JPS6410057B2 - - Google Patents

Info

Publication number
JPS6410057B2
JPS6410057B2 JP15259881A JP15259881A JPS6410057B2 JP S6410057 B2 JPS6410057 B2 JP S6410057B2 JP 15259881 A JP15259881 A JP 15259881A JP 15259881 A JP15259881 A JP 15259881A JP S6410057 B2 JPS6410057 B2 JP S6410057B2
Authority
JP
Japan
Prior art keywords
image forming
forming material
image
substrate
photosensitive layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP15259881A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5854335A (ja
Inventor
Shunichi Hayashi
Takashi Yamamura
Tomomichi Kaneko
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
Original Assignee
Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Priority to JP15259881A priority Critical patent/JPS5854335A/ja
Publication of JPS5854335A publication Critical patent/JPS5854335A/ja
Publication of JPS6410057B2 publication Critical patent/JPS6410057B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP15259881A 1981-09-26 1981-09-26 画像形成材料 Granted JPS5854335A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15259881A JPS5854335A (ja) 1981-09-26 1981-09-26 画像形成材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15259881A JPS5854335A (ja) 1981-09-26 1981-09-26 画像形成材料

Publications (2)

Publication Number Publication Date
JPS5854335A JPS5854335A (ja) 1983-03-31
JPS6410057B2 true JPS6410057B2 (enrdf_load_stackoverflow) 1989-02-21

Family

ID=15543919

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15259881A Granted JPS5854335A (ja) 1981-09-26 1981-09-26 画像形成材料

Country Status (1)

Country Link
JP (1) JPS5854335A (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58196762A (ja) * 1983-03-30 1983-11-16 Canon Inc 画像記録装置
DE19638447B4 (de) * 1995-09-19 2005-12-08 Ricoh Co., Ltd. Elektrophotographisches Aufzeichnungsmaterial
DE69620723T2 (de) * 1995-12-22 2002-12-05 Mitsubishi Chemical Corp., Tokio/Tokyo Fotopolymerisierbare Zusammensetzung für einen Farbfilter, Farbfilter und Flüssigkristallanzeigevorrichtung
US5776655A (en) * 1996-03-11 1998-07-07 Eastman Kodak Company Peel-developable lithographic printing plate
JP4308585B2 (ja) * 2003-06-09 2009-08-05 Azエレクトロニックマテリアルズ株式会社 感光性樹脂組成物密着性向上剤及びそれを含有する感光性樹脂組成物

Also Published As

Publication number Publication date
JPS5854335A (ja) 1983-03-31

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