらに1日培養した。培養後、PBS(−)で2回洗浄し、RNeasy Mini Kit(Qiagen社)を用いてRNAを抽出したのち、TOYOBO ReverTra Ace qPCR RT Master Mix with gDNA Remover(東洋紡株式会社(TOYOBO社))を用いてcDNAを作製した。作製したcDNAをPremix Ex Taq(登録商標)を用いてqRT−PCRにより解析した。測定結果より、培地のみ(コントロール)の各遺伝子発現を1とし、大気汚染物質も添加した場合の相対値を算出した(図2A〜D)。図2A〜Dは、大気汚染物質として、それぞれ、VEP、UA、GKD、CPを用いた結果を示している。なお、Taqman ProbeはApplied Biosystem社より購入した。各Taqman Probeは、GAPDH:Hs02758991_g1、IL−1β:Hs00174097_m1、IL−6:Hs00985639_m1、IL−8:Hs00174103_m1、IL−33:Hs00369211_m1、MMP1:Hs00899658_m1、Hs00234579_m1、CLDN1:Hs00221623_m1、OCLN:Hs00170162_m1を使用した。
24well plate(Cell Bind、Corning社)にNHEKを細胞数80000cells/wellで播種した。37℃、5%炭酸ガス及び95%空気の環境下で24時間培養後、4種の大気汚染物質を各濃度にて溶解させた培地に交換し、さらに1日培養した。培養後、PBS(−)で2回洗浄し、CellROX(登録商標) Green Reagent, for oxidative stress detection(Thermo Fisher Scientific社)とHoechst 33342を培地に希釈し、well内培地と置換した。37℃、5%炭酸ガス及び95%空気の環境下で30分培養後、ImageExpressで画像撮影した(16視野/well)。蛍光強度測定プログラムと細胞カウントプログラムで解析し、細胞数あたりの酸化ストレス活性を測定した。測定結果より、培地のみ(コントロール)の細胞数あたりの酸化ストレス活性を1とし、大気汚染物質も添加した場合の相対値を算出した(図3A〜D)。
24well plate(Cell Bind、Corning社)にNHEKを細胞数80000cells/wellで播種した。37℃、5%炭酸ガス及び95%空気の環境下で24時間培養後、4種の大気汚染物質を各濃度にて溶解させた培地に交換し、さらに1日培養した。培養後、上清(ELISA用サンプル)を回収し、Human IL−8/CXCL8 DuoSet ELISA Kit(R&Dシステムズ社)にてIL−8の発現量を測定した。また、上清を除去した培養プレートをPBSで2回洗浄し、Hoechst 33342を培地に希釈し、well内培地と置換した。37℃、5%炭酸ガス及び95%空気の環境下で10分培養後、ImageExpressで画像撮影した(16視野/well)。細胞カウントプログラムで解析し、細胞数を測定した。測定結果より、培地のみ(コントロール)の細胞数、細胞数あたりのIL−8発現量をそれぞれ1とし、大気汚染物質を添加した場合の相対値を算出した(図4A〜D)。
12well plate(12mm Transwell(登録商標) with 0.4μm Pore Polyester Membrane Insert、 Sterile、Corning社)のinsertにNHEKを細胞数96000cells/wellで播種した。37℃、5%炭酸ガス及び95%空気の環境下で3日培養後、分化誘導培地(2mM Ca2+ Humedia−KG2)に交換し、4日間培養した。その後、新しい分化誘導培地(2mM Ca2+ Humedia−KG2)に交換し、2日間培養したのち、4種の大気汚染物質を各濃度にて溶解させた分化誘導培地(2mM Ca2+ Humedia−KG2)に交換し、5日間培養した。大気汚染物質の添加日(培養開始後9日目)より、insertの電気抵抗値をMillicell(登録商標) ERS−2 Voltohmmeter(Millipore社)により測定した(図5A〜D)。各図において、用いた大気汚染物質の濃度は、VEP50μg/mL、UA50μg/mL、GKD50μg/mL、CP1000μg/mLである。各図において、実線は各大気汚染物質を添加した培地での測定結果を示し、破線は培地のみ(コントロール)の測定結果を示している。用いた大気汚染物質の濃度条件は、後述の図6〜7においても同様である。
12well plate(12mm Transwell(登録商標) with 0.4μm Pore Polyester Membrane Insert、 Sterile、Corning社)のinsertにNHEKを細胞数96000cells/wellで播種した。37℃、5%炭酸ガス及び95%空気の環境下で3日培養後、4種の大気汚染物質を各濃度にて溶解させた分化誘導培地(2mM Ca2+ Humedia−KG2)に交換し、6日間培養した。その間、insertの電気抵抗値をMillicell(登録商標) ERS−2 Voltohmmeter(Millipore社)により測定した(図6A〜D)。各図において、実線は各大気汚染物質を添加した培地での測定結果を示し、破線は培地のみ(コントロール)の測定結果を示している。
48well plate(Cell Bind, Corning社)にNHEKを細胞数84000cells/wellで播種した。37℃、5%炭酸ガス及び95%空気の環境下で3日培養後、4種の大気汚染物質を各濃度にて溶解させた分化誘導培地(2mM Ca2+ Humedia−KG2)に交換し、3日間培養した。培養後、PBS(−)で2回洗浄し、RNeasy Mini Kit(Qiagen社)を用いてRNAを抽出したのち、TOYOBO ReverTra Ace qPCR RT Master Mix with gDNA Remover(TOYOBO社)を用いてcDNAを作製した。作製したcDNAをPremix Ex Taq(登録商標)を用いてqRT−PCRにより解析した。測定結果より、培地のみ(コントロール)の各遺伝子発現を1とし、大気汚染物質も添加した場合の相対値を算出した(図7A〜D)。なお、Taqman ProbeはApplied Biosystem社より購入した。各Taqman Probeは、CLDN1:Hs00221623_m1、OCLN:Hs00170162_m1を使用した。
24well plate(Cell Bind、Corning社)にNHEKを細胞数80000cells/wellで播種した。37℃、5%炭酸ガス及び95%空気の環境下で24時間培養後、候補化合物(グリチルリチン酸ニカリウム、トラネキサム酸、アーティチョークエキス(一丸ファルコス社)、バイオヒアルロン酸ナトリウムHA12NB(資生堂社)、Oligo-HA4(SIGMA社)、イザヨイバラエキス(一丸ファルコス社))、アラントイン、ウフェナマート、グリチルレチン酸、コレステロールを各濃度にて溶解させた培地に交換し培養した。24時間培養後、UAと候補化合物を各濃度にて溶解させた培地に交換し、さらに一日培養した。培養後、上清(ELISA用サンプル)を回収し、Human IL−8/CXCL8 DuoSet ELISA Kit(R&Dシステムズ社)にてIL−8の発現量を測定した。また、上清を除去した培養プレートをPBSで2回洗浄し、Hoechst 33342を培地に希釈し、well内培地と置換した。37℃、5%炭酸ガス及び95%空気の環境下で10分培養後、ImageExpressで画像撮影した(16視野/well)。細胞カウントプログラムで解析し、細胞数を測定した。測定結果より、培地のみ(コントロール)の細胞数、細胞数あたりのIL−8発現量をそれぞれ1とし、大気汚染物質や候補素材を添加した場合の細相対値を算出した(図8A〜J)。
12well plate(12mm Transwell(登録商標) with 0.4μm Pore Polyester Membrane Insert, Sterile、Corning社)のinsertにNHEKを細胞数96000cells/wellで播種した。37℃、5%炭酸ガス及び95%空気の環境下で3日培養後、UAと候補化合物(マンダリンオレンジ果皮エキス(一丸ファルコス株式会社製))を各濃度にて溶解させた分化誘導培地(2mM Ca2+ Humedia−KG2)に交換し、7日間培養した。培養開始から9日目及び10日目に、insertの電気抵抗値をMillicell(登録商標) ERS−2 Voltohmmeter(Millipore社)により測定した(図9A〜B)。
48well plate(Cell Bind、Corning社)にNHEKを細胞数84000cells/wellで播種した。37℃、5%炭酸ガス及び95%空気の環境下で3日培養後、UAと候補化合物(マンダリンオレンジ果皮エキス(一丸ファルコス社))を各濃度にて溶解させた分化誘導培地(2mM Ca2+ Humedia−KG2)に交換し、5日間もしくは6日間培養した。培養後、PBS(―)で2回洗浄し、RNeasy Mini Kit(Qiagen社)を用いてRNAを抽出したのち、TOYOBO ReverTra Ace qPCR RT Master Mix with gDNA Remover(東洋紡株式会社(TOYOBO社))を用いてcDNAを作製した。作製したcDNAをPremix Ex Taq(登録商標)を用いてqRT−PCRにより解析した。測定結果より、培地のみ(control)の各遺伝子発現を1とし、大気汚染物質を添加した場合の相対値を算出した(図10A、B)。なお、Taqman ProbeはApplied Biosystem社より購入した。各Taqman Probeは、GAPDH:Hs02758991_g1、CLDN1:Hs00221623_m1を使用した(図10A、B)。
6well plate(Cell Bind、Corning社)にNHEKを細胞数400000cells/wellで播種した。37℃、5%炭酸ガス及び95%空気の環境下で24時間培養後、自動車排気ガス(VEP)もしくは都市大気粉塵(UA)を各濃度にて溶解させた培地に交換し、さらに1日培養した。培養後、上清を回収し、0.2μm Filter(Corning、431222)にて各大気汚染物質を取り除いた。このとき、表皮を介しない影響を補正するためにNHEKには添加をせず、同様の処理を行った上清をBlankとした。続いて、48well plate(Cell Bind、Corning社)にヒト線維芽細胞用培地(Dulbecco‘s Modified Eagle Medium(クラボウ社)、10% Fetal bovine serum(MP Bio社)、1% Antibiotic−Antimycotic(Gibco社))を用い、正常ヒト皮膚線維芽細胞(クラボウ社、Human Dermal Fibroblast:NHDF)を細胞数40000cells/wellで播種した。37℃、5%炭酸ガス及び95%空気の環境下で24時間培養後、ヒト線維芽細胞用培地とFilterろ過した培養上清を1:1で混合した培地に交換し、さらに4日間培養した。培養後、上清(ELISA用サンプル)を回収し、Human MMP1 DuoSet ELISA Kit(R&Dシステムズ社)、Human MMP3 DuoSet ELISA Kit(R&Dシステムズ社)にてMMP1とMMP3の発現量を測定した。また、上清を除去した培養プレートをPBSで2回洗浄し、Hoechst 33342を培地に希釈し、well内培地と置換した。37℃、5%炭酸ガス及び95%空気の環境下で10分培養後、ImageExpressで画像撮影した(16視野/well)。細胞カウントプログラムで解析し、細胞数を測定した。測定結果より、Blank群の培地のみ(Blank control)の細胞数あたりのMMP1発現量、MMP3発現量をそれぞれ1とし、大気汚染物質を添加した場合の細相対値を算出した(図11A〜D)。
ヒト正常皮膚角化細胞・繊維芽細胞から構成された再構築モデル(クラボウ社、EFT―400)をEFT―400用培地(クラボウ社、EFT−400ASY)を用いて、37℃、5%炭酸ガス及び95%空気の環境下で24時間培養した。培養後、表皮上面から自動車排気ガスもしくは都市大気粉塵を各濃度で溶解したPBSを添加し、さらに3日培養した。培養後、培地(ELISA用サンプル)を回収し、Human MMP1 DuoSet ELISA Kit(R&Dシステムズ社)、Human MMP3 DuoSet ELISA Kit(R&Dシステムズ社)にてMMP1とMMP3の発現量を測定した。測定結果より、PBSのみ(control)の1WellあたりのMMP1発現量、MMP3発現量をそれぞれ1とし、大気汚染物質を添加した場合の細相対値を算出した(図12A〜D)。
24well plate(Cell Bind、Corning社)にNHEKを細胞数80000cells/wellで播種した。37℃、5%炭酸ガス及び95%空気の環境下で24時間培養後、自動車排気ガスもしくは都市大気粉塵を各濃度にて溶解させた培地に交換し、さらに1日培養した。培養後、PBS(−)で2回洗浄し、RNeasy Mini Kit(Qiagen社)を用いてRNAを抽出したのち、TOYOBO ReverTra Ace qPCR RT Master Mix with gDNA Remover(東洋紡株式会社(TOYOBO社))を用いてcDNAを作製した。作製したcDNAをPremix Ex Taq(登録商標)を用いてqRT−PCRにより解析した。測定結果より、培地のみ(control)の各遺伝子発現を1とし、大気汚染物質も添加した場合の相対値を算出した(図13A、B)。なお、Taqman ProbeはApplied Biosystem社より購入した。各Taqman Probeは、GAPDH:Hs02758991_g1、PTGS2:Hs00153133_m1を使用した。
6well plate(Cell Bind、Corning社)にNHEKを細胞数400000cells/wellで播種した。37℃、5%炭酸ガス及び95%空気の環境下で24時間培養後、都市大気粉塵を各濃度にて溶解させた培地に交換し、さらに1日培養した。培養後、上清を回収し、0.2μm Filter(Corning社、431222)にて大気汚染物質を取り除いた。このとき、表皮を介しない影響を補正するためにNHEKには添加をせず、同様の処理を行った上清をBlankとした。続いて、48well plate(Cell Bind、Corning社)に正常ヒト表皮メラニン細胞専用培地(クラボウ社、DermaLife Ma Comp kit)を用い、正常ヒト表皮メラニン細胞(クラボウ社、Human Epidermal Melanocyte:NHEM)を細胞数40000cells/wellで播種した。37℃、5%炭酸ガス及び95%空気の環境下で24時間培養後、正常ヒト表皮メラニン細胞専用培地とFilterろ過した培養上清を1:1で混合した培地に交換し、さらに4日間培養した。培養後、PBS(−)で2回洗浄し、RNeasy Mini Kit(Qiagen社)を用いてRNAを抽出したのち、TOYOBO ReverTra Ace qPCR RT Master Mix with gDNA Remover(東洋紡株式会社(TOYOBO社))を用いてcDNAを作製した。作製したcDNAをPremix Ex Taq(登録商標)を用いてqRT−PCRにより解析した。測定結果より、Blank群の培地のみ(Blank control)の各遺伝子発現を1とし、大気汚染物質も添加した場合の相対値を算出した(図14)。なお、Taqman ProbeはApplied Biosystem社より購入した。各Taqman Probeは、GAPDH:Hs02758991_g1、TYR:Hs00165976_m1を使用した。
表皮角化細胞・メラニン細胞から成る皮膚3次元モデル(クラボウ社、MEL−300A)を表皮モデル培養用培地(クラボウ、EPI−100LLMM)を用いて、37℃、5%炭酸ガス及び95%空気の環境下で24時間培養した。培養後、表皮上面から自動車排気ガスもしくは都市大気粉塵を各濃度で溶解したPBSを添加し、さらに1日培養した。培養後、PBS(―)で洗浄し、組織を回収した後、バイオマッシャー(ニッピ社)により組織を粉砕した。その後、RNeasy Tissue Mini Kit(Qiagen社)を用いてRNAを抽出したのち、TOYOBO ReverTra Ace qPCR RT Master Mix with gDNA Remover(東洋紡株式会社(TOYOBO社))を用いてcDNAを作製した。作製したcDNAをPremix Ex Taq(登録商標)を用いてqRT−PCRにより解析した。測定結果より、PBSのみ(control)の各遺伝子発現を1とし、大気汚染物質も添加した場合の相対値を算出した(図15A〜C)。なお、Taqman ProbeはApplied Biosystem社より購入した。各Taqman Probeは、GAPDH:Hs02758991_g1、PTGS2:Hs00153133_m1、TYR:Hs00165976_m1を使用した。
96well plate(Cell Bind、Corning社)にNHEKを細胞数15000cells/wellで播種した。37℃、5%炭酸ガス及び95%空気の環境下で24時間培養後、候補化合物(オウゴン根エキス(丸善製薬社)、ビルベリー葉エキス(一丸ファルコス社)、加水分解ローヤルゼリー(片倉チッカリン社)、ひまわり種子オイル(RAHN社)、ニガハッカ(SEDERMA社)、グリセリルグルコシド、マタタビ果実エキス(丸善製薬社)、ニコチン酸アミド、グリコーゲン)を各濃度にて溶解させた培地に交換し培養した。24時間培養後、都市大気粉塵と候補化合物を各濃度にて溶解させた培地に交換し、さらに一日培養した。培養後、PBS(−)で2回洗浄し、CellROX(登録商標) Green Reagent, for oxidative stress detection(Thermo Fisher Scientific社)とHoechst 33342を培地に希釈し、well内培地と置換した。37℃、5%炭酸ガス及び95%空気の環境下で30分培養後、ImageExpressで画像撮影した(16視野/well)。蛍光強度測定プログラムと細胞カウントプログラムで解析し、細胞数あたりの酸化ストレス活性を測定した。測定結果より、培地のみ(コントロール)の細胞数あたりの酸化ストレス活性を1とし、大気汚染物質も添加した場合の相対値を算出した(図16A〜I)。
96well plate(Cell Bind、Corning社)にNHEKを細胞数15000cells/wellで播種した。37℃、5%炭酸ガス及び95%空気の環境下で24時間培養後、候補化合物(オウゴン根エキス(丸善製薬)、ツボクサ葉エキス(バイエル社)、ゼニアオイ花エキス(丸善製薬社)、ビルベリー葉エキス(一丸ファルコス社)、ドクダミエキス(一丸ファルコス社)、メリアアザジラクタ葉エキス(一丸ファルコス社)、アルゲエキス(一丸ファルコス社)、ニガハッカ(SEDERMA社))を各濃度にて溶解させた培地に交換し培養した。24時間培養後、都市大気粉塵と候補化合物を各濃度にて溶解させた培地に交換し、さらに一日培養した。培養後、上清(ELISA用サンプル)を回収し、Human MMP1 DuoSet ELISA Kit(R&Dシステムズ社)にてMMP1の発現量を測定した。また、上清を除去した培養プレートをPBS(―)で2回洗浄し、Hoechst 33342を培地に希釈し、well内培地と置換した。37℃、5%炭酸ガス及び95%空気の環境下で10分培養後、ImageExpressで画像撮影した(16視野/well)。細胞カウントプログラムで解析し、細胞数を測定した。測定結果より、培地のみ(コントロール)の細胞数あたりのMMP1の発現量をそれぞれ1とし、大気汚染物質や候補素材を添加した場合の細相対値を算出した(図17A〜H)。
24well plate(Cell Bind、Corning社)にNHEKを細胞数80000cells/wellで播種した。37℃、5%炭酸ガス及び95%空気の環境下で24時間培養後、候補化合物(アラントイン、リドカイン、イソプロピルメチルフェノール、ジフェンヒドラミン塩酸塩、ジフェンヒドラミン、ヒアルロン酸ナトリウム、塩化マグネシウム、コレステロール、グリチルリチン酸二カリウム、ジフェンヒドラミンとコレステロールの同時添加、グリチルリチン酸二カリウムとコレステロールの同時添加)とCPを各濃度にて溶解させた培地に交換し、さらに6時間培養した。培養後、トータルRNAを細胞から抽出した。IL−33のmRNA発現をqRT−PCRにより測定し、GAPDH発現により標準化した。結果は、平均±標準偏差(n=3)で示した。P値は、ダネットの検定により、コントロール群に対する比較により、*P<0.05、**P<0.01、***P<0.001で示した。(図18A〜L)。
24well plate(Cell Bind、Corning社)にNHEKを細胞数80000cells/wellで播種した。37℃、5%炭酸ガス及び95%空気の環境下で24時間培養後、候補化合物(ウフェナマート、ジフェンヒドラミン、グリチルレチン酸、コレステロール、リドカイン)とGKDを各濃度にて溶解させた培地に交換し、さらに24時間培養した。培養後、トータルRNAを細胞から抽出した。IL−33のmRNA発現をqRT−PCRにより測定し、GAPDH発現により標準化した。結果は、平均±標準偏差(n=3)で示した。P値は、ダネットの検定により、コントロール群に対する比較により、*P<0.05、**P<0.01、***P<0.001で示した。(図19A〜E)。
Claims (13)
- IL−8発現抑制物質を少なくとも1種以上含有する、大気汚染物質による皮膚障害改善用組成物。
- 前記皮膚障害が、皮膚炎症及び/又はかゆみである、請求項1に記載の組成物。
- 前記IL−8発現抑制物質が、ヒアルロン酸及びその塩、ヒアルロン酸の誘導体及びその塩、アーティチョークエキス、トラネキサム酸及びその塩、クマザサ葉エキス、ツバキエキス、バラエキス、シソエキス、オウゴンエキス、甘草エキス、アマチャエキス、アロエ葉エキス、ノイバラ果実エキス、オウレンエキス、ビワ葉エキス、サクラ葉エキス、ローズマリー葉エキス、コンフリー葉エキス、セージ葉エキス、タイムエキス、ニンジン根エキス、アラントイン、ウフェナマート、グリチルリチン酸及びその塩、グリチルレチン酸及びその塩、グリチルレチン酸ステアリル、並びに、コレステロール類からなる群より選ばれる1種又は2種以上である請求項1又は2に記載の組成物。
- Claudin発現促進物質及び/又はOcculudin発現促進物質を少なくとも1種以上含有する、大気汚染物質による皮膚障害改善用組成物。
- 前記皮膚障害が、皮膚バリア機能の低下及び/又は未熟によるものである、請求項4に記載の組成物。
- 前記Claudin発現促進物質及び/又はOcculudin発現促進物質が、オレンジ果皮エキス、ビルベリー葉エキス、セイヨウシロヤナギ樹皮エキス、アルニカエキス、アシタバエキス、ハトムギエキス、イチョウ葉エキス、ウコンエキス、ノイバラエキス(エイジツエキス)、オウゴンエキス、ヨモギエキス、カミツレエキス、シソ葉エキス、モモエキス、メリッサエキス、ラベンダーエキス、及び、N‐ラウロイル‐L‐グルタミン酸とL‐リジンとの縮合物のナトリウム塩からなる群から選ばれる1種又は2種以上である、請求項4又は5に記載の組成物。
- 酸化ストレス抑制物質を少なくとも1種以上含有する、大気汚染物質による皮膚障害改善用組成物。
- 前記皮膚障害が、肌のしわ、しみ、にきび及びたるみからなる群より選択される少なくとも1種である、請求項7に記載の組成物。
- 前記酸化ストレス抑制物質が、オウゴンエキス、ビルベリーエキス、加水分解ローヤルゼリー、ヒマワリオイル、ニガハッカ、グリセリルグルコシド、マタタビエキス、ニコチン酸アミド、グリコーゲン、ツボクサエキス、ゼニアオイエキス、ドクダミエキス、メリアアザジラクタエキス、アルゲエキス、オウバクエキス、アスコルビン酸、イチョウ葉エキス、アマチャエキス、緑茶エキス、アロエ葉エキス、ハイビスカス花エキス、シソ葉エキス、ローズマリー葉エキス、セージ葉エキス、シトラスエキス、カミツレエキス、カンゾウエキス、アーティチョークエキス、及びユーカリエキスからなる群から選ばれる1種又は2種以上である、請求項7又は8に記載の組成物。
- IL−33発現抑制物質を少なくとも1種以上含有する、大気汚染物質による皮膚障害改善用組成物。
- 前記皮膚障害が、かゆみ、湿疹、皮膚炎、かぶれ、蕁麻疹、及び、ただれからなる群より選択される少なくとも1種である、請求項10に記載の組成物。
- 前記IL−33発現抑制物質が、アラントイン、リドカイン、イソプロピルメチルフェノール、ジフェンヒドラミン及びその塩、ヒアルロン酸及びその塩、ヒアルロン酸の誘導体及びその塩、塩化マグネシウム、コレステロール類、グリチルリチン酸及びその塩、グリチルレチン酸及びその塩、グリチルレチン酸ステアリル、並びに、ウフェナマートからなる群より選ばれる1種又は2種以上である、請求項10又は11に記載の組成物。
- 前記大気汚染物質が、自動車排気ガス、都市大気粉塵、花粉、及び、砂塵からなる群より選択される少なくとも1種である、請求項1〜12のいずれか一項に記載の組成物。
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JP6763497B1 (ja) * | 2020-03-25 | 2020-09-30 | 大正製薬株式会社 | ミネラル代謝異常抑制剤 |
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WO2019078370A1 (ja) | 2019-04-25 |
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