JPS5745535A - Photosensitive resin composition - Google Patents
Photosensitive resin compositionInfo
- Publication number
- JPS5745535A JPS5745535A JP12203080A JP12203080A JPS5745535A JP S5745535 A JPS5745535 A JP S5745535A JP 12203080 A JP12203080 A JP 12203080A JP 12203080 A JP12203080 A JP 12203080A JP S5745535 A JPS5745535 A JP S5745535A
- Authority
- JP
- Japan
- Prior art keywords
- plate
- photosensitive resin
- unsatd
- 100pts
- 50mol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polymerisation Methods In General (AREA)
- Graft Or Block Polymers (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12203080A JPS5745535A (en) | 1980-09-02 | 1980-09-02 | Photosensitive resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12203080A JPS5745535A (en) | 1980-09-02 | 1980-09-02 | Photosensitive resin composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5745535A true JPS5745535A (en) | 1982-03-15 |
JPS6412377B2 JPS6412377B2 (ja) | 1989-02-28 |
Family
ID=14825849
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12203080A Granted JPS5745535A (en) | 1980-09-02 | 1980-09-02 | Photosensitive resin composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5745535A (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59170835A (ja) * | 1983-03-17 | 1984-09-27 | Toray Ind Inc | 感光性樹脂組成物 |
JPS59211037A (ja) * | 1983-05-17 | 1984-11-29 | Agency Of Ind Science & Technol | 感光性樹脂組成物 |
EP0373436A2 (de) * | 1988-12-16 | 1990-06-20 | BASF Aktiengesellschaft | Lichtempfindliches Aufzeichnungselement |
US5688632A (en) * | 1993-07-20 | 1997-11-18 | Toray Industries, Inc. | Photosensitive polymer composition containing a soluble polymer of islands-in-a-sea structure, a photopolymerizable polymer, and a photopolymerization initiator |
EP0849635A1 (de) * | 1996-12-20 | 1998-06-24 | BASF Drucksysteme GmbH | Strahlungsempfindliches Gemisch und daraus hergestellte Hochdruck-platte |
WO2014021322A1 (ja) * | 2012-07-31 | 2014-02-06 | 東レ株式会社 | 感光性樹脂組成物および感光性樹脂印刷版原版 |
-
1980
- 1980-09-02 JP JP12203080A patent/JPS5745535A/ja active Granted
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59170835A (ja) * | 1983-03-17 | 1984-09-27 | Toray Ind Inc | 感光性樹脂組成物 |
JPS59211037A (ja) * | 1983-05-17 | 1984-11-29 | Agency Of Ind Science & Technol | 感光性樹脂組成物 |
EP0373436A2 (de) * | 1988-12-16 | 1990-06-20 | BASF Aktiengesellschaft | Lichtempfindliches Aufzeichnungselement |
US5688632A (en) * | 1993-07-20 | 1997-11-18 | Toray Industries, Inc. | Photosensitive polymer composition containing a soluble polymer of islands-in-a-sea structure, a photopolymerizable polymer, and a photopolymerization initiator |
EP0849635A1 (de) * | 1996-12-20 | 1998-06-24 | BASF Drucksysteme GmbH | Strahlungsempfindliches Gemisch und daraus hergestellte Hochdruck-platte |
WO2014021322A1 (ja) * | 2012-07-31 | 2014-02-06 | 東レ株式会社 | 感光性樹脂組成物および感光性樹脂印刷版原版 |
JP5601425B2 (ja) * | 2012-07-31 | 2014-10-08 | 東レ株式会社 | 感光性樹脂組成物および感光性樹脂印刷版原版 |
US9678424B2 (en) | 2012-07-31 | 2017-06-13 | Toray Industries, Inc. | Photosensitive resin composition and photosensitive resin printing plate original |
Also Published As
Publication number | Publication date |
---|---|
JPS6412377B2 (ja) | 1989-02-28 |
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