JPS5642343A - Exposing method of electron beam - Google Patents

Exposing method of electron beam

Info

Publication number
JPS5642343A
JPS5642343A JP11860979A JP11860979A JPS5642343A JP S5642343 A JPS5642343 A JP S5642343A JP 11860979 A JP11860979 A JP 11860979A JP 11860979 A JP11860979 A JP 11860979A JP S5642343 A JPS5642343 A JP S5642343A
Authority
JP
Japan
Prior art keywords
electron beam
pattern
theta2
corner
radiation quantity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11860979A
Other languages
Japanese (ja)
Inventor
Moriyuki Isobe
Tetsuo Yuasa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP11860979A priority Critical patent/JPS5642343A/en
Publication of JPS5642343A publication Critical patent/JPS5642343A/en
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To make the distribution of a radiation quantity inside of a parttern uniform by a method wherein a deflection shift speed of the electron beam is properly decelerated at the periphery of the pattern. CONSTITUTION:When a rectangular pattern P is drawn toward the X direction by a spot E of the electron beam, the saw tooth wave signal Sx1, Sx2 that the inclination is theta at the pattern corner EDx1, EDx2, and theta2 at the center portion, is given to a deflector. When theta1<theta2 is selected, since the electron beam is shifted slowly at the corner, the radiation quantity inside the pattern becomes definite, the light exposing accuracy can be improved remarkably.
JP11860979A 1979-09-14 1979-09-14 Exposing method of electron beam Pending JPS5642343A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11860979A JPS5642343A (en) 1979-09-14 1979-09-14 Exposing method of electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11860979A JPS5642343A (en) 1979-09-14 1979-09-14 Exposing method of electron beam

Publications (1)

Publication Number Publication Date
JPS5642343A true JPS5642343A (en) 1981-04-20

Family

ID=14740785

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11860979A Pending JPS5642343A (en) 1979-09-14 1979-09-14 Exposing method of electron beam

Country Status (1)

Country Link
JP (1) JPS5642343A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58118999A (en) * 1981-12-31 1983-07-15 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Apparatus for uniform irradiation in two- dimensional area
JPS5922325A (en) * 1982-07-29 1984-02-04 Toshiba Corp Electron beam drawing device
JPS6114720A (en) * 1984-06-29 1986-01-22 Fujitsu Ltd Electron beam exposure method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52153380A (en) * 1976-06-15 1977-12-20 Toshiba Corp Blanking device for electron beam exposing device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52153380A (en) * 1976-06-15 1977-12-20 Toshiba Corp Blanking device for electron beam exposing device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58118999A (en) * 1981-12-31 1983-07-15 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Apparatus for uniform irradiation in two- dimensional area
JPS5922325A (en) * 1982-07-29 1984-02-04 Toshiba Corp Electron beam drawing device
JPS637024B2 (en) * 1982-07-29 1988-02-15 Tokyo Shibaura Electric Co
JPS6114720A (en) * 1984-06-29 1986-01-22 Fujitsu Ltd Electron beam exposure method
JPH0220133B2 (en) * 1984-06-29 1990-05-08 Fujitsu Ltd

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