JPS643068B2 - - Google Patents
Info
- Publication number
- JPS643068B2 JPS643068B2 JP56159001A JP15900181A JPS643068B2 JP S643068 B2 JPS643068 B2 JP S643068B2 JP 56159001 A JP56159001 A JP 56159001A JP 15900181 A JP15900181 A JP 15900181A JP S643068 B2 JPS643068 B2 JP S643068B2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- emitter
- region
- layer
- polycrystalline silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions
- H10D64/23—Electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. sources, drains, anodes or cathodes
Landscapes
- Electrodes Of Semiconductors (AREA)
- Bipolar Transistors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56159001A JPS5860569A (ja) | 1981-10-06 | 1981-10-06 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56159001A JPS5860569A (ja) | 1981-10-06 | 1981-10-06 | 半導体装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5860569A JPS5860569A (ja) | 1983-04-11 |
JPS643068B2 true JPS643068B2 (en, 2012) | 1989-01-19 |
Family
ID=15684057
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56159001A Granted JPS5860569A (ja) | 1981-10-06 | 1981-10-06 | 半導体装置の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5860569A (en, 2012) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5204735A (en) * | 1988-04-21 | 1993-04-20 | Kabushiki Kaisha Toshiba | High-frequency semiconductor device having emitter stabilizing resistor and method of manufacturing the same |
DE19839527C2 (de) | 1998-08-29 | 2000-07-27 | Daimler Chrysler Ag | Lenksäule für ein Kraftfahrzeug |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4985957A (en, 2012) * | 1972-10-02 | 1974-08-17 | ||
JPS5056179A (en, 2012) * | 1973-09-13 | 1975-05-16 | ||
JPS5111582A (en) * | 1974-07-19 | 1976-01-29 | Fujitsu Ltd | Handotaisochino seizohoho |
JPS51127682A (en) * | 1975-04-30 | 1976-11-06 | Fujitsu Ltd | Manufacturing process of semiconductor device |
JPS51127681A (en) * | 1975-04-30 | 1976-11-06 | Fujitsu Ltd | Manufacturing process of semiconductor device |
JPS5222483A (en) * | 1975-08-13 | 1977-02-19 | Fujitsu Ltd | Method of manufacturing semiconductor device |
-
1981
- 1981-10-06 JP JP56159001A patent/JPS5860569A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5860569A (ja) | 1983-04-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS6187368A (ja) | 自己整合多結晶シリコン電極を持つた集積回路用自己整合金属シリサイドプロセス | |
JPS6153867B2 (en, 2012) | ||
JPS60124967A (ja) | 集積回路構造体 | |
JPS6134972A (ja) | バイポ−ラトランジスタ構造体 | |
JP2762473B2 (ja) | 半導体装置の製造方法 | |
JPS643068B2 (en, 2012) | ||
JPS6381948A (ja) | 多層配線半導体装置 | |
JPH0511668B2 (en, 2012) | ||
JP3189320B2 (ja) | 半導体装置の製造方法 | |
EP0053484B1 (en) | A method for fabricating semiconductor device | |
JPH07321290A (ja) | バイポーラ集積回路装置の製造方法 | |
JPS6125217B2 (en, 2012) | ||
JP2661153B2 (ja) | 半導体装置の製造方法 | |
JPS5889861A (ja) | 半導体装置およびその製造方法 | |
JPS6158257A (ja) | 半導体装置の製造方法 | |
JPS6255305B2 (en, 2012) | ||
JPS6161546B2 (en, 2012) | ||
JPH01230269A (ja) | 半導体集積回路装置 | |
JPH05109644A (ja) | 半導体装置の製造方法 | |
JPH061785B2 (ja) | バイポーラ型半導体集積回路装置の製造方法 | |
JPS60235465A (ja) | 半導体装置の製造方法 | |
JPS6294980A (ja) | シヨツトキ電極の形成方法 | |
JPS5987860A (ja) | 高周波トランジスタ | |
JPS61174649A (ja) | 半導体装置 | |
JPS61108162A (ja) | 半導体装置およびその製造方法 |