JPS6356704B2 - - Google Patents

Info

Publication number
JPS6356704B2
JPS6356704B2 JP56084758A JP8475881A JPS6356704B2 JP S6356704 B2 JPS6356704 B2 JP S6356704B2 JP 56084758 A JP56084758 A JP 56084758A JP 8475881 A JP8475881 A JP 8475881A JP S6356704 B2 JPS6356704 B2 JP S6356704B2
Authority
JP
Japan
Prior art keywords
layer
silicon nitride
nitride layer
low
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56084758A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57199224A (en
Inventor
Tsuneaki Isozaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP56084758A priority Critical patent/JPS57199224A/ja
Publication of JPS57199224A publication Critical patent/JPS57199224A/ja
Publication of JPS6356704B2 publication Critical patent/JPS6356704B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
    • H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
    • H01L21/0217—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material being a silicon nitride not containing oxygen, e.g. SixNy or SixByNz

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Formation Of Insulating Films (AREA)
JP56084758A 1981-06-02 1981-06-02 Semiconductor device Granted JPS57199224A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56084758A JPS57199224A (en) 1981-06-02 1981-06-02 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56084758A JPS57199224A (en) 1981-06-02 1981-06-02 Semiconductor device

Publications (2)

Publication Number Publication Date
JPS57199224A JPS57199224A (en) 1982-12-07
JPS6356704B2 true JPS6356704B2 (enrdf_load_stackoverflow) 1988-11-09

Family

ID=13839577

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56084758A Granted JPS57199224A (en) 1981-06-02 1981-06-02 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS57199224A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2625839B1 (fr) * 1988-01-13 1991-04-26 Sgs Thomson Microelectronics Procede de passivation d'un circuit integre
US6514882B2 (en) * 2001-02-19 2003-02-04 Applied Materials, Inc. Aggregate dielectric layer to reduce nitride consumption
JP2006043813A (ja) * 2004-08-04 2006-02-16 Denso Corp 保護膜付きマイクロシステム構造体及びその製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5390869A (en) * 1977-01-21 1978-08-10 Hitachi Ltd Manufacture of semiconductor device
JPS5632732A (en) * 1979-08-27 1981-04-02 Mitsubishi Electric Corp Semiconductor device

Also Published As

Publication number Publication date
JPS57199224A (en) 1982-12-07

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