JPS6480946A - Image formation - Google Patents

Image formation

Info

Publication number
JPS6480946A
JPS6480946A JP19595188A JP19595188A JPS6480946A JP S6480946 A JPS6480946 A JP S6480946A JP 19595188 A JP19595188 A JP 19595188A JP 19595188 A JP19595188 A JP 19595188A JP S6480946 A JPS6480946 A JP S6480946A
Authority
JP
Japan
Prior art keywords
photopolymerizable
group
film
substrate
exposed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19595188A
Other languages
English (en)
Other versions
JP2610168B2 (ja
Inventor
Aabuingu Edowaado
Marii Anjiera Warus Jiyosefuin
Marabando An
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB878718497A external-priority patent/GB8718497D0/en
Priority claimed from GB888812385A external-priority patent/GB8812385D0/en
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of JPS6480946A publication Critical patent/JPS6480946A/ja
Application granted granted Critical
Publication of JP2610168B2 publication Critical patent/JP2610168B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • G03F7/164Coating processes; Apparatus therefor using electric, electrostatic or magnetic means; powder coating

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP63195951A 1987-08-05 1988-08-05 画像形成方法 Expired - Fee Related JP2610168B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
GB878718497A GB8718497D0 (en) 1987-08-05 1987-08-05 Formation of images
GB8718497 1987-08-05
GB888812385A GB8812385D0 (en) 1988-05-25 1988-05-25 Process for formation of images
GB8812385.6 1988-05-25

Publications (2)

Publication Number Publication Date
JPS6480946A true JPS6480946A (en) 1989-03-27
JP2610168B2 JP2610168B2 (ja) 1997-05-14

Family

ID=26292573

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63195951A Expired - Fee Related JP2610168B2 (ja) 1987-08-05 1988-08-05 画像形成方法

Country Status (3)

Country Link
EP (1) EP0302827B1 (ja)
JP (1) JP2610168B2 (ja)
DE (1) DE3850533T2 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07206775A (ja) * 1994-01-06 1995-08-08 Korea Advanced Inst Of Sci Technol 新規な光重合開始化合物及びこれを含有する光硬化性重合体組成物
JP2018065809A (ja) * 2015-12-09 2018-04-26 学校法人東京理科大学 新規化合物、及び該化合物の製造方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2048164C (en) * 1990-08-02 1998-11-10 Kurt G. Olson Photoimageable electrodepositable photoresist composition
US5268256A (en) * 1990-08-02 1993-12-07 Ppg Industries, Inc. Photoimageable electrodepositable photoresist composition for producing non-tacky films
TW268031B (ja) * 1993-07-02 1996-01-11 Ciba Geigy
US6037085A (en) * 1996-06-19 2000-03-14 Printing Development Inc. Photoresists and method for making printing plates
US5962192A (en) * 1996-06-19 1999-10-05 Printing Developments, Inc. Photoresists and method for making printing plates
CN111909312B (zh) * 2020-06-23 2022-01-04 浙江新安化工集团股份有限公司 一种阻燃剂及其合成方法和阻燃树脂

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59184209A (ja) * 1983-03-28 1984-10-19 イー・アイ・デュポン・ドゥ・ヌムール・アンド・カンパニー 光感受性重合体
JPS6180240A (ja) * 1984-09-26 1986-04-23 ローム アンド ハース コンパニー 架橋性感光性重合体組成物

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4632891A (en) * 1984-10-04 1986-12-30 Ciba-Geigy Corporation Process for the production of images
JPS61247090A (ja) * 1985-04-24 1986-11-04 日本ペイント株式会社 半田スル−ホ−ルを有する回路板の製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59184209A (ja) * 1983-03-28 1984-10-19 イー・アイ・デュポン・ドゥ・ヌムール・アンド・カンパニー 光感受性重合体
JPS6180240A (ja) * 1984-09-26 1986-04-23 ローム アンド ハース コンパニー 架橋性感光性重合体組成物

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07206775A (ja) * 1994-01-06 1995-08-08 Korea Advanced Inst Of Sci Technol 新規な光重合開始化合物及びこれを含有する光硬化性重合体組成物
JP2018065809A (ja) * 2015-12-09 2018-04-26 学校法人東京理科大学 新規化合物、及び該化合物の製造方法

Also Published As

Publication number Publication date
EP0302827A3 (en) 1990-12-05
DE3850533T2 (de) 1994-10-27
EP0302827A2 (en) 1989-02-08
JP2610168B2 (ja) 1997-05-14
EP0302827B1 (en) 1994-07-06
DE3850533D1 (de) 1994-08-11

Similar Documents

Publication Publication Date Title
USRE33108E (en) Method for preparing a printed circuit board
EP0523245B1 (en) Method for manufacturing multiple color display device
EP0489560B1 (en) Positive type photosensitive anionic electrodeposition coating resin composition
JPS61247090A (ja) 半田スル−ホ−ルを有する回路板の製造方法
JPS6462634A (en) Photosensitive emulsion composition and dry painted film photosensitive resist manufactured using the same
DE2641624C3 (de) Verfahren zur Herstellung eines positiven Resistbildes unter Anwendung von Elektronenstrahlen
JPS6480946A (en) Image formation
EP0450189A2 (de) Hochwärmebeständige Negativresists und Verfahren zur Herstellung hochwärmebeständiger Reliefstrukturen
DE2007208A1 (de) Positivkopierlack
DE3710210A1 (de) Bilderzeugendes material
KR920016558A (ko) 용매 분산성 상호 관입 중합체 망목
DE2953553T1 (de) Contrast colorant for photopolymerizable compositions
DE3814567A1 (de) Photopolymerisierbare zusammensetzungen mit carboxylgruppen enthaltenden bindemitteln
DE69227976T2 (de) Amphotere Zusammensetzungen
JPS5557842A (en) Antistatic silver halide photographic material
JPS5659230A (en) Photosensitive resin composition for flexographic plate
CA2021318A1 (en) Method of forming fine patterns
KR910007229B1 (ko) 광경화 도막의 형성방법
ES8503197A1 (es) Procedimiento para la creacion de imagenes
US2389504A (en) Process of making reticles or the like
JPS56104437A (en) Formation of pattern
EP0330209B1 (de) Photoreaktive Polymere und Verfahren zur Herstellung eines Zweilagenresists
DE4310759A1 (de) Lichtempfindliche Harzmasse für die Elektroabscheidung vom Negativtyp
DE3814566C1 (ja)
JPS5638458A (en) Formation of resist pattern

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees