JPS637024B2 - - Google Patents

Info

Publication number
JPS637024B2
JPS637024B2 JP57132428A JP13242882A JPS637024B2 JP S637024 B2 JPS637024 B2 JP S637024B2 JP 57132428 A JP57132428 A JP 57132428A JP 13242882 A JP13242882 A JP 13242882A JP S637024 B2 JPS637024 B2 JP S637024B2
Authority
JP
Japan
Prior art keywords
signal
deflection
blanking
circuit
scanning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57132428A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5922325A (ja
Inventor
Sadao Sasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP57132428A priority Critical patent/JPS5922325A/ja
Publication of JPS5922325A publication Critical patent/JPS5922325A/ja
Publication of JPS637024B2 publication Critical patent/JPS637024B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Electron Beam Exposure (AREA)
JP57132428A 1982-07-29 1982-07-29 電子ビ−ム描画装置 Granted JPS5922325A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57132428A JPS5922325A (ja) 1982-07-29 1982-07-29 電子ビ−ム描画装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57132428A JPS5922325A (ja) 1982-07-29 1982-07-29 電子ビ−ム描画装置

Publications (2)

Publication Number Publication Date
JPS5922325A JPS5922325A (ja) 1984-02-04
JPS637024B2 true JPS637024B2 (enrdf_load_stackoverflow) 1988-02-15

Family

ID=15081141

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57132428A Granted JPS5922325A (ja) 1982-07-29 1982-07-29 電子ビ−ム描画装置

Country Status (1)

Country Link
JP (1) JPS5922325A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3379333A2 (en) 2017-03-24 2018-09-26 Canon Kabushiki Kaisha Detection apparatus, pattern forming apparatus, obtaining method, detection method, and article manufacturing method

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0732110B2 (ja) * 1984-05-18 1995-04-10 株式会社日立製作所 電子線露光装置
JPS6159827A (ja) * 1984-08-31 1986-03-27 Fujitsu Ltd 電子ビ−ム露光方式
JPH0744145B2 (ja) * 1989-12-12 1995-05-15 株式会社東芝 電子ビーム露光方法及びその装置
JP2009038706A (ja) * 2007-08-03 2009-02-19 Shindengen Electric Mfg Co Ltd ブランキング回路
JP5927067B2 (ja) * 2012-07-06 2016-05-25 株式会社日立ハイテクノロジーズ 計測検査装置、及び計測検査方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5642343A (en) * 1979-09-14 1981-04-20 Jeol Ltd Exposing method of electron beam

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3379333A2 (en) 2017-03-24 2018-09-26 Canon Kabushiki Kaisha Detection apparatus, pattern forming apparatus, obtaining method, detection method, and article manufacturing method

Also Published As

Publication number Publication date
JPS5922325A (ja) 1984-02-04

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