JPWO2012105550A1 - 樹脂組成物および半導体装置 - Google Patents
樹脂組成物および半導体装置 Download PDFInfo
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- JPWO2012105550A1 JPWO2012105550A1 JP2012555893A JP2012555893A JPWO2012105550A1 JP WO2012105550 A1 JPWO2012105550 A1 JP WO2012105550A1 JP 2012555893 A JP2012555893 A JP 2012555893A JP 2012555893 A JP2012555893 A JP 2012555893A JP WO2012105550 A1 JPWO2012105550 A1 JP WO2012105550A1
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- AKPNCJLPXARVFK-UHFFFAOYSA-N benzoyl 2-tert-butylperoxy-3-methylbenzoate Chemical compound CC1=CC=CC(C(=O)OC(=O)C=2C=CC=CC=2)=C1OOC(C)(C)C AKPNCJLPXARVFK-UHFFFAOYSA-N 0.000 description 1
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- GEMHFKXPOCTAIP-UHFFFAOYSA-N n,n-dimethyl-n'-phenylcarbamimidoyl chloride Chemical compound CN(C)C(Cl)=NC1=CC=CC=C1 GEMHFKXPOCTAIP-UHFFFAOYSA-N 0.000 description 1
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- SRSFOMHQIATOFV-UHFFFAOYSA-N octanoyl octaneperoxoate Chemical compound CCCCCCCC(=O)OOC(=O)CCCCCCC SRSFOMHQIATOFV-UHFFFAOYSA-N 0.000 description 1
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- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000005007 perfluorooctyl group Chemical group FC(C(C(C(C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)* 0.000 description 1
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- 239000004814 polyurethane Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- BWJUFXUULUEGMA-UHFFFAOYSA-N propan-2-yl propan-2-yloxycarbonyloxy carbonate Chemical compound CC(C)OC(=O)OOC(=O)OC(C)C BWJUFXUULUEGMA-UHFFFAOYSA-N 0.000 description 1
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 1
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- 230000009257 reactivity Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
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- 239000004332 silver Substances 0.000 description 1
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- WSFQLUVWDKCYSW-UHFFFAOYSA-M sodium;2-hydroxy-3-morpholin-4-ylpropane-1-sulfonate Chemical compound [Na+].[O-]S(=O)(=O)CC(O)CN1CCOCC1 WSFQLUVWDKCYSW-UHFFFAOYSA-M 0.000 description 1
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- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
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- OPQYOFWUFGEMRZ-UHFFFAOYSA-N tert-butyl 2,2-dimethylpropaneperoxoate Chemical compound CC(C)(C)OOC(=O)C(C)(C)C OPQYOFWUFGEMRZ-UHFFFAOYSA-N 0.000 description 1
- NMOALOSNPWTWRH-UHFFFAOYSA-N tert-butyl 7,7-dimethyloctaneperoxoate Chemical compound CC(C)(C)CCCCCC(=O)OOC(C)(C)C NMOALOSNPWTWRH-UHFFFAOYSA-N 0.000 description 1
- SWAXTRYEYUTSAP-UHFFFAOYSA-N tert-butyl ethaneperoxoate Chemical compound CC(=O)OOC(C)(C)C SWAXTRYEYUTSAP-UHFFFAOYSA-N 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 1
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- 238000001721 transfer moulding Methods 0.000 description 1
- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229940070710 valerate Drugs 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
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- 239000008096 xylene Substances 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- CHJMFFKHPHCQIJ-UHFFFAOYSA-L zinc;octanoate Chemical compound [Zn+2].CCCCCCCC([O-])=O.CCCCCCCC([O-])=O CHJMFFKHPHCQIJ-UHFFFAOYSA-L 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/02—Bonding areas ; Manufacturing methods related thereto
- H01L24/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
- C08L101/02—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L9/00—Compositions of homopolymers or copolymers of conjugated diene hydrocarbons
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L13/00—Compositions of rubbers containing carboxyl groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L15/00—Compositions of rubber derivatives
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J115/00—Adhesives based on rubber derivatives
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J201/00—Adhesives based on unspecified macromolecular compounds
- C09J201/02—Adhesives based on unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
- H01L23/3737—Organic materials with or without a thermoconductive filler
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
- H01L23/49503—Lead-frames or other flat leads characterised by the die pad
- H01L23/49513—Lead-frames or other flat leads characterised by the die pad having bonding material between chip and die pad
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Abstract
Description
本願は、2011年1月31日に日本に出願された特願2011−017747号に基づき優先権を主張し、その内容をここに援用する。
[1](A)少なくとも1つの官能基を有する共役ジエン化合物の重合体または共重合体、(B)熱硬化性樹脂、および(C)(メタ)アクリル重合体または共重合体を含有し、前記(C)(メタ)アクリル重合体または共重合体が、他の反応基と反応しうる反応性官能基を有するものである樹脂組成物。
なお、本発明では、ジエン系化合物の重合体または共重合体(A)、(メタ)アクリル重合体または共重合体(C)を総称して、それぞれ(共)重合体(A)、(共)重合体(C)とも記載する。
以下、本発明について詳細に説明する。
また、シアネート樹脂は、エポキシ樹脂、オキセタン樹脂、アクリル樹脂、マレイミド樹脂などの他の樹脂と併用することも可能である。
ジヒドラジド化合物の具体的な例としては、アジピン酸ジヒドラジド、ドデカン酸ジヒドラジド、イソフタル酸ジヒドラジド、p−オキシ安息香酸ジヒドラジドなどのカルボン酸ジヒドラジドなどが挙げられる。また酸無水物の具体的な例としては、フタル酸無水物、テトラヒドロ無水フタル酸、ヘキサヒドロ無水フタル酸、エンドメチレンテトラヒドロフタル酸無水物、ドデセニルコハク酸無水物などが挙げられる。一方、フェノール樹脂をエポキシ樹脂の硬化剤として用いる場合には、フェノール樹脂としては1分子内にフェノール性水酸基を2つ以上有する化合物であることが好ましい。これは、1分子内に含有するフェノール性水酸基の数が1つの場合にはエポキシ樹脂との反応で架橋構造をとることができず硬化物特性が悪化するためである。1分子内のフェノール性水酸基の数が2つ以上であれば使用可能であるが、好ましいフェノール性水酸基の数は2〜5である。これよりフェノール性水酸基の数が多い場合にはフェノール樹脂の分子量が大きくなるため樹脂の粘度が高くなり、得られる樹脂組成物も高粘度となるため好ましくない。より好ましい1分子内のフェノール性水酸基の数は2つまたは3つである。このような化合物としては、ビスフェノールF、ビスフェノールA、ビスフェノールS、テトラメチルビスフェノールA、テトラメチルビスフェノールF、テトラメチルビスフェノールS、ジヒドロキシジフェニルエーテル、ジヒドロキシベンゾフェノン、テトラメチルビフェノール、エチリデンビスフェノール、メチルエチリデンビス(メチルフェノール)、シクロへキシリデンビスフェノール、ビフェノールなどのビスフェノール類およびその誘導体、トリ(ヒドロキシフェニル)メタン、トリ(ヒドロキシフェニル)エタンなどの3官能のフェノール類およびその誘導体、フェノールノボラック、クレゾールノボラックなどのフェノール類とホルムアルデヒドを反応することで得られる化合物で2核体または3核体がメインのものおよびその誘導体などが挙げられる。
ここで本発明の樹脂組成物は、蛍光灯などの照明下で通常使用されるので、光重合開始剤が含まれていると使用中に反応によって粘度上昇が観察される。このため、実質的に光重合開始剤を含有することは好ましくない。実質的には、粘度上昇が観察されない程度で光重合開始剤が微量に存在してもよく、好ましくは含有しないことである。
水酸基価20mgKOH/gで分子量11000のアクリルオリゴマー(東亞合成(株)製、ARUFON(アルフォン)UH−2000、連鎖移動触媒を用いずに高温、高圧で連続塊状重合することにより得られる水酸基を有するアクリル系オリゴマー)110g、メタクリル酸(試薬)5g、トルエン(試薬)500gをセパラブルフラスコに入れディーンスタークトラップを用い還流下30分間攪拌し水分の除去を行った。室温まで冷却した後攪拌しながらジシクロヘキシルカルボジイミド10gを酢酸エチル50mlに溶解させた溶液を10分かけて滴下しその後室温で6時間反応した。反応後、攪拌しながら50mlのイオン交換水を添加することで過剰のジシクロヘキシルカルボジイミドを析出させた後、ディーンスタークトラップを用い還流下で30分間攪拌し水分の除去を行った。室温まで冷却した後反応液をろ過することで固形物を取り除き、70℃のイオン交換水にて3回、室温のイオン交換水にて2回にわたり分液洗浄を行った。溶剤層を再度ろ過することにより得られたろ液からエバポレータおよび真空乾燥機にて溶剤を除去し生成物を得た。(収率約98%。室温で液状。GPC測定により分子量(スチレン換算)が約12000であり、原料のメタクリル酸が残存していないことを確認した。重クロロホルムを用いたプロトンNMRの測定により水酸基の消失、メタクリル基の存在、エステル結合の生成を確認した。得られたアクリル共重合体4は分子量が12000でメタクリロイル基を約4個有する化合物であった。)
共役ジエン化合物の(共)重合体(A)としてポリブタジエンと無水マレイン酸との反応により得られる無水マレイン酸変性ポリブタジエン(Satomer社製、Ricobond1731、数平均分子量5400、酸無水物当量583、以下低応力剤1という)、熱硬化性樹脂(B)としてプロポキシ化ビスフェノールAジアクリレート(新中村化学(株)製、NKエステルA−BPP−3、以下モノマー1という)、1,6−ヘキサンジオールジメタクリレート(共栄社化学(株)製、ライトエステル1、6HX、以下モノマー2という)、イソボルニルメタクリレート(共栄社化学(株)製、ライトエステルIBX、以下モノマー3という)、(メタ)アクリル(共)重合体(C)として共役ジエン化合物の(共)重合体(A)の無水マレイン酸基と反応し得るグリシジル基を有するアクリル共重合体(東亞合成(株)製、ARUFON(アルフォン)UG−4010、重量平均分子量2900、エポキシ当量714、以下アクリル共重合体1という)、添加剤としてメタクリル基を有するシランカップリング剤(信越化学工業(株)製、KBM−503P、以下カップリング剤1という)、グリシジル基を有するシランカップリング剤(信越化学工業(株)製、KBM−403E、以下カップリング剤2という)、重合開始剤として1,1−ジ(tert−ブチルパーオキシ)シクロヘキサン(日本油脂(株)製、パーヘキサCS、以下重合開始剤1という)、充填剤として平均粒径3μm、最大粒径20μmのフレーク状銀粉(以下銀粉という)を表1のように配合し、3本ロールを用いて混練し脱泡することで樹脂組成物を得た。その後、後述の評価方法にて評価を行った結果を表1に示す。なお配合割合は重量%である。
表1に示す割合で配合し実施例1と同様に樹脂組成物を得た後、評価を行った。
なお、実施例2では、(メタ)アクリル(共)重合体(C)として、共役ジエン化合物の(共)重合体(A)の無水マレイン酸基と反応し得るグリシジル基を有するアクリル共重合体(東亞合成(株)製、ARUFON(アルフォン)UG−4035、重量平均分子量11000、エポキシ当量556、以下アクリル共重合体2という)を用い、実施例3では、(メタ)アクリル(共)重合体(C)として、共役ジエン化合物の(共)重合体(A)の無水マレイン酸基と反応し得る水酸基を有するアクリル共重合体(東亞合成(株)製、ARUFON(アルフォン)UH−2000、重量平均分子量11000、水酸基当量2806、以下アクリル共重合体3という)を用い、実施例4では、(メタ)アクリル(共)重合体(C)として、熱硬化性樹脂(B)の(メタ)アクリロイル基と反応し得るメタクリロイル基を有する上記アクリル共重合体4を用い、実施例5では、添加剤としてテトラスルフィドジトリエトキシシラン(ダイソー(株)製、CABRUS4、以下カップリング剤3という)を用い、実施例6では、重合開始剤としてジクミルパーオキサイド(日本油脂(株)製、パークミルD、以下重合開始剤2という)、充填剤として平均粒径0.5μmの球状シリカ(以下シリカという)を用い、実施例7では、共役ジエン化合物の(共)重合体(A)としてカルボキシル基変性ポリブタジエン(宇部興産(株)製、CTBN−1008SP、数平均分子量3500、以下低応力剤2という)を用い、実施例8では、共役ジエン化合物の(共)重合体(A)としてグリシジル基変性ポリブタジエン(日本曹達(株)製、JP−200、数平均分子量3600、以下低応力剤3という)を用いた。
表1に示す割合で配合し実施例1と同様に樹脂組成物を得た後、評価を行った。
なお比較例3〜5では、(メタ)アクリル(共)重合体として、共役ジエン化合物の(共)重合体(A)あるいは熱硬化性樹脂(B)が有する官能基のいずれに対しても反応しない無官能のアクリル共重合体(東亞合成(株)製、ARUFON(アルフォン)UP−1000、重量平均分子量3000、以下アクリル共重合体5)を用いた。
粘度:E型粘度計(3°コーン)を用いて25℃、2.5rpmでの値を樹脂組成物の作製直後に測定した。粘度の値が20±10Pa・Sであるものを合格とした。粘度の単位はPa・Sである。
打点試験:打点試験機(武蔵エンジニアリング(株)製、SHOTMASTER−300)により22Gシングルノズル(内径0.47mm)を用いて、樹脂組成物を1,000点塗布(塗布量約0.2mg/1点)した。その後、塗布した打点を真上から観察し空打ち数(塗布されなかったもの)および糸引き数(塗布時に糸切れが悪く打点から外に倒れてしまったもの)を測定した。空打ち数および糸引き数の合計が5%未満の場合を合格とした。打点試験の単位は%である。
得られた半導体装置を、85℃、相対湿度85%、72時間で吸湿処理した。その後、IRリフロー処理(260℃、10秒、3回リフロー)を行い、処理後の半導体装置を超音波探傷装置(透過型)により剥離の程度を測定した。ダイアタッチ部の剥離面積が10%未満の場合を合格とした。剥離面積の単位は%である。
なお表1中MAPBGAとは、上記BT基板を用いて作製した半導体装置の種類の名称であり、QFPとは、上記リードフレームを用いて作製した半導体装置の種類の名称である。
Claims (14)
- (A)少なくとも1つの官能基を有する共役ジエン化合物の重合体または共重合体、
(B)熱硬化性樹脂、
および(C)(メタ)アクリル重合体または共重合体を含有し、
前記(C)(メタ)アクリル重合体または共重合体が、他の反応基と反応しうる反応性官能基を有するものである樹脂組成物。 - 前記(C)(メタ)アクリル重合体または共重合体が、前記(A)少なくとも1つの官能基を有する共役ジエン化合物の重合体または共重合体が有する官能基と反応し得る反応性官能基を有するものである請求項1に記載の樹脂組成物。
- 前記(A)少なくとも1つの官能基を有する共役ジエン化合物の重合体または共重合体が、ブタジエンの重合体または共重合体である請求項2に記載の樹脂組成物。
- 前記(A)少なくとも1つの官能基を有する共役ジエン化合物の重合体または共重合体の有する官能基が、ビニル基、(メタ)アリル基、(メタ)アクリロイル基、エポキシ基、カルボキシル基、水酸基、または無水マレイン酸基からなる群から選ばれる少なくとも1つである請求項2に記載の樹脂組成物。
- 前記(B)熱硬化性樹脂が、シアネート樹脂、エポキシ樹脂、アクリル樹脂、マレイミド樹脂からなる群から選ばれる少なくとも1つである請求項2に記載の樹脂組成物。
- 前記(C)(メタ)アクリル重合体または共重合体の反応性官能基が、ビニル基、(メタ)アリル基、(メタ)アクリロイル基、マレイミド基、エポキシ基、カルボキシル基、または水酸基からなる群から選ばれる少なくとも1つである請求項2〜5のいずれか1項に記載の樹脂組成物。
- 樹脂組成物の全重量中に、前記(A)少なくとも1つの官能基を有する共役ジエン化合物の重合体または共重合体を1重量%以上20重量%以下、前記(C)(メタ)アクリル重合体または共重合体を0.5重量%以上25重量%以下含有することを特徴とする請求項2に記載の樹脂組成物。
- 前記(C)(メタ)アクリル重合体または共重合体が、前記(B)熱硬化性樹脂が有する官能基と反応し得る反応性官能基を有するものである請求項1に記載の樹脂組成物。
- 前記(A)少なくとも1つの官能基を有する共役ジエン化合物の重合体または共重合体が、ブタジエンの重合体または共重合体である請求項8に記載の樹脂組成物。
- 前記(A)少なくとも1つの官能基を有する共役ジエン化合物の重合体または共重合体の有する官能基が、ビニル基、(メタ)アリル基、(メタ)アクリロイル基、エポキシ基、カルボキシル基、水酸基、または無水マレイン酸基からなる群から選ばれる少なくとも1つである請求項8に記載の樹脂組成物。
- 前記(B)熱硬化性樹脂が、シアネート樹脂、エポキシ樹脂、アクリル樹脂、マレイミド樹脂からなる群から選ばれる少なくとも1つである請求項8に記載の樹脂組成物。
- 前記(C)(メタ)アクリル重合体または共重合体の反応性官能基が、ビニル基、(メタ)アリル基、(メタ)アクリロイル基、マレイミド基、エポキシ基、カルボキシル基、または水酸基からなる群から選ばれる少なくとも1つである請求項8〜11のいずれか1項に記載の樹脂組成物。
- 樹脂組成物の全重量中に、前記(A)少なくとも1つの官能基を有する共役ジエン化合物の重合体または共重合体を1重量%以上20重量%以下、前記(C)(メタ)アクリル重合体または共重合体を0.5重量%以上25重量%以下含有することを特徴とする請求項8に記載の樹脂組成物。
- 請求項1、2及び8のいずれか1項に記載の樹脂組成物をダイアタッチ材料または放熱部材接着用材料として用いて製作されることを特徴とする半導体装置。
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JP2015078303A (ja) * | 2013-10-17 | 2015-04-23 | ナミックス株式会社 | 樹脂組成物、先供給型半導体封止剤および半導体装置 |
JP6340212B2 (ja) * | 2014-03-04 | 2018-06-06 | ナミックス株式会社 | 樹脂組成物、先供給型半導体封止剤、半導体封止用フィルムおよび半導体装置 |
JP6799934B2 (ja) | 2016-03-31 | 2020-12-16 | ナミックス株式会社 | 樹脂組成物、および半導体装置 |
TW201809128A (zh) * | 2016-06-16 | 2018-03-16 | 信越化學工業股份有限公司 | 環氧樹脂組成物 |
KR102040529B1 (ko) * | 2016-08-19 | 2019-11-06 | 스미또모 베이크라이트 가부시키가이샤 | 다이 어태치 페이스트 및 반도체 장치 |
WO2018047597A1 (ja) * | 2016-09-06 | 2018-03-15 | 株式会社スリーボンド | 熱硬化型導電性接着剤 |
WO2020175537A1 (ja) * | 2019-02-28 | 2020-09-03 | 三菱瓦斯化学株式会社 | 樹脂組成物、プリプレグ、金属箔張積層板、樹脂複合シート、および、プリント配線板 |
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JPH08143754A (ja) * | 1994-11-25 | 1996-06-04 | Sumitomo Bakelite Co Ltd | 強靭なエポキシ樹脂 |
JP2000234043A (ja) * | 1999-02-16 | 2000-08-29 | Hitachi Chem Co Ltd | 樹脂ぺースト組成物及びこれを用いた半導体装置 |
JP2004168922A (ja) * | 2002-11-21 | 2004-06-17 | Sumitomo Bakelite Co Ltd | ダイアタッチペースト及び半導体装置 |
US20040225045A1 (en) * | 2003-05-05 | 2004-11-11 | Henkel Loctite Corporation | Highly conductive resin compositions |
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KR20090128400A (ko) | 2007-02-28 | 2009-12-15 | 스미토모 베이클리트 컴퍼니 리미티드 | 반도체용 접착 필름 및 그것을 이용한 반도체 장치 |
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KR101471232B1 (ko) * | 2007-09-19 | 2014-12-09 | 도레이 카부시키가이샤 | 전자 부품용 접착제 조성물 및 이를 이용한 전자 부품용 접착제 시트 |
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SG191137A1 (en) | 2013-07-31 |
WO2012105550A1 (ja) | 2012-08-09 |
EP2671925A4 (en) | 2015-03-18 |
KR101995601B1 (ko) | 2019-07-02 |
CN103339206B (zh) | 2016-11-23 |
TW201237107A (en) | 2012-09-16 |
EP2671925A1 (en) | 2013-12-11 |
US20130289166A1 (en) | 2013-10-31 |
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