JPWO2019077663A1 - トンネル磁気抵抗効果素子、磁気メモリ、及び内蔵型メモリ - Google Patents
トンネル磁気抵抗効果素子、磁気メモリ、及び内蔵型メモリ Download PDFInfo
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- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
- G11C11/161—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect details concerning the memory cell structure, e.g. the layers of the ferromagnetic memory cell
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- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
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- G11C11/1659—Cell access
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- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
- G11C11/165—Auxiliary circuits
- G11C11/1675—Writing or programming circuits or methods
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L27/105—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration including field-effect components
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- H10B—ELECTRONIC MEMORY DEVICES
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- H10B61/22—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices comprising components having three or more electrodes, e.g. transistors of the field-effect transistor [FET] type
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- G01R33/00—Arrangements or instruments for measuring magnetic variables
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- G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
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Abstract
Description
Claims (10)
- 参照層と、トンネルバリア層と、垂直磁化誘起層と、前記トンネルバリア層と前記垂直磁化誘起層との間に積層方向に積層された磁化自由層と、
を備え、
前記垂直磁化誘起層は、前記磁化自由層に前記積層方向に沿った方向の磁気異方性を付与し、
前記磁化自由層は、前記トンネルバリア層の幅及び前記垂直磁化誘起層の幅のいずれよりも小さい幅を有する、トンネル磁気抵抗効果素子。 - 前記磁化自由層の最小幅は、前記トンネルバリア層の最大幅又は前記垂直磁化誘起層の最大幅よりも4nm以上小さい、請求項1に記載のトンネル磁気抵抗効果素子。
- 前記トンネルバリア層、前記磁化自由層及び垂直磁化誘起層の側面を覆う側壁部を更に備え、
前記側壁部は、絶縁材料を含む、請求項1又は2に記載のトンネル磁気抵抗効果素子。 - 前記絶縁材料は、窒化物材料を含む、請求項3に記載のトンネル磁気抵抗効果素子。
- 前記トンネルバリア層及び前記垂直磁化誘起層は、それぞれMgO又は一般式:AB2O4(式中、AはMg及びZnからなる群より選択される少なくとも一種の元素であり、Bは、Al、Ga及びInからなる群より選択される少なくとも一種の元素である)で表されるスピネル構造を有する酸化物材料からなる、請求項1〜4のいずれか一項に記載のトンネル磁気抵抗効果素子。
- 前記トンネルバリア層及び前記垂直磁化誘起層は、前記一般式:AB2O4で表されるスピネル構造を有する酸化物材料からなり、前記スピネル構造のAサイト及びBサイトの少なくとも一方が、複数の元素によって占められている、請求項5に記載のトンネル磁気抵抗効果素子。
- 前記トンネルバリア層及び前記垂直磁化誘起層は、前記一般式:AB2O4で表されるスピネル構造を有する酸化物材料からなり、前記スピネル構造のAサイト及びBサイトのそれぞれが、複数の元素によって占められている、請求項5に記載のトンネル磁気抵抗効果素子。
- 前記垂直磁化誘起層上に設けられたマスク層を更に備え、
前記マスク層は、前記磁化自由層の幅より小さい幅を有し、原子番号72番以上の重金属を含む、請求項1〜7のいずれか一項に記載のトンネル磁気抵抗効果素子。 - 請求項1〜8のいずれか一項に記載のトンネル磁気抵抗効果素子を記憶素子として備える磁気メモリ。
- 請求項9に記載の磁気メモリを備える内蔵型メモリ。
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PCT/JP2017/037420 WO2019077663A1 (ja) | 2017-10-16 | 2017-10-16 | トンネル磁気抵抗効果素子、磁気メモリ、及び内蔵型メモリ |
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US (1) | US10564229B2 (ja) |
EP (1) | EP3699955A4 (ja) |
JP (1) | JP6658982B2 (ja) |
KR (1) | KR102354021B1 (ja) |
CN (2) | CN117479817A (ja) |
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JP6410004B1 (ja) * | 2017-10-16 | 2018-10-24 | Tdk株式会社 | トンネル磁気抵抗効果素子、磁気メモリ、及び内蔵型メモリ |
US11476415B2 (en) * | 2018-11-30 | 2022-10-18 | International Business Machines Corporation | Patterning magnetic tunnel junctions and the like while reducing detrimental resputtering of underlying features |
WO2023228389A1 (ja) * | 2022-05-26 | 2023-11-30 | Tdk株式会社 | 磁気抵抗効果素子及び磁気抵抗効果素子の製造方法 |
CN116847715B (zh) * | 2023-08-30 | 2023-11-17 | 北京芯可鉴科技有限公司 | 基于交换偏置的自旋轨道矩磁存储单元、磁随机存储器 |
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- 2017-10-16 EP EP17929307.1A patent/EP3699955A4/en active Pending
- 2017-10-16 US US16/080,910 patent/US10564229B2/en active Active
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JP2014207469A (ja) * | 2010-03-10 | 2014-10-30 | 国立大学法人東北大学 | 磁気抵抗効果素子、磁性膜、及び、磁性膜の製造方法 |
JP2012019163A (ja) * | 2010-07-09 | 2012-01-26 | Toshiba Corp | 磁気ランダムアクセスメモリ及びその製造方法 |
JP2015201515A (ja) * | 2014-04-07 | 2015-11-12 | Tdk株式会社 | 薄膜磁性素子およびそれを備えた高周波デバイス |
JP2015038998A (ja) * | 2014-09-12 | 2015-02-26 | 株式会社東芝 | 磁気記録素子及び磁気メモリ |
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