JPS6488536A - Dry film photoresist and manufacture thereof - Google Patents
Dry film photoresist and manufacture thereofInfo
- Publication number
- JPS6488536A JPS6488536A JP18858888A JP18858888A JPS6488536A JP S6488536 A JPS6488536 A JP S6488536A JP 18858888 A JP18858888 A JP 18858888A JP 18858888 A JP18858888 A JP 18858888A JP S6488536 A JPS6488536 A JP S6488536A
- Authority
- JP
- Japan
- Prior art keywords
- film
- photopolymerizable layer
- photoresist
- coating film
- supporting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/161—Coating processes; Apparatus therefor using a previously coated surface, e.g. by stamping or by transfer lamination
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0079—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the method of application or removal of the mask
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Materials For Photolithography (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US7963087A | 1987-07-30 | 1987-07-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6488536A true JPS6488536A (en) | 1989-04-03 |
Family
ID=22151771
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18858888A Pending JPS6488536A (en) | 1987-07-30 | 1988-07-29 | Dry film photoresist and manufacture thereof |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPS6488536A (de) |
DE (1) | DE3825782A1 (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0450852A (ja) * | 1990-06-14 | 1992-02-19 | Hitachi Chem Co Ltd | 感光性フイルム及びこれを用いたソルダマスクの形成法 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19711696C1 (de) * | 1997-03-20 | 1998-11-12 | Basf Drucksysteme Gmbh | Verfahren zum Herstellen eines photopolymerisierbaren Aufzeichungsmaterials |
MY120763A (en) * | 1997-09-19 | 2005-11-30 | Hitachi Chemical Co Ltd | Photosensitive film, process for laminating photosensitive resin layer, photosensitive resin layer-laminated substrate and process for curing photosensitive resin layer |
FR2803246B1 (fr) * | 1999-12-31 | 2002-11-29 | Rollin Sa | Plaque d'impression presentee en rouleau et procede d'obtention |
-
1988
- 1988-07-29 DE DE19883825782 patent/DE3825782A1/de not_active Withdrawn
- 1988-07-29 JP JP18858888A patent/JPS6488536A/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0450852A (ja) * | 1990-06-14 | 1992-02-19 | Hitachi Chem Co Ltd | 感光性フイルム及びこれを用いたソルダマスクの形成法 |
Also Published As
Publication number | Publication date |
---|---|
DE3825782A1 (de) | 1989-02-09 |
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