JPWO2006107056A1 - パターン形成方法 - Google Patents

パターン形成方法 Download PDF

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Publication number
JPWO2006107056A1
JPWO2006107056A1 JP2007511245A JP2007511245A JPWO2006107056A1 JP WO2006107056 A1 JPWO2006107056 A1 JP WO2006107056A1 JP 2007511245 A JP2007511245 A JP 2007511245A JP 2007511245 A JP2007511245 A JP 2007511245A JP WO2006107056 A1 JPWO2006107056 A1 JP WO2006107056A1
Authority
JP
Japan
Prior art keywords
pattern
substrate
resin
resin film
resin composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007511245A
Other languages
English (en)
Japanese (ja)
Inventor
健司 中村
健司 中村
知彦 牛島
知彦 牛島
信紀 阿部
信紀 阿部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zeon Corp
Original Assignee
Zeon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeon Corp filed Critical Zeon Corp
Publication of JPWO2006107056A1 publication Critical patent/JPWO2006107056A1/ja
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
JP2007511245A 2005-03-30 2006-03-29 パターン形成方法 Pending JPWO2006107056A1 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2005098031 2005-03-30
JP2005098031 2005-03-30
PCT/JP2006/307158 WO2006107056A1 (ja) 2005-03-30 2006-03-29 パターン形成方法

Publications (1)

Publication Number Publication Date
JPWO2006107056A1 true JPWO2006107056A1 (ja) 2008-09-25

Family

ID=37073596

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007511245A Pending JPWO2006107056A1 (ja) 2005-03-30 2006-03-29 パターン形成方法

Country Status (4)

Country Link
JP (1) JPWO2006107056A1 (ko)
KR (1) KR20070116665A (ko)
TW (1) TW200702936A (ko)
WO (1) WO2006107056A1 (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5329999B2 (ja) 2009-01-29 2013-10-30 ＡｚエレクトロニックマテリアルズＩｐ株式会社 パターン形成方法
US8526213B2 (en) 2010-11-01 2013-09-03 Micron Technology, Inc. Memory cells, methods of programming memory cells, and methods of forming memory cells
CN106816365B (zh) * 2016-12-23 2019-05-07 信利（惠州）智能显示有限公司 一种增大过孔层的过孔坡度角的方法

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000250210A (ja) * 1999-03-04 2000-09-14 Jsr Corp 感光性樹脂組成物、感光性樹脂膜およびこれを用いたバンプ形成方法
JP2000267270A (ja) * 1999-03-19 2000-09-29 Clariant (Japan) Kk ロールコート用感光性樹脂組成物およびロールコート方法
JP2001242621A (ja) * 2000-03-01 2001-09-07 Fuji Photo Film Co Ltd 平版印刷版原版
JP2002189290A (ja) * 2000-09-29 2002-07-05 Nippon Zeon Co Ltd 絶縁膜形成用感放射線性樹脂組成物及び有機エレクトロルミネッセンス素子用絶縁膜
JP2002263548A (ja) * 2001-03-12 2002-09-17 Tokyo Ohka Kogyo Co Ltd 被膜形成装置及び被膜形成方法
WO2003087941A1 (fr) * 2002-04-18 2003-10-23 Nissan Chemical Industries, Ltd. Composition de resine positivement photosensible et procede de formation de motifs
JP2005049842A (ja) * 2003-07-11 2005-02-24 Sumitomo Chemical Co Ltd 感光性樹脂組成物
JP2005070152A (ja) * 2003-08-28 2005-03-17 Fujifilm Arch Co Ltd 光硬化性着色樹脂組成物、並びに、カラーフィルターおよびその製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005284114A (ja) * 2004-03-30 2005-10-13 Nippon Zeon Co Ltd スピンレススリットコート用感放射線性樹脂組成物及びその利用
JP2005284115A (ja) * 2004-03-30 2005-10-13 Nippon Zeon Co Ltd スリットスピンコート用感放射線性樹脂組成物及びその利用
KR101042667B1 (ko) * 2004-07-05 2011-06-20 주식회사 동진쎄미켐 포토레지스트 조성물

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000250210A (ja) * 1999-03-04 2000-09-14 Jsr Corp 感光性樹脂組成物、感光性樹脂膜およびこれを用いたバンプ形成方法
JP2000267270A (ja) * 1999-03-19 2000-09-29 Clariant (Japan) Kk ロールコート用感光性樹脂組成物およびロールコート方法
JP2001242621A (ja) * 2000-03-01 2001-09-07 Fuji Photo Film Co Ltd 平版印刷版原版
JP2002189290A (ja) * 2000-09-29 2002-07-05 Nippon Zeon Co Ltd 絶縁膜形成用感放射線性樹脂組成物及び有機エレクトロルミネッセンス素子用絶縁膜
JP2002263548A (ja) * 2001-03-12 2002-09-17 Tokyo Ohka Kogyo Co Ltd 被膜形成装置及び被膜形成方法
WO2003087941A1 (fr) * 2002-04-18 2003-10-23 Nissan Chemical Industries, Ltd. Composition de resine positivement photosensible et procede de formation de motifs
JP2005049842A (ja) * 2003-07-11 2005-02-24 Sumitomo Chemical Co Ltd 感光性樹脂組成物
JP2005070152A (ja) * 2003-08-28 2005-03-17 Fujifilm Arch Co Ltd 光硬化性着色樹脂組成物、並びに、カラーフィルターおよびその製造方法

Also Published As

Publication number Publication date
KR20070116665A (ko) 2007-12-10
TW200702936A (en) 2007-01-16
WO2006107056A1 (ja) 2006-10-12

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