JPWO2016152839A1 - エポキシ樹脂組成物 - Google Patents
エポキシ樹脂組成物 Download PDFInfo
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- JPWO2016152839A1 JPWO2016152839A1 JP2017508347A JP2017508347A JPWO2016152839A1 JP WO2016152839 A1 JPWO2016152839 A1 JP WO2016152839A1 JP 2017508347 A JP2017508347 A JP 2017508347A JP 2017508347 A JP2017508347 A JP 2017508347A JP WO2016152839 A1 JPWO2016152839 A1 JP WO2016152839A1
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- Prior art keywords
- epoxy resin
- group
- resin composition
- phosphorus
- atom
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000003822 epoxy resin Substances 0.000 title claims abstract description 121
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 121
- 239000000203 mixture Substances 0.000 title claims abstract description 71
- 229910052698 phosphorus Inorganic materials 0.000 claims abstract description 71
- 239000011574 phosphorus Substances 0.000 claims abstract description 69
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims abstract description 64
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 claims abstract description 45
- 150000001875 compounds Chemical class 0.000 claims abstract description 44
- 239000003063 flame retardant Substances 0.000 claims abstract description 43
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 30
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 26
- 125000004430 oxygen atom Chemical group O* 0.000 claims abstract description 22
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 21
- 125000003118 aryl group Chemical group 0.000 claims abstract description 20
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 20
- 125000004434 sulfur atom Chemical group 0.000 claims abstract description 20
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 11
- 125000004433 nitrogen atom Chemical group N* 0.000 claims abstract description 6
- 125000001183 hydrocarbyl group Chemical group 0.000 claims abstract 4
- -1 aromatic bromine compound Chemical class 0.000 claims description 48
- 239000000463 material Substances 0.000 claims description 21
- 229910052736 halogen Inorganic materials 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 8
- 125000000524 functional group Chemical group 0.000 claims description 7
- 150000002367 halogens Chemical class 0.000 claims description 7
- 239000000835 fiber Substances 0.000 claims description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 5
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 claims description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 239000011888 foil Substances 0.000 claims description 3
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims description 2
- 239000012796 inorganic flame retardant Substances 0.000 claims description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims 1
- 229910052794 bromium Inorganic materials 0.000 claims 1
- 239000012784 inorganic fiber Substances 0.000 claims 1
- 238000010030 laminating Methods 0.000 claims 1
- 239000011342 resin composition Substances 0.000 abstract description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 37
- 238000006243 chemical reaction Methods 0.000 description 35
- 229920003986 novolac Polymers 0.000 description 22
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 21
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 21
- 239000000047 product Substances 0.000 description 21
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 20
- 239000000243 solution Substances 0.000 description 19
- 125000003700 epoxy group Chemical group 0.000 description 18
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 17
- 238000010992 reflux Methods 0.000 description 17
- 229920005989 resin Polymers 0.000 description 17
- 239000011347 resin Substances 0.000 description 17
- 239000002904 solvent Substances 0.000 description 17
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 description 16
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 14
- 229910019142 PO4 Inorganic materials 0.000 description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 14
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 14
- 235000021317 phosphate Nutrition 0.000 description 14
- 238000003756 stirring Methods 0.000 description 13
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 12
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- 239000003085 diluting agent Substances 0.000 description 12
- 238000004519 manufacturing process Methods 0.000 description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- 239000010452 phosphate Substances 0.000 description 10
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 9
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 9
- 239000000565 sealant Substances 0.000 description 9
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 8
- 238000005266 casting Methods 0.000 description 8
- 239000011256 inorganic filler Substances 0.000 description 8
- 229910003475 inorganic filler Inorganic materials 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 150000001412 amines Chemical class 0.000 description 7
- 238000011156 evaluation Methods 0.000 description 7
- 150000002430 hydrocarbons Chemical group 0.000 description 7
- 239000012044 organic layer Substances 0.000 description 7
- 239000005011 phenolic resin Substances 0.000 description 7
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 7
- 239000002994 raw material Substances 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 6
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 150000008065 acid anhydrides Chemical class 0.000 description 6
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 238000013329 compounding Methods 0.000 description 6
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 6
- 239000012153 distilled water Substances 0.000 description 6
- 230000007613 environmental effect Effects 0.000 description 6
- 239000005350 fused silica glass Substances 0.000 description 6
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 6
- 150000002989 phenols Chemical class 0.000 description 6
- 239000004848 polyfunctional curative Substances 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- 229920000877 Melamine resin Polymers 0.000 description 5
- 238000001816 cooling Methods 0.000 description 5
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 5
- WSFSSNUMVMOOMR-UHFFFAOYSA-N formaldehyde Natural products O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 5
- 230000009477 glass transition Effects 0.000 description 5
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 239000012299 nitrogen atmosphere Substances 0.000 description 5
- 230000000704 physical effect Effects 0.000 description 5
- 229960001755 resorcinol Drugs 0.000 description 5
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 4
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 4
- 229930185605 Bisphenol Natural products 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 description 4
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 4
- 239000007983 Tris buffer Substances 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 238000007259 addition reaction Methods 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 4
- XSAOTYCWGCRGCP-UHFFFAOYSA-K aluminum;diethylphosphinate Chemical compound [Al+3].CCP([O-])(=O)CC.CCP([O-])(=O)CC.CCP([O-])(=O)CC XSAOTYCWGCRGCP-UHFFFAOYSA-K 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 150000004982 aromatic amines Chemical class 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 229930003836 cresol Natural products 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 150000002170 ethers Chemical class 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 4
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 4
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 239000003973 paint Substances 0.000 description 4
- FAIAAWCVCHQXDN-UHFFFAOYSA-N phosphorus trichloride Chemical compound ClP(Cl)Cl FAIAAWCVCHQXDN-UHFFFAOYSA-N 0.000 description 4
- 229920000768 polyamine Polymers 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 239000004305 biphenyl Substances 0.000 description 3
- 235000010290 biphenyl Nutrition 0.000 description 3
- 238000002485 combustion reaction Methods 0.000 description 3
- 239000011889 copper foil Substances 0.000 description 3
- 229910002026 crystalline silica Inorganic materials 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 239000004744 fabric Substances 0.000 description 3
- 239000003365 glass fiber Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 150000002460 imidazoles Chemical class 0.000 description 3
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 3
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- 239000001993 wax Substances 0.000 description 3
- MFFNRVNPBJQZFO-UHFFFAOYSA-N (2,6-dimethylphenyl) dihydrogen phosphate Chemical compound CC1=CC=CC(C)=C1OP(O)(O)=O MFFNRVNPBJQZFO-UHFFFAOYSA-N 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 2
- PISLZQACAJMAIO-UHFFFAOYSA-N 2,4-diethyl-6-methylbenzene-1,3-diamine Chemical compound CCC1=CC(C)=C(N)C(CC)=C1N PISLZQACAJMAIO-UHFFFAOYSA-N 0.000 description 2
- GJYCVCVHRSWLNY-UHFFFAOYSA-N 2-butylphenol Chemical compound CCCCC1=CC=CC=C1O GJYCVCVHRSWLNY-UHFFFAOYSA-N 0.000 description 2
- SYBYTAAJFKOIEJ-UHFFFAOYSA-N 3-Methylbutan-2-one Chemical compound CC(C)C(C)=O SYBYTAAJFKOIEJ-UHFFFAOYSA-N 0.000 description 2
- 239000004114 Ammonium polyphosphate Substances 0.000 description 2
- LTPBRCUWZOMYOC-UHFFFAOYSA-N Beryllium oxide Chemical compound O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 2
- 0 CC(C)(CC(COc1ccc(C(C)(C)C(C=C2)=CCC2O*)cc1)O)Oc1ccc(C(C)(C)c(cc2)ccc2O*)cc1 Chemical compound CC(C)(CC(COc1ccc(C(C)(C)C(C=C2)=CCC2O*)cc1)O)Oc1ccc(C(C)(C)c(cc2)ccc2O*)cc1 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- 229920000742 Cotton Polymers 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 235000019826 ammonium polyphosphate Nutrition 0.000 description 2
- 229920001276 ammonium polyphosphate Polymers 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 239000011324 bead Substances 0.000 description 2
- VCCBEIPGXKNHFW-UHFFFAOYSA-N biphenyl-4,4'-diol Chemical compound C1=CC(O)=CC=C1C1=CC=C(O)C=C1 VCCBEIPGXKNHFW-UHFFFAOYSA-N 0.000 description 2
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 2
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 2
- 125000004491 isohexyl group Chemical group C(CCC(C)C)* 0.000 description 2
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- IVSZLXZYQVIEFR-UHFFFAOYSA-N m-xylene Chemical group CC1=CC=CC(C)=C1 IVSZLXZYQVIEFR-UHFFFAOYSA-N 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- IXQGCWUGDFDQMF-UHFFFAOYSA-N o-Hydroxyethylbenzene Natural products CCC1=CC=CC=C1O IXQGCWUGDFDQMF-UHFFFAOYSA-N 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 150000003003 phosphines Chemical class 0.000 description 2
- 125000004437 phosphorous atom Chemical group 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920006389 polyphenyl polymer Polymers 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
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- 239000012779 reinforcing material Substances 0.000 description 1
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- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
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- 239000010959 steel Substances 0.000 description 1
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- 229940014800 succinic anhydride Drugs 0.000 description 1
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- 235000007586 terpenes Nutrition 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- BRKFQVAOMSWFDU-UHFFFAOYSA-M tetraphenylphosphanium;bromide Chemical compound [Br-].C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 BRKFQVAOMSWFDU-UHFFFAOYSA-M 0.000 description 1
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- 239000010936 titanium Substances 0.000 description 1
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- STCOOQWBFONSKY-UHFFFAOYSA-N tributyl phosphate Chemical compound CCCCOP(=O)(OCCCC)OCCCC STCOOQWBFONSKY-UHFFFAOYSA-N 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
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- WLPUWLXVBWGYMZ-UHFFFAOYSA-N tricyclohexylphosphine Chemical compound C1CCCCC1P(C1CCCCC1)C1CCCCC1 WLPUWLXVBWGYMZ-UHFFFAOYSA-N 0.000 description 1
- UDUKMRHNZZLJRB-UHFFFAOYSA-N triethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OCC)(OCC)OCC)CCC2OC21 UDUKMRHNZZLJRB-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- DQWPFSLDHJDLRL-UHFFFAOYSA-N triethyl phosphate Chemical compound CCOP(=O)(OCC)OCC DQWPFSLDHJDLRL-UHFFFAOYSA-N 0.000 description 1
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- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
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- XZZNDPSIHUTMOC-UHFFFAOYSA-N triphenyl phosphate Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)(=O)OC1=CC=CC=C1 XZZNDPSIHUTMOC-UHFFFAOYSA-N 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- FIQMHBFVRAXMOP-UHFFFAOYSA-N triphenylphosphane oxide Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)(=O)C1=CC=CC=C1 FIQMHBFVRAXMOP-UHFFFAOYSA-N 0.000 description 1
- VRRIVXLVXXAHJA-UHFFFAOYSA-N tris(2,3,4-tribromophenyl) phosphate Chemical compound BrC1=C(Br)C(Br)=CC=C1OP(=O)(OC=1C(=C(Br)C(Br)=CC=1)Br)OC1=CC=C(Br)C(Br)=C1Br VRRIVXLVXXAHJA-UHFFFAOYSA-N 0.000 description 1
- LRSNDFOWYYKLHB-UHFFFAOYSA-N tris(2,3-dibromophenyl) phosphate Chemical compound BrC1=CC=CC(OP(=O)(OC=2C(=C(Br)C=CC=2)Br)OC=2C(=C(Br)C=CC=2)Br)=C1Br LRSNDFOWYYKLHB-UHFFFAOYSA-N 0.000 description 1
- JZZBTMVTLBHJHL-UHFFFAOYSA-N tris(2,3-dichloropropyl) phosphate Chemical compound ClCC(Cl)COP(=O)(OCC(Cl)CCl)OCC(Cl)CCl JZZBTMVTLBHJHL-UHFFFAOYSA-N 0.000 description 1
- KOWVWXQNQNCRRS-UHFFFAOYSA-N tris(2,4-dimethylphenyl) phosphate Chemical compound CC1=CC(C)=CC=C1OP(=O)(OC=1C(=CC(C)=CC=1)C)OC1=CC=C(C)C=C1C KOWVWXQNQNCRRS-UHFFFAOYSA-N 0.000 description 1
- WTLBZVNBAKMVDP-UHFFFAOYSA-N tris(2-butoxyethyl) phosphate Chemical compound CCCCOCCOP(=O)(OCCOCCCC)OCCOCCCC WTLBZVNBAKMVDP-UHFFFAOYSA-N 0.000 description 1
- HQUQLFOMPYWACS-UHFFFAOYSA-N tris(2-chloroethyl) phosphate Chemical compound ClCCOP(=O)(OCCCl)OCCCl HQUQLFOMPYWACS-UHFFFAOYSA-N 0.000 description 1
- GTRSAMFYSUBAGN-UHFFFAOYSA-N tris(2-chloropropyl) phosphate Chemical compound CC(Cl)COP(=O)(OCC(C)Cl)OCC(C)Cl GTRSAMFYSUBAGN-UHFFFAOYSA-N 0.000 description 1
- LIPMRGQQBZJCTM-UHFFFAOYSA-N tris(2-propan-2-ylphenyl) phosphate Chemical compound CC(C)C1=CC=CC=C1OP(=O)(OC=1C(=CC=CC=1)C(C)C)OC1=CC=CC=C1C(C)C LIPMRGQQBZJCTM-UHFFFAOYSA-N 0.000 description 1
- SPUXJWDKFVXXBI-UHFFFAOYSA-N tris(2-tert-butylphenyl) phosphate Chemical compound CC(C)(C)C1=CC=CC=C1OP(=O)(OC=1C(=CC=CC=1)C(C)(C)C)OC1=CC=CC=C1C(C)(C)C SPUXJWDKFVXXBI-UHFFFAOYSA-N 0.000 description 1
- BHYQWBKCXBXPKM-UHFFFAOYSA-N tris[3-bromo-2,2-bis(bromomethyl)propyl] phosphate Chemical compound BrCC(CBr)(CBr)COP(=O)(OCC(CBr)(CBr)CBr)OCC(CBr)(CBr)CBr BHYQWBKCXBXPKM-UHFFFAOYSA-N 0.000 description 1
- 238000009849 vacuum degassing Methods 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- DXZMANYCMVCPIM-UHFFFAOYSA-L zinc;diethylphosphinate Chemical compound [Zn+2].CCP([O-])(=O)CC.CCP([O-])(=O)CC DXZMANYCMVCPIM-UHFFFAOYSA-L 0.000 description 1
- XAEWLETZEZXLHR-UHFFFAOYSA-N zinc;dioxido(dioxo)molybdenum Chemical compound [Zn+2].[O-][Mo]([O-])(=O)=O XAEWLETZEZXLHR-UHFFFAOYSA-N 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
- B32B15/092—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin comprising epoxy resins
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/06—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the heating method
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/10—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the pressing technique, e.g. using action of vacuum or fluid pressure
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/24—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/24—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
- C08J5/241—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs using inorganic fibres
- C08J5/244—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs using inorganic fibres using glass fibres
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/24—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
- C08J5/249—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs characterised by the additives used in the prepolymer mixture
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- C—CHEMISTRY; METALLURGY
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Abstract
Description
本発明の第二の目的は、硬化物のTgが高いエポキシ樹脂組成物を用いてなる積層板を提供することにある。
即ち本発明は、エポキシ樹脂(A)、硬化剤(B)、及び下記一般式(1)で表される含リン化合物(C)を含有することを特徴とするエポキシ樹脂組成物、及び、該エポキシ樹脂組成物を用いてなる積層板である。
但し、上記式(1)中のmは2〜10の整数を表し、R1〜R4はそれぞれ独立に、水素原子、アルキル基、又はアリール基を表し、R5は、酸素原子、硫黄原子、又は窒素原子を含んでもよい炭化水素基を表し、Xは、酸素原子又は硫黄原子を表し、Yは、酸素原子、硫黄原子、又は―NR6―を表し、R6は、水素原子、アルキル基、又はアリール基を表す。
また、本発明のエポキシ樹脂組成物の用途は特に限定されるものではなく、例えば、電子回路基板に用いられる積層板、電子部品に用いられる封止剤、注型材、フィルム材、接着剤、電気絶縁塗料、難燃性の必要な複合材、及び粉体塗料等に使用することができる。本発明においては、特に電子回路基板に用いられる積層板、電子部品に用いられる封止剤、及び注型材に使用することが好ましく、積層板に使用することが最も好ましい。
エポキシ基の数が1個の反応性希釈剤としては、例えばn−ブチルグリシジルエーテル、C12〜C14のアルキルグリシジルエーテル、アリルグリシジルエーテル、2−エチルヘキシルグリシジルエーテル、スチレンオキシド、フェニルグリシジルエーテル、クレジルグリシジルエーテル、p−sec−ブチルフェニルグリシジルエーテル、t−ブチルフェニルグリシジルエーテル、グリシジルメタクリレート、及び3級カルボン酸グリシジルエステル等が挙げられる。
エポキシ基の数が2個の反応性希釈剤としては、例えば、エチレングリコールジグリシジルエーテル、プロピレングリコールジグリシジルエーテル、ブタンジオールジグリシジルエーテル、1,6−ヘキサンジオールジグリシジルエーテル、及びネオペンチルグリコールジグリシジルエーテル等が挙げられる。
エポキシ基の数が3個の反応性希釈剤としては、トリメチロールプロパントリグリシジルエーテル、及びグリセリントリグリシジルエーテル等が挙げられる。
積層板に用いられるエポキシ樹脂組成物の場合には、製品のガラス転移温度の低下を避ける観点から、反応性希釈剤を使用しないことが好ましい。
封止剤又は注型材に用いられるエポキシ樹脂組成物の場合には、エポキシ樹脂(A)100質量部に対して反応性希釈剤を3〜50質量部配合することが好ましく、5〜30質量部配合することがより好ましい。
具体的には、積層板の用途に関しては、フェノール樹脂類又は潜在性硬化剤を使用することが好ましく、フェノールノボラック樹脂、クレゾールノボラック樹脂、又はジシアンジアミド型潜在性硬化剤を使用することがより好ましい。
封止剤の用途に関しては、潜在性硬化剤又は酸無水物類を使用することが好ましく、注型材の用途に関しては、脂肪族アミン、芳香族アミン、又は酸無水物類を使用することが好ましい。これらの硬化剤は単独で使用しても、2種以上を併用してもよい。
但し、上記式(1)中のmは2〜10の整数を表し、R1〜R4はそれぞれ独立に、水素原子、アルキル基、又はアリール基を表し、R5は、酸素原子、硫黄原子、又は窒素原子を含んでも良い、炭化水素基を表し、Xは、酸素原子又は硫黄原子を表し、Yは、酸素原子、硫黄原子、又は―NR6―を表し、R6は、水素原子、アルキル基、又はアリール基を表す。
但し、上記式(3)中のmは2〜10の整数を表し、R1〜R4はそれぞれ独立に、水素原子、アルキル基、又はアリール基を表し、R5は、酸素原子、硫黄原子、又は窒素原子を含んでもよい、炭化水素基を表し、R17はアルキル基又はアリール基を表し、Xは、酸素原子又は硫黄原子を表し、Yは、酸素原子、硫黄原子、又は―NR6―を表し、R6は、水素原子、アルキル基、又はアリール基を表す。
但し、上記式(2−1)中の、pは0〜3の整数を表し、R7は、水素原子又は炭素数が1〜4のアルキル基を表し、R8は単結合、メチレン基、又は−C(CH3)2−を表し、R9〜R10は、独立して、水素原子、又は炭素数が1〜6のアルキル基を表す。
本発明においては、上記した化合物の内、更に、R5が前記式(2−1)で表される官能基でありR7が水素原子である化合物が好ましく、R8がメチレン基、又は−C(CH3)2−であることが、原料が安価であり、製造を容易に行えるという観点から特に好ましい。
しかしながら難燃性の観点からは、R8はメチレン基、又は単結合であることが特に好ましい。
但し、上記式(4)中、mは2〜10の整数を表し、R1〜R4はそれぞれ独立に、水素原子、アルキル基、又はアリール基を表し、R5は、酸素原子、硫黄原子、又は窒素原子を含んでもよい、炭化水素基、Xは酸素原子又は硫黄原子、Yは、酸素原子、硫黄原子、又は―NR6―を表し、R6は、水素原子、アルキル基、又はアリール基を表す。
上記ハロゲンを含有しない含リン難燃剤としては、リン含有フェノキシ樹脂(例えば、新日鐵化学(株)製のフェノトートERF−001M30、及びTX−0924K30等)、水酸基含有リン酸エステル(例えば、大八化学工業(株)製のDAIGUARD−580、及びDAIGUARD−610等)、HCA誘導体(例えば、三光(株)製のHCA−HQ、M−Ester、及びME−P8等)等が既に上市されている。
上記含リン難燃剤の中では、難燃性の効果が非常に優れているという点で、トリスジエチルホスフィン酸アルミニウム、及び、10−(2,5−ジヒドロキシフェニル)−9, 10−ジヒドロ−9−オキサ−10−フォスファフェナントレン−10−オキシドが特に好ましい。
通常、本発明のエポキシ樹脂組成物における「全固形分」中に占める上記添加剤の量は、5質量%以下とわずかである。
上記プリプレグの基材としては、例えば、ガラス繊維、ポリイミド、ポリエステル及びテトラフルオロエチレン等の有機繊維、並びにそれらの混合物等の、公知のものを使用することができる。
尚、以下の実施例等における%は、特に記載がない限り質量基準である。また、プリプレグの外観は、目視観察した場合に、均一な外観のものを良好と評価し、外観が不均一な物を不良とした。同様に、プリプレグを用いて加圧硬化させ、両面銅張積層板を作製した後の外観を目視で観察し、評価した。均一に硬化して、プリプレグが成形されているものを成型性が良好とし、不均一に硬化したプリプレグを、成型性が不良であると評価した。
<判定方法>
試験片を垂直に保ち、下端にバーナーの火を10秒間接炎させた後バーナーの火を取り除き、試験片に着火した火が消える迄の時間を測定した。次に、火が消えると同時に2回目の接炎を10秒間行ない、1回目と同様にして、着火した火が消える迄の時間を測定した。その操作を5回行った後の、1回目の火が消える迄の時間の平均値(以下、T1とする)、2回目の火が消える迄の時間の平均値(以下、T2とする)を計算した。同時に、5回操作分の合計燃焼時間を計算した。また、落下する火種により、試験片の下に置いた綿が着火するか否かについても同時に評価した。
合計燃焼時間、綿着火の有無等の結果から、UL−94V規格にしたがって燃焼ランクを評価した。燃焼ランクはV−0が最高であり、V−1、V−2となるにしたがって難燃性は低下する。但し、V−0〜V−2のランクの何れにも該当しないものはNRとした。
<含リン塩化物P−1の合成>
回転子、還流管、温度計及び窒素導入口を備えた300mLの丸底フラスコに、ビスフェノールAを22.8g(0.1mol)、塩化ホスホリルを306.7g(2.0mol)、及び無水塩化マグネシウムを0.3g(3.0mmol)入れて、反応溶液が還流するまで加熱し、24時間撹拌した。その際、反応で発生する塩化水素ガスを、還流管上部から水酸化ナトリウム水溶液に導入してトラップした。反応終了後、エバポレーターを用いて過剰の塩化ホスホリルを除去し、含リン塩化物P−1を得た。得られたP−1をTHF100mLに溶解させ、P−1のTHF溶液を得た。
撹拌羽、還流管、滴下漏斗及び温度計を備えた500mLの丸底フラスコに、メチルアミンのTHF溶液を210mL(2.0mol/L、メチルアミン:0.42mol)及びトリエチルアミン42.5g(0.42mol)を入れた。窒素雰囲気下で、反応溶液を撹拌・冷却しながら、上記P−1のTHF溶液を反応温度が0℃を超えないように滴下し、滴下終了後、25℃で24時間撹拌した。反応終了後、エバポレーターで溶媒及び過剰の原料を除去し、残渣をクロロホルム300mLで溶解して分液漏斗に移した。蒸留水100mLで2回洗浄し、有機層を無水硫酸マグネシウムで乾燥し、エバポレーターで溶媒を除去して含リン化合物(C−1)を18.8g(収率85.3%)得た。含リン化合物(C−1)の理論リン含有量は14.1質量%である。
<含リン塩化物P−2の合成>
回転子、還流管、温度計及び窒素導入口を備えた300mLの丸底フラスコに、4,4‘−ビフェノールを14.9g(80mmol)、塩化ホスホリルを245.3g(1600mmol)、及び無水塩化マグネシウム0.2g(2.4mmol)を入れて、反応溶液が還流するまで加熱し、24時間撹拌した。その際、反応に伴って発生する塩化水素ガスを、還流管上部から水酸化ナトリウム水溶液に導入してトラップした。反応終了後、エバポレーターで過剰の塩化ホスホリルを除去し、含リン塩化物P−2を得た。得られたP−2をTHF80mLに溶解させ、P−2のTHF溶液を得た。
撹拌羽、還流管、滴下漏斗及び温度計を備えた500mLの丸底フラスコに、メチルアミンのTHF溶液を170mL(2.0mol/L、メチルアミン:0.34mol)、及びトリエチルアミン34.4g(0.34mol)を入れた。窒素雰囲気下で、反応溶液を撹拌・冷却しながら、上記P−2のTHF溶液を、反応温度が0℃を超えないように滴下し、滴下終了後、24時間撹拌した。反応終了後、エバポレーターで溶媒及び過剰の原料を除去し、残渣をクロロホルム300mLで溶解して分液漏斗に移した。蒸留水100mLで2回洗浄し、有機層を無水硫酸マグネシウムで乾燥した後、エバポレーターで溶媒を除去して含リン化合物(C−2)を5.4g(収率16.9%)得た。含リン化合物(C−2)の理論リン含有量は15.5重量%である。
撹拌羽、還流管、温度計、滴下漏斗、セプタムを備えた500mL五口フラスコを十分に乾燥、窒素置換し、4,4’−ビフェノールを29.8g(0.16mol)、トリエチルアミン34.4g(0.34mol)、超脱水テトラヒドロフラン300mLを仕込んだ。滴下漏斗にジエチルホスフィン酸クロリド47.8g(0.34mol)を仕込み、反応温度が50℃を超えないように滴下した。滴下終了後、一晩攪拌した。反応溶液を分液漏斗に移し、クロロホルム500mL、飽和炭酸水素ナトリウム水溶液300mLを加えて良く撹拌し、油水分離後、水層を除去した。有機層を蒸留水200mLで二回水洗し、有機層を無水硫酸マグネシウムで乾燥、エバポレーターで溶媒を除去し含リン難燃剤(D−1)60.6g(収率96.1%)を得た。含リン難燃剤(D−1)の理論リン含有量は15.7重量%である。
<含リン塩化物P−4の合成>
回転子、還流管、温度計及び窒素導入口を備えた300mLの丸底フラスコに、レゾルシノールを14.3g(0.13mol)、塩化ホスホリルを398.7g(2.6mol)、及び無水塩化マグネシウムを0.4g(3.9mmol)入れて、反応溶液が還流するまで加熱し、24時間撹拌した。その際、反応に伴って発生する塩化水素ガスを、還流管上部から水酸化ナトリウム水溶液中に導入してトラップした。反応終了後、エバポレーターを用いて過剰の塩化ホスホリルを除去し、含リン塩化物P−4を得た。得られたP−4をTHF100mLに溶解させ、P−4のTHF溶液を得た。
撹拌羽、還流管、滴下漏斗及び温度計を備えた500mLの丸底フラスコに、メチルアミンのTHF溶液を224mL(2.0mol/L、メチルアミン:0.52mol)及びトリエチルアミン52.6g(0.52mol)を入れた。窒素雰囲気下で、反応溶液を撹拌・冷却しながら、上記P−4のTHF溶液を反応温度が0℃を超えないように滴下し、滴下終了後、25℃で24時間撹拌した。反応終了後、エバポレーターで溶媒及び過剰の原料を除去し、残渣をクロロホルム300mLで溶解して分液漏斗に移した。蒸留水100mLで2回洗浄し、有機層を無水硫酸マグネシウムで乾燥した後エバポレーターで溶媒を除去して、含リン化合物(C−3)を26.0g(収率62,1%)得た。含リン化合物(C−3)の理論リン含有量は19.2重量%である。
撹拌羽、還流管、滴下漏斗及び温度計を備えた500mLの丸底フラスコに、メチルアミンのTHF溶液を245mL(2.0mol/L、メチルアミン:0.57mol)及びトリエチルアミン57.7g(0.57mol)を入れた。窒素雰囲気下で、反応溶液を撹拌・冷却しながら、ジクロロリン酸フェニル57.0g(0.27mol)を反応温度が0℃を超えないように滴下し、滴下終了後、25℃で24時間撹拌した。反応終了後、エバポレーターで溶媒及び過剰の原料を除去し、残渣をクロロホルム300mLで溶解して分液漏斗に移した。蒸留水100mLで2回洗浄し、有機層を無水硫酸マグネシウムで乾燥した後、エバポレーターで溶媒を除去して、含リン難燃剤(D−2)を15.1g(収率27.9%)得た。含リン難燃剤(D−2)の理論リン含有量は15.5重量%である。
<含リン塩化物P−6の合成>
回転子、還流管、温度計及び窒素導入口を備えた300mLの丸底フラスコに、ビスフェノールFを16.0g(80mmol)、塩化ホスホリルを245.3g(1600mmol)、及び無水塩化マグネシウムを0.2g(2.4mmol)入れて、反応溶液が還流するまで加熱し、24時間撹拌した。その際、反応に伴って発生する塩化水素ガスを、還流管上部から水酸化ナトリウム水溶液中に導入してトラップした。反応終了後、エバポレーターで過剰の塩化ホスホリルを除去し、含リン塩化物P−6を得た。得られたP−6をTHF80mLに溶解させ、P−6のTHF溶液を得た。
撹拌羽、還流管、滴下漏斗及び温度計を備えた500mLの丸底フラスコに、メチルアミンのTHF溶液を170mL(2.0mol/L、メチルアミン:0.34mol)、及びトリエチルアミンを34.4g(0.34mol)入れた。窒素雰囲気下で、反応溶液を撹拌・冷却しながら、上記P−6のTHF溶液を、反応温度が0℃を超えないように滴下し、滴下終了後、24時間撹拌した。反応終了後、エバポレーターで溶媒及び過剰の原料を除去し、残渣をクロロホルム300mLで溶解して分液漏斗に移した。蒸留水100mLで2回洗浄し、有機層を無水硫酸マグネシウムで乾燥し、エバポレーターで溶媒を除去して含リン化合物(C−4)を25.2g(収率76.4%)得た。含リン化合物(C−4)の理論リン含有量は14.8重量%である。
EOCN−104S(クレゾールノボラック型エポキシ樹脂、日本化薬株式会社製)49.1g、HP−350(水酸化アルミニウム、昭和電工株式会社製)61.5g及びSFP−130MC(球状シリカ、電気化学工業株式会社製)61.5gをメチルエチルケトン100gに加え、三本ロールで分散させた。次いで、製造例1で得られたI−1を18g、メタノール20gに溶解して加えた。更に、EOCN−104S 50.9g、アデカハードナー EH−3636AS(ジシアンジアミド型潜在性硬化剤、株式会社ADEKA製)5g(5phr:エポキシ樹脂100質量部に対して5質量部)、及びメチルエチルケトン100gを追加してディスパーで分散し、樹脂ワニスを作製した。
表1に記載した組成で配合したこと以外は実施例1と同様にして、両面銅張積層板を作製して各種の評価を行った。結果は表1に示した通りである。
*1 HCA−HQ:下記一般式(5)で表される難燃剤、三光株式会社製
*2 FP−600:下記一般式(6)で表される難燃剤、株式会社ADEKA製
これに対して、比較例1の場合には、難燃性についてはある程度の効果が認められるものの、Tgに関しては満足できるものではないことが確認された。また、比較例2の場合には、プリプレグの作製時に用いた含リン難燃剤(HCA−HQ)が結晶化したので、均一なプリプレグを得ることができず、その後の評価もできなかった。
比較例3の場合には、両面銅張積層板作製時の加圧硬化の時に、含リン難燃剤(FP−600)と思われる成分が一部分離して、均一な積層板を得ることができなかったため、その後の評価をすることができなかった。また、比較例4及び5の場合には、難燃性及びTgの何れにおいても、良い評価を得られないことが確認された。
Claims (10)
- 前記式(1)中のX及びYが共に酸素原子である、請求項1に記載されたエポキシ樹脂組成物。
- 前記式(1)中のR5が、芳香環を1個、又は2個以上有する炭化水素基である、請求項1又は2に記載されたエポキシ樹脂組成物。
- 前記式(1)中のR1〜R4が、それぞれ独立して、水素原子、又は炭素数1〜6のアルキル基であり、R5が下記一般式(2−1)、(2−2)、(2−4)、(2−5)、及び(2−6)から選択される何れかの構造を有する官能基である、請求項1〜3の何れかに記載されたエポキシ樹脂組成物;
但し、上記式(2−1)中の、pは0〜3の整数を表し、R7は、水素原子又は炭素数が1〜4のアルキル基を表し、R8は単結合、メチレン基、又は−C(CH3)2−を表し、R9及びR10は、それぞれ独立に、水素原子、又は炭素数が1〜6のアルキル基を表す;
但し、上記式(2−2)中のnは0〜3の整数、oは0〜50の整数を表し、R11は、水素原子、又は炭素数が1〜4のアルキル基を表し、R12は、酸素原子又は硫黄原子を含んでもよい炭化水素基を表し、Zは水酸基、又は下記一般式(2−3)で表される官能基である;
但し、上記式(2−3)中のR13〜R16は、それぞれ独立に、水素原子、又は炭素数1〜6のアルキル基を表す;
- 前記R5が前記式(2−1)で表される官能基であり、前記R7が水素原子である請求項4に記載されたエポキシ樹脂組成物。
- さらに、難燃剤(D)を含有する、請求項1〜5の何れかに記載されたエポキシ樹脂組成物;ただし、前記難燃剤(D)は、無機難燃剤、芳香族臭素化合物、及び、含リン化合物(C)を除く含リン難燃剤からなる群の中から選択される、少なくとも1種の難燃剤である。
- 難燃剤(D)が、ハロゲンを含有しない含リン難燃剤である、請求項6に記載されたエポキシ樹脂組成物。
- 無機繊維及び有機繊維から選択された少なくとも1種の繊維からなるシート状基材と、請求項1〜7の何れかに記載されたエポキシ樹脂組成物とからなることを特徴とするプリプレグ。
- 請求項8に記載されたプリプレグ又は2以上の該プリプレグを積層してなる積層体の少なくとも一方の表面に金属箔を配置して積層し、熱圧着することを特徴とするエポキシ樹脂積層板の製造方法。
- 請求項9に記載された方法によって製造されてなるエポキシ樹脂積層板。
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