KR910003606A - 광중합성 기록물질 - Google Patents
광중합성 기록물질 Download PDFInfo
- Publication number
- KR910003606A KR910003606A KR1019890010797A KR890010797A KR910003606A KR 910003606 A KR910003606 A KR 910003606A KR 1019890010797 A KR1019890010797 A KR 1019890010797A KR 890010797 A KR890010797 A KR 890010797A KR 910003606 A KR910003606 A KR 910003606A
- Authority
- KR
- South Korea
- Prior art keywords
- recording material
- material according
- polymer
- photopolymerizable
- cover layer
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
Abstract
내용 없음.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (12)
- 기재물질, 광중합성층, 및 대기 산소에 매우 불투과성인 수용성 중합체를 함유하는 커버층을 포함하는 광중합성 기록물질에 있어서, 커버층이 대기 산소를 결합시키고 20℃에서 실질적으로 물에 완전히 가용성인 중합체를 추가로 함유함을 특징으로 하는 광중합성 기록 물질.
- 제1항에 있어서, 커버층이 20℃에서 30㎤/㎡/α/바아 미만의 산소 투과성을 갖는 기록물질.
- 제1항에 있어서, 대기 산소를 결합시킨 중합체가 지방족 아미노 그룹을 갖는 화합물인 기록물질.
- 제1항에 있어서, 지방족 아미노 그룹을 갖는 중합체가 폴리알킬렌이민인 기록물질.
- 제1항에 있어서, 커버층이 0.5 내지 10g/㎡의 기본 중량을 갖는 기록물질.
- 제1항에 있어서, 대기 산소를 결합시키는 중합체가 300 내지 1,000,000의 분자량을 갖는 기록물질.
- 제1항에 있어서, 커버층이 대기 산소를 결합시키는 중합체 3 내지 60중량% 및 산소에 매우 불투과성인 중합체 40 내지 97중량%를 함유하는 기록물질.
- 제1항에 있어서, 광중합성 층이 필수 성분으로서 중합체성 결합체, 말단 에틸렌계 불포화 그룹 하나 이상을 갖는 유리-래디칼-중합성 화합물 및 화학선적으로 활성인 중합화 개시제를 함유하는 기록물질.
- 제8항에 있어서, 층이 중합화 개시제로서 광환원성 염료를 함유하는 기록물질.
- 제8항에 있어서, 결합제가 수불용성이고, 알칼리 수용액에 가용성인 기록물질.
- 제1항에 있어서, 광중합성층이 0.5 내지 20g/㎡의 기본 중량을 갖는 기록물질.
- 제1항에 있어서, 기재물질이 평판 프린팅에 적합한 친수성 표면을 갖는 기록물질.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE3825836A DE3825836A1 (de) | 1988-07-29 | 1988-07-29 | Photopolymerisierbares aufzeichnungsmaterial |
DEP3825836.6 | 1988-07-29 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR910003606A true KR910003606A (ko) | 1991-02-27 |
KR0135076B1 KR0135076B1 (ko) | 1998-04-18 |
Family
ID=6359860
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019890010797A KR0135076B1 (ko) | 1988-07-29 | 1989-07-29 | 광중합성 기록물질 |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP0352630B1 (ko) |
JP (1) | JP2736124B2 (ko) |
KR (1) | KR0135076B1 (ko) |
CA (1) | CA1337677C (ko) |
DE (2) | DE3825836A1 (ko) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0971765A (ja) * | 1995-06-29 | 1997-03-18 | Nippon Zeon Co Ltd | 粘着防止用組成物 |
DE10022786B4 (de) | 1999-05-12 | 2008-04-10 | Kodak Graphic Communications Gmbh | Auf der Druckmaschine entwickelbare Druckplatte |
US7439537B2 (en) | 2004-07-30 | 2008-10-21 | Agfa Graphics, N.V. | Divinylfluorenes |
JP4151673B2 (ja) | 2005-05-31 | 2008-09-17 | ブラザー工業株式会社 | シート排出装置および画像形成装置。 |
ATE445861T1 (de) | 2005-08-26 | 2009-10-15 | Agfa Graphics Nv | Photopolymer druckplattenvorläufer |
US20070117040A1 (en) * | 2005-11-21 | 2007-05-24 | International Business Machines Corporation | Water castable-water strippable top coats for 193 nm immersion lithography |
JP4945432B2 (ja) | 2006-12-28 | 2012-06-06 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
JP2009080445A (ja) | 2007-01-17 | 2009-04-16 | Fujifilm Corp | 平版印刷版の作製方法 |
JP4914864B2 (ja) | 2008-03-31 | 2012-04-11 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
BRPI0918828A2 (pt) | 2008-09-24 | 2018-04-24 | Fujifilm Corporation | método de preparação de placa de impressão litográfica |
EP2194429A1 (en) | 2008-12-02 | 2010-06-09 | Eastman Kodak Company | Gumming compositions with nano-particles for improving scratch sensitivity in image and non-image areas of lithographic printing plates |
EP2196851A1 (en) | 2008-12-12 | 2010-06-16 | Eastman Kodak Company | Negative working lithographic printing plate precursors comprising a reactive binder containing aliphatic bi- or polycyclic moieties |
US8034538B2 (en) | 2009-02-13 | 2011-10-11 | Eastman Kodak Company | Negative-working imageable elements |
US20100215919A1 (en) | 2009-02-20 | 2010-08-26 | Ting Tao | On-press developable imageable elements |
US8247163B2 (en) | 2009-06-12 | 2012-08-21 | Eastman Kodak Company | Preparing lithographic printing plates with enhanced contrast |
US8257907B2 (en) | 2009-06-12 | 2012-09-04 | Eastman Kodak Company | Negative-working imageable elements |
EP2284005B1 (en) | 2009-08-10 | 2012-05-02 | Eastman Kodak Company | Lithographic printing plate precursors with beta-hydroxy alkylamide crosslinkers |
EP2293144B1 (en) | 2009-09-04 | 2012-11-07 | Eastman Kodak Company | Method of drying lithographic printing plates after single-step-processing |
BR112012024532A2 (pt) * | 2010-03-26 | 2016-09-06 | Fujifilm Corp | precursor de placa de impressão litográfica e método de produção do mesmo |
US20130137040A1 (en) * | 2010-03-26 | 2013-05-30 | Fujifilm Corporation | Lithographic printing plate precursor and method of producing thereof |
EP2735903B1 (en) | 2012-11-22 | 2019-02-27 | Eastman Kodak Company | Negative working lithographic printing plate precursors comprising a hyperbranched binder material |
EP2778782B1 (en) | 2013-03-13 | 2015-12-30 | Kodak Graphic Communications GmbH | Negative working radiation-sensitive elements |
JP6074599B2 (ja) * | 2013-10-09 | 2017-02-08 | パナソニックIpマネジメント株式会社 | 温室 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3458311A (en) * | 1966-06-27 | 1969-07-29 | Du Pont | Photopolymerizable elements with solvent removable protective layers |
DE2036585A1 (de) * | 1970-07-23 | 1972-02-03 | Kalle AG, 6202 Wiesbaden Biebnch | Photopolymensierbares Kopiermaterial |
JPS6055335A (ja) * | 1983-09-07 | 1985-03-30 | Toyobo Co Ltd | 感光性樹脂積層体の製造法 |
JPS60186835A (ja) * | 1984-03-06 | 1985-09-24 | Toyobo Co Ltd | 感光性積層体 |
DE3736980A1 (de) * | 1987-10-31 | 1989-05-18 | Basf Ag | Mehrschichtiges, flaechenfoermiges, lichtempfindliches aufzeichnungsmaterial |
-
1988
- 1988-07-29 DE DE3825836A patent/DE3825836A1/de not_active Withdrawn
-
1989
- 1989-07-20 DE DE58908207T patent/DE58908207D1/de not_active Expired - Lifetime
- 1989-07-20 EP EP89113306A patent/EP0352630B1/de not_active Expired - Lifetime
- 1989-07-24 CA CA000606446A patent/CA1337677C/en not_active Expired - Fee Related
- 1989-07-28 JP JP1194419A patent/JP2736124B2/ja not_active Expired - Lifetime
- 1989-07-29 KR KR1019890010797A patent/KR0135076B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JPH02103051A (ja) | 1990-04-16 |
DE58908207D1 (de) | 1994-09-22 |
EP0352630B1 (de) | 1994-08-17 |
JP2736124B2 (ja) | 1998-04-02 |
KR0135076B1 (ko) | 1998-04-18 |
EP0352630A3 (en) | 1990-08-01 |
EP0352630A2 (de) | 1990-01-31 |
DE3825836A1 (de) | 1990-02-08 |
CA1337677C (en) | 1995-12-05 |
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