JPS638538B2 - - Google Patents
Info
- Publication number
- JPS638538B2 JPS638538B2 JP1437778A JP1437778A JPS638538B2 JP S638538 B2 JPS638538 B2 JP S638538B2 JP 1437778 A JP1437778 A JP 1437778A JP 1437778 A JP1437778 A JP 1437778A JP S638538 B2 JPS638538 B2 JP S638538B2
- Authority
- JP
- Japan
- Prior art keywords
- etching
- thin film
- etching layer
- gas
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000005530 etching Methods 0.000 claims description 50
- 239000010409 thin film Substances 0.000 claims description 27
- 150000001875 compounds Chemical class 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 16
- 239000000126 substance Substances 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 5
- 238000000992 sputter etching Methods 0.000 claims description 3
- 239000007789 gas Substances 0.000 description 19
- 238000009835 boiling Methods 0.000 description 10
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 9
- 229910004298 SiO 2 Inorganic materials 0.000 description 6
- 229910004261 CaF 2 Inorganic materials 0.000 description 5
- 239000005357 flat glass Substances 0.000 description 5
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- -1 Si 3 N 4 Inorganic materials 0.000 description 3
- 150000004767 nitrides Chemical class 0.000 description 3
- 238000003486 chemical etching Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 229910001634 calcium fluoride Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1437778A JPS54107705A (en) | 1978-02-10 | 1978-02-10 | Method of fabricating information recording carrier |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1437778A JPS54107705A (en) | 1978-02-10 | 1978-02-10 | Method of fabricating information recording carrier |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS54107705A JPS54107705A (en) | 1979-08-23 |
| JPS638538B2 true JPS638538B2 (de) | 1988-02-23 |
Family
ID=11859349
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1437778A Granted JPS54107705A (en) | 1978-02-10 | 1978-02-10 | Method of fabricating information recording carrier |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS54107705A (de) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59210547A (ja) * | 1983-05-13 | 1984-11-29 | Sharp Corp | 光メモリ素子の製造方法 |
| JPS60173736A (ja) * | 1984-02-06 | 1985-09-07 | Nippon Telegr & Teleph Corp <Ntt> | 光学デイスク用スタンパの製造方法 |
| JPS60173735A (ja) * | 1984-02-06 | 1985-09-07 | Nippon Telegr & Teleph Corp <Ntt> | 光学デイスクの製造方法 |
| JPS60173738A (ja) * | 1984-02-09 | 1985-09-07 | Nippon Telegr & Teleph Corp <Ntt> | 光学ディスクの製造方法 |
| JPS60173732A (ja) * | 1984-02-09 | 1985-09-07 | Nippon Telegr & Teleph Corp <Ntt> | 光学デイスク |
| JPS60182030A (ja) * | 1984-02-29 | 1985-09-17 | Hoya Corp | 情報記録用基板の製造方法 |
| JPS60202555A (ja) * | 1984-03-26 | 1985-10-14 | Nippon Telegr & Teleph Corp <Ntt> | 光デイスク用溝原版およびその製造方法 |
| JPS60226042A (ja) * | 1984-04-25 | 1985-11-11 | Hoya Corp | 情報ガラス基板およびその製造方法 |
| JPS60226041A (ja) * | 1984-04-25 | 1985-11-11 | Hoya Corp | 情報ガラス基板の製造方法 |
| JPS6168746A (ja) * | 1984-09-04 | 1986-04-09 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | 光学記憶デイスクを製造するためのモ−ルド・インサ−トを形成する方法 |
| US4632898A (en) * | 1985-04-15 | 1986-12-30 | Eastman Kodak Company | Process for fabricating glass tooling |
| JP2531472B2 (ja) * | 1992-08-07 | 1996-09-04 | 株式会社ニコン | プラスチック成形用鋳型の製造方法 |
-
1978
- 1978-02-10 JP JP1437778A patent/JPS54107705A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS54107705A (en) | 1979-08-23 |
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