JPS6467914A - Exposure device - Google Patents

Exposure device

Info

Publication number
JPS6467914A
JPS6467914A JP62223914A JP22391487A JPS6467914A JP S6467914 A JPS6467914 A JP S6467914A JP 62223914 A JP62223914 A JP 62223914A JP 22391487 A JP22391487 A JP 22391487A JP S6467914 A JPS6467914 A JP S6467914A
Authority
JP
Japan
Prior art keywords
pattern
polarising
light
polariser
tight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62223914A
Other languages
English (en)
Inventor
Takeshi Kato
Katsuhiro Nozaki
Maki Nagao
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP62223914A priority Critical patent/JPS6467914A/ja
Publication of JPS6467914A publication Critical patent/JPS6467914A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP62223914A 1987-09-09 1987-09-09 Exposure device Pending JPS6467914A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62223914A JPS6467914A (en) 1987-09-09 1987-09-09 Exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62223914A JPS6467914A (en) 1987-09-09 1987-09-09 Exposure device

Publications (1)

Publication Number Publication Date
JPS6467914A true JPS6467914A (en) 1989-03-14

Family

ID=16805689

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62223914A Pending JPS6467914A (en) 1987-09-09 1987-09-09 Exposure device

Country Status (1)

Country Link
JP (1) JPS6467914A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005083515A1 (ja) * 2004-02-26 2005-09-09 Renesas Technology Corp. 半導体装置の製造方法およびマスクパターンデータ作成方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005083515A1 (ja) * 2004-02-26 2005-09-09 Renesas Technology Corp. 半導体装置の製造方法およびマスクパターンデータ作成方法
US7736839B2 (en) 2004-02-26 2010-06-15 Renesas Technology Corp. Process for fabricating semiconductor device and method for generating mask pattern data

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