JPS6352118B2 - - Google Patents

Info

Publication number
JPS6352118B2
JPS6352118B2 JP55062815A JP6281580A JPS6352118B2 JP S6352118 B2 JPS6352118 B2 JP S6352118B2 JP 55062815 A JP55062815 A JP 55062815A JP 6281580 A JP6281580 A JP 6281580A JP S6352118 B2 JPS6352118 B2 JP S6352118B2
Authority
JP
Japan
Prior art keywords
gas
etching
reaction chamber
dry etching
photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55062815A
Other languages
English (en)
Japanese (ja)
Other versions
JPS56158873A (en
Inventor
Hideo Komatsu
Shinya Iida
Tatsumi Mizutani
Kazuyoshi Ueki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP6281580A priority Critical patent/JPS56158873A/ja
Priority to US06/260,813 priority patent/US4412119A/en
Priority to DE19813118839 priority patent/DE3118839A1/de
Publication of JPS56158873A publication Critical patent/JPS56158873A/ja
Publication of JPS6352118B2 publication Critical patent/JPS6352118B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P50/267—
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F4/00—Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00
    • H10P50/242—
    • H10P50/268—
    • H10P50/283—

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Drying Of Semiconductors (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • ing And Chemical Polishing (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
JP6281580A 1980-05-14 1980-05-14 Dry etching method Granted JPS56158873A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP6281580A JPS56158873A (en) 1980-05-14 1980-05-14 Dry etching method
US06/260,813 US4412119A (en) 1980-05-14 1981-05-05 Method for dry-etching
DE19813118839 DE3118839A1 (de) 1980-05-14 1981-05-12 Trockenaetzverfahren

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6281580A JPS56158873A (en) 1980-05-14 1980-05-14 Dry etching method

Publications (2)

Publication Number Publication Date
JPS56158873A JPS56158873A (en) 1981-12-07
JPS6352118B2 true JPS6352118B2 (enExample) 1988-10-18

Family

ID=13211202

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6281580A Granted JPS56158873A (en) 1980-05-14 1980-05-14 Dry etching method

Country Status (3)

Country Link
US (1) US4412119A (enExample)
JP (1) JPS56158873A (enExample)
DE (1) DE3118839A1 (enExample)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58143528A (ja) * 1982-02-22 1983-08-26 Hitachi Ltd ドライエツチング法
JPS5945946A (ja) * 1982-09-06 1984-03-15 Toyota Central Res & Dev Lab Inc 中空糸状多孔質ガラスの製造法
JPS5974631A (ja) * 1982-10-22 1984-04-27 Hitachi Ltd ドライエツチング法及びそのための装置
JPS60148123A (ja) * 1983-12-30 1985-08-05 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 乾式エツチング方法
US4654112A (en) * 1984-09-26 1987-03-31 Texas Instruments Incorporated Oxide etch
IT1213230B (it) * 1984-10-23 1989-12-14 Ates Componenti Elettron Processo planox a becco ridotto per la formazione di componenti elettronici integrati.
JPH07118474B2 (ja) * 1984-12-17 1995-12-18 ソニー株式会社 エツチングガス及びこれを用いたエツチング方法
EP0212585B1 (en) * 1985-08-27 1991-12-18 International Business Machines Corporation Selective and anisotropic dry etching
US4734157A (en) * 1985-08-27 1988-03-29 International Business Machines Corporation Selective and anisotropic dry etching
JPH0727889B2 (ja) * 1985-08-27 1995-03-29 インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション プラズマ・エツチング方法
JPS6278726A (ja) * 1985-10-02 1987-04-11 Matsushita Electric Ind Co Ltd 平板状情報記録担体の記録・再生方法および平板状情報記録担体
IT1200785B (it) * 1985-10-14 1989-01-27 Sgs Microelettronica Spa Migliorato procedimento di attaco in plasma (rie) per realizzare contatti metallo-semiconduttore di tipo ohmico
JPS62216224A (ja) * 1986-03-17 1987-09-22 Fujitsu Ltd タングステンの選択成長方法
US5182234A (en) * 1986-03-21 1993-01-26 Advanced Power Technology, Inc. Profile tailored trench etch using a SF6 -O2 etching composition wherein both isotropic and anisotropic etching is achieved by varying the amount of oxygen
JPS62224687A (ja) * 1986-03-25 1987-10-02 Anelva Corp エツチング方法
US4767724A (en) * 1986-03-27 1988-08-30 General Electric Company Unframed via interconnection with dielectric etch stop
JP2669460B2 (ja) * 1986-10-29 1997-10-27 株式会社日立製作所 エツチング方法
FR2619578A1 (fr) * 1987-08-18 1989-02-24 Air Liquide Procede de gravure ionique reactive a basse tension d'autopolarisation par addition de gaz inertes
WO1989007335A1 (en) * 1988-01-29 1989-08-10 The Government Of The United States As Represented Improved etching method for photoresists or polymers
US5007983A (en) * 1988-01-29 1991-04-16 The United States Of America As Represented By The Administrator Of National Aeronautics And Space Administration Etching method for photoresists or polymers
JP2939269B2 (ja) * 1989-05-24 1999-08-25 富士通株式会社 半導体装置の製造方法
US5413670A (en) * 1993-07-08 1995-05-09 Air Products And Chemicals, Inc. Method for plasma etching or cleaning with diluted NF3
JP3254064B2 (ja) * 1993-09-27 2002-02-04 株式会社半導体エネルギー研究所 プラズマ処理方法
US5759360A (en) * 1995-03-13 1998-06-02 Applied Materials, Inc. Wafer clean sputtering process
US5983828A (en) * 1995-10-13 1999-11-16 Mattson Technology, Inc. Apparatus and method for pulsed plasma processing of a semiconductor substrate
US6253704B1 (en) 1995-10-13 2001-07-03 Mattson Technology, Inc. Apparatus and method for pulsed plasma processing of a semiconductor substrate
US6794301B2 (en) 1995-10-13 2004-09-21 Mattson Technology, Inc. Pulsed plasma processing of semiconductor substrates
JPH10223607A (ja) * 1997-02-03 1998-08-21 Mitsubishi Electric Corp プラズマ処理装置
DE10045793C2 (de) * 2000-09-15 2002-07-18 Zeiss Carl Verfahren zum Strukturieren eines Substrats
US7067439B2 (en) 2002-06-14 2006-06-27 Applied Materials, Inc. ALD metal oxide deposition process using direct oxidation
US8119210B2 (en) 2004-05-21 2012-02-21 Applied Materials, Inc. Formation of a silicon oxynitride layer on a high-k dielectric material
US20060105114A1 (en) * 2004-11-16 2006-05-18 White John M Multi-layer high quality gate dielectric for low-temperature poly-silicon TFTs
US7645710B2 (en) 2006-03-09 2010-01-12 Applied Materials, Inc. Method and apparatus for fabricating a high dielectric constant transistor gate using a low energy plasma system
US7837838B2 (en) 2006-03-09 2010-11-23 Applied Materials, Inc. Method of fabricating a high dielectric constant transistor gate using a low energy plasma apparatus
US7678710B2 (en) 2006-03-09 2010-03-16 Applied Materials, Inc. Method and apparatus for fabricating a high dielectric constant transistor gate using a low energy plasma system
WO2008039845A2 (en) 2006-09-26 2008-04-03 Applied Materials, Inc. Fluorine plasma treatment of high-k gate stack for defect passivation
JP5028617B2 (ja) * 2007-01-18 2012-09-19 国立大学法人大阪大学 プラズマ処理装置及びプラズマ処理方法、並びに、フッ素含有高分子廃棄物処理方法
JP2015056441A (ja) * 2013-09-10 2015-03-23 株式会社東芝 半導体装置の製造方法
JP2016157793A (ja) 2015-02-24 2016-09-01 東京エレクトロン株式会社 エッチング方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2716592C3 (de) * 1976-04-15 1979-11-08 Hitachi, Ltd., Tokio Plasma-Ätzvorrichtung
JPS5437580A (en) * 1977-08-30 1979-03-20 Nec Corp Dry etching method and target film used for it
FR2432560A1 (fr) * 1978-08-02 1980-02-29 Texas Instruments Inc Procede de decapage de metaux, en particulier d'aluminium, au plasma de tetrachlorure de silicium
JPS5547381A (en) * 1978-09-29 1980-04-03 Fujitsu Ltd Plasma etching method
US4243476A (en) * 1979-06-29 1981-01-06 International Business Machines Corporation Modification of etch rates by solid masking materials

Also Published As

Publication number Publication date
US4412119A (en) 1983-10-25
JPS56158873A (en) 1981-12-07
DE3118839A1 (de) 1982-02-18
DE3118839C2 (enExample) 1988-04-21

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