JPS6348420B2 - - Google Patents
Info
- Publication number
- JPS6348420B2 JPS6348420B2 JP16256182A JP16256182A JPS6348420B2 JP S6348420 B2 JPS6348420 B2 JP S6348420B2 JP 16256182 A JP16256182 A JP 16256182A JP 16256182 A JP16256182 A JP 16256182A JP S6348420 B2 JPS6348420 B2 JP S6348420B2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- patterns
- position detection
- relative position
- interval
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000001514 detection method Methods 0.000 claims description 50
- 239000004065 semiconductor Substances 0.000 description 8
- 238000010586 diagram Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57162561A JPS5951529A (ja) | 1982-09-17 | 1982-09-17 | 相対位置検出パタ−ン |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57162561A JPS5951529A (ja) | 1982-09-17 | 1982-09-17 | 相対位置検出パタ−ン |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5951529A JPS5951529A (ja) | 1984-03-26 |
JPS6348420B2 true JPS6348420B2 (enrdf_load_stackoverflow) | 1988-09-29 |
Family
ID=15756924
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57162561A Granted JPS5951529A (ja) | 1982-09-17 | 1982-09-17 | 相対位置検出パタ−ン |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5951529A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH023217U (enrdf_load_stackoverflow) * | 1988-06-20 | 1990-01-10 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS633416A (ja) * | 1986-06-24 | 1988-01-08 | Sony Corp | 半導体装置 |
US6828647B2 (en) | 2001-04-05 | 2004-12-07 | Infineon Technologies Ag | Structure for determining edges of regions in a semiconductor wafer |
JP2009004601A (ja) * | 2007-06-22 | 2009-01-08 | Jeol Ltd | 荷電粒子ビーム描画装置のフィールド接合精度測定方法 |
-
1982
- 1982-09-17 JP JP57162561A patent/JPS5951529A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH023217U (enrdf_load_stackoverflow) * | 1988-06-20 | 1990-01-10 |
Also Published As
Publication number | Publication date |
---|---|
JPS5951529A (ja) | 1984-03-26 |
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