KR910003606A - 광중합성 기록물질 - Google Patents

광중합성 기록물질 Download PDF

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Publication number
KR910003606A
KR910003606A KR1019890010797A KR890010797A KR910003606A KR 910003606 A KR910003606 A KR 910003606A KR 1019890010797 A KR1019890010797 A KR 1019890010797A KR 890010797 A KR890010797 A KR 890010797A KR 910003606 A KR910003606 A KR 910003606A
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KR
South Korea
Prior art keywords
recording material
material according
polymer
photopolymerizable
cover layer
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Application number
KR1019890010797A
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English (en)
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KR0135076B1 (ko
Inventor
제르타니 루돌프
모어 디이터
Original Assignee
베틀라우퍼, 오일러
훽스트 아크티엔게젤샤프트
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Publication of KR910003606A publication Critical patent/KR910003606A/ko
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Publication of KR0135076B1 publication Critical patent/KR0135076B1/ko

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means

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  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)

Abstract

내용 없음.

Description

광중합성 기록물질
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (12)

  1. 기재물질, 광중합성층, 및 대기 산소에 매우 불투과성인 수용성 중합체를 함유하는 커버층을 포함하는 광중합성 기록물질에 있어서, 커버층이 대기 산소를 결합시키고 20℃에서 실질적으로 물에 완전히 가용성인 중합체를 추가로 함유함을 특징으로 하는 광중합성 기록 물질.
  2. 제1항에 있어서, 커버층이 20℃에서 30㎤/㎡/α/바아 미만의 산소 투과성을 갖는 기록물질.
  3. 제1항에 있어서, 대기 산소를 결합시킨 중합체가 지방족 아미노 그룹을 갖는 화합물인 기록물질.
  4. 제1항에 있어서, 지방족 아미노 그룹을 갖는 중합체가 폴리알킬렌이민인 기록물질.
  5. 제1항에 있어서, 커버층이 0.5 내지 10g/㎡의 기본 중량을 갖는 기록물질.
  6. 제1항에 있어서, 대기 산소를 결합시키는 중합체가 300 내지 1,000,000의 분자량을 갖는 기록물질.
  7. 제1항에 있어서, 커버층이 대기 산소를 결합시키는 중합체 3 내지 60중량% 및 산소에 매우 불투과성인 중합체 40 내지 97중량%를 함유하는 기록물질.
  8. 제1항에 있어서, 광중합성 층이 필수 성분으로서 중합체성 결합체, 말단 에틸렌계 불포화 그룹 하나 이상을 갖는 유리-래디칼-중합성 화합물 및 화학선적으로 활성인 중합화 개시제를 함유하는 기록물질.
  9. 제8항에 있어서, 층이 중합화 개시제로서 광환원성 염료를 함유하는 기록물질.
  10. 제8항에 있어서, 결합제가 수불용성이고, 알칼리 수용액에 가용성인 기록물질.
  11. 제1항에 있어서, 광중합성층이 0.5 내지 20g/㎡의 기본 중량을 갖는 기록물질.
  12. 제1항에 있어서, 기재물질이 평판 프린팅에 적합한 친수성 표면을 갖는 기록물질.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019890010797A 1988-07-29 1989-07-29 광중합성 기록물질 KR0135076B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3825836A DE3825836A1 (de) 1988-07-29 1988-07-29 Photopolymerisierbares aufzeichnungsmaterial
DEP3825836.6 1988-07-29

Publications (2)

Publication Number Publication Date
KR910003606A true KR910003606A (ko) 1991-02-27
KR0135076B1 KR0135076B1 (ko) 1998-04-18

Family

ID=6359860

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019890010797A KR0135076B1 (ko) 1988-07-29 1989-07-29 광중합성 기록물질

Country Status (5)

Country Link
EP (1) EP0352630B1 (ko)
JP (1) JP2736124B2 (ko)
KR (1) KR0135076B1 (ko)
CA (1) CA1337677C (ko)
DE (2) DE3825836A1 (ko)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0971765A (ja) * 1995-06-29 1997-03-18 Nippon Zeon Co Ltd 粘着防止用組成物
DE10022786B4 (de) 1999-05-12 2008-04-10 Kodak Graphic Communications Gmbh Auf der Druckmaschine entwickelbare Druckplatte
US7439537B2 (en) 2004-07-30 2008-10-21 Agfa Graphics, N.V. Divinylfluorenes
JP4151673B2 (ja) 2005-05-31 2008-09-17 ブラザー工業株式会社 シート排出装置および画像形成装置。
ATE445861T1 (de) 2005-08-26 2009-10-15 Agfa Graphics Nv Photopolymer druckplattenvorläufer
US20070117040A1 (en) * 2005-11-21 2007-05-24 International Business Machines Corporation Water castable-water strippable top coats for 193 nm immersion lithography
JP4945432B2 (ja) 2006-12-28 2012-06-06 富士フイルム株式会社 平版印刷版の作製方法
JP2009080445A (ja) 2007-01-17 2009-04-16 Fujifilm Corp 平版印刷版の作製方法
JP4914864B2 (ja) 2008-03-31 2012-04-11 富士フイルム株式会社 平版印刷版の作製方法
BRPI0918828A2 (pt) 2008-09-24 2018-04-24 Fujifilm Corporation método de preparação de placa de impressão litográfica
EP2194429A1 (en) 2008-12-02 2010-06-09 Eastman Kodak Company Gumming compositions with nano-particles for improving scratch sensitivity in image and non-image areas of lithographic printing plates
EP2196851A1 (en) 2008-12-12 2010-06-16 Eastman Kodak Company Negative working lithographic printing plate precursors comprising a reactive binder containing aliphatic bi- or polycyclic moieties
US8034538B2 (en) 2009-02-13 2011-10-11 Eastman Kodak Company Negative-working imageable elements
US20100215919A1 (en) 2009-02-20 2010-08-26 Ting Tao On-press developable imageable elements
US8247163B2 (en) 2009-06-12 2012-08-21 Eastman Kodak Company Preparing lithographic printing plates with enhanced contrast
US8257907B2 (en) 2009-06-12 2012-09-04 Eastman Kodak Company Negative-working imageable elements
EP2284005B1 (en) 2009-08-10 2012-05-02 Eastman Kodak Company Lithographic printing plate precursors with beta-hydroxy alkylamide crosslinkers
EP2293144B1 (en) 2009-09-04 2012-11-07 Eastman Kodak Company Method of drying lithographic printing plates after single-step-processing
BR112012024532A2 (pt) * 2010-03-26 2016-09-06 Fujifilm Corp precursor de placa de impressão litográfica e método de produção do mesmo
US20130137040A1 (en) * 2010-03-26 2013-05-30 Fujifilm Corporation Lithographic printing plate precursor and method of producing thereof
EP2735903B1 (en) 2012-11-22 2019-02-27 Eastman Kodak Company Negative working lithographic printing plate precursors comprising a hyperbranched binder material
EP2778782B1 (en) 2013-03-13 2015-12-30 Kodak Graphic Communications GmbH Negative working radiation-sensitive elements
JP6074599B2 (ja) * 2013-10-09 2017-02-08 パナソニックIpマネジメント株式会社 温室

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3458311A (en) * 1966-06-27 1969-07-29 Du Pont Photopolymerizable elements with solvent removable protective layers
DE2036585A1 (de) * 1970-07-23 1972-02-03 Kalle AG, 6202 Wiesbaden Biebnch Photopolymensierbares Kopiermaterial
JPS6055335A (ja) * 1983-09-07 1985-03-30 Toyobo Co Ltd 感光性樹脂積層体の製造法
JPS60186835A (ja) * 1984-03-06 1985-09-24 Toyobo Co Ltd 感光性積層体
DE3736980A1 (de) * 1987-10-31 1989-05-18 Basf Ag Mehrschichtiges, flaechenfoermiges, lichtempfindliches aufzeichnungsmaterial

Also Published As

Publication number Publication date
JPH02103051A (ja) 1990-04-16
DE58908207D1 (de) 1994-09-22
EP0352630B1 (de) 1994-08-17
JP2736124B2 (ja) 1998-04-02
KR0135076B1 (ko) 1998-04-18
EP0352630A3 (en) 1990-08-01
EP0352630A2 (de) 1990-01-31
DE3825836A1 (de) 1990-02-08
CA1337677C (en) 1995-12-05

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