JPS6412377B2 - - Google Patents

Info

Publication number
JPS6412377B2
JPS6412377B2 JP12203080A JP12203080A JPS6412377B2 JP S6412377 B2 JPS6412377 B2 JP S6412377B2 JP 12203080 A JP12203080 A JP 12203080A JP 12203080 A JP12203080 A JP 12203080A JP S6412377 B2 JPS6412377 B2 JP S6412377B2
Authority
JP
Japan
Prior art keywords
parts
water
polyvinyl alcohol
weight
photosensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP12203080A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5745535A (en
Inventor
Takashi Okamoto
Minoru Mitsui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Unitika Ltd
Original Assignee
Unitika Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Unitika Ltd filed Critical Unitika Ltd
Priority to JP12203080A priority Critical patent/JPS5745535A/ja
Publication of JPS5745535A publication Critical patent/JPS5745535A/ja
Publication of JPS6412377B2 publication Critical patent/JPS6412377B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
JP12203080A 1980-09-02 1980-09-02 Photosensitive resin composition Granted JPS5745535A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12203080A JPS5745535A (en) 1980-09-02 1980-09-02 Photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12203080A JPS5745535A (en) 1980-09-02 1980-09-02 Photosensitive resin composition

Publications (2)

Publication Number Publication Date
JPS5745535A JPS5745535A (en) 1982-03-15
JPS6412377B2 true JPS6412377B2 (en, 2012) 1989-02-28

Family

ID=14825849

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12203080A Granted JPS5745535A (en) 1980-09-02 1980-09-02 Photosensitive resin composition

Country Status (1)

Country Link
JP (1) JPS5745535A (en, 2012)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59170835A (ja) * 1983-03-17 1984-09-27 Toray Ind Inc 感光性樹脂組成物
JPS59211037A (ja) * 1983-05-17 1984-11-29 Agency Of Ind Science & Technol 感光性樹脂組成物
DE69413762T2 (de) * 1993-07-20 1999-03-04 Toray Industries, Inc., Tokio/Tokyo Fotoempfindliche Polymer-Zusammensetzung
DE19653603A1 (de) * 1996-12-20 1998-06-25 Basf Drucksysteme Gmbh Strahlungsempfindliches Gemisch und daraus hergestellte Hochdruckplatte
KR102054033B1 (ko) 2012-07-31 2019-12-09 도레이 카부시키가이샤 감광성 수지 조성물 및 감광성 수지 인쇄판 원판
CN113383036B (zh) * 2019-02-14 2024-02-23 日产化学株式会社 包含自由基捕获剂的抗蚀剂下层膜形成用组合物

Also Published As

Publication number Publication date
JPS5745535A (en) 1982-03-15

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