JPS63291808A - 高純度シリカの製造方法 - Google Patents
高純度シリカの製造方法Info
- Publication number
- JPS63291808A JPS63291808A JP12578587A JP12578587A JPS63291808A JP S63291808 A JPS63291808 A JP S63291808A JP 12578587 A JP12578587 A JP 12578587A JP 12578587 A JP12578587 A JP 12578587A JP S63291808 A JPS63291808 A JP S63291808A
- Authority
- JP
- Japan
- Prior art keywords
- silica
- mineral acid
- acid
- solution
- impurities
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 97
- 239000000377 silicon dioxide Substances 0.000 title claims abstract description 48
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 239000002253 acid Substances 0.000 claims abstract description 35
- 229910052500 inorganic mineral Inorganic materials 0.000 claims abstract description 29
- 239000011707 mineral Substances 0.000 claims abstract description 29
- 239000012535 impurity Substances 0.000 claims abstract description 25
- 239000002244 precipitate Substances 0.000 claims abstract description 16
- 238000005406 washing Methods 0.000 claims abstract description 6
- 235000012239 silicon dioxide Nutrition 0.000 claims description 32
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims description 30
- 239000003513 alkali Substances 0.000 claims description 23
- 238000000034 method Methods 0.000 abstract description 28
- 239000000243 solution Substances 0.000 abstract description 22
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 abstract description 16
- 239000007864 aqueous solution Substances 0.000 abstract description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 11
- 235000019353 potassium silicate Nutrition 0.000 abstract description 7
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 abstract description 7
- 238000001914 filtration Methods 0.000 abstract description 6
- 239000000463 material Substances 0.000 abstract description 6
- 239000012776 electronic material Substances 0.000 abstract description 3
- 230000003287 optical effect Effects 0.000 abstract description 3
- 238000006116 polymerization reaction Methods 0.000 abstract description 2
- 229910052910 alkali metal silicate Inorganic materials 0.000 abstract 4
- 229960004029 silicic acid Drugs 0.000 description 33
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 12
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 8
- 229910017604 nitric acid Inorganic materials 0.000 description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- 239000011550 stock solution Substances 0.000 description 6
- 229910052783 alkali metal Inorganic materials 0.000 description 5
- 238000005554 pickling Methods 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 239000010936 titanium Substances 0.000 description 5
- 150000007513 acids Chemical class 0.000 description 4
- 150000001340 alkali metals Chemical class 0.000 description 4
- LRCFXGAMWKDGLA-UHFFFAOYSA-N dioxosilane;hydrate Chemical compound O.O=[Si]=O LRCFXGAMWKDGLA-UHFFFAOYSA-N 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 230000018044 dehydration Effects 0.000 description 3
- 238000006297 dehydration reaction Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 239000002738 chelating agent Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000008393 encapsulating agent Substances 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000003456 ion exchange resin Substances 0.000 description 2
- 229920003303 ion-exchange polymer Polymers 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 238000006386 neutralization reaction Methods 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 230000002285 radioactive effect Effects 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- -1 sodium Chemical compound 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- 101100215647 Aspergillus flavus (strain ATCC 200026 / FGSC A1120 / IAM 13836 / NRRL 3357 / JCM 12722 / SRRC 167) aflR gene Proteins 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 101100233255 Mus musculus Ipp gene Proteins 0.000 description 1
- 101100513472 Mus musculus Minpp1 gene Proteins 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- DYMZHQHZULZPES-UHFFFAOYSA-N O[N+]([O-])=O.O[N+]([O-])=O.OS(O)(=O)=O Chemical compound O[N+]([O-])=O.O[N+]([O-])=O.OS(O)(=O)=O DYMZHQHZULZPES-UHFFFAOYSA-N 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 239000008235 industrial water Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000002386 leaching Methods 0.000 description 1
- 235000012054 meals Nutrition 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical compound [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/187—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates
- C01B33/193—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates of aqueous solutions of silicates
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/02—Amorphous compounds
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/50—Agglomerated particles
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/19—Oil-absorption capacity, e.g. DBP values
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
- C01P2006/82—Compositional purity water content
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12578587A JPS63291808A (ja) | 1987-05-25 | 1987-05-25 | 高純度シリカの製造方法 |
| DE19883830777 DE3830777A1 (de) | 1987-05-25 | 1988-09-09 | Verfahren zur herstellung von hochreinem siliciumdioxid |
| GB8821722A GB2222823B (en) | 1987-05-25 | 1988-09-16 | A process for producing high purity silica |
| FR8812520A FR2636938B1 (fr) | 1987-05-25 | 1988-09-26 | Procede de production de silice tres pure |
| US07/433,447 US4973462A (en) | 1987-05-25 | 1989-11-09 | Process for producing high purity silica |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12578587A JPS63291808A (ja) | 1987-05-25 | 1987-05-25 | 高純度シリカの製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63291808A true JPS63291808A (ja) | 1988-11-29 |
Family
ID=14918798
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12578587A Pending JPS63291808A (ja) | 1987-05-25 | 1987-05-25 | 高純度シリカの製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPS63291808A (fr) |
| DE (1) | DE3830777A1 (fr) |
| FR (1) | FR2636938B1 (fr) |
| GB (1) | GB2222823B (fr) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003529518A (ja) * | 2000-03-31 | 2003-10-07 | アグリテック，インク． | バイオマス灰溶液からの沈着炭素を含む又は含まない沈降シリカ及びシリカ・ゲル、及びプロセス |
| JP2013028479A (ja) * | 2011-07-27 | 2013-02-07 | Taiheiyo Cement Corp | 高純度シリカの製造方法 |
| JP2014514229A (ja) * | 2011-02-22 | 2014-06-19 | エボニック デグサ ゲーエムベーハー | 石英ガラス適用のための高純度シリカ顆粒並びにその製造法 |
| JP2018532134A (ja) * | 2015-08-13 | 2018-11-01 | オスラム オプト セミコンダクターズ ゲゼルシャフト ミット ベシュレンクテル ハフツングＯｓｒａｍ Ｏｐｔｏ Ｓｅｍｉｃｏｎｄｕｃｔｏｒｓ ＧｍｂＨ | 変換素子を製造するための方法 |
| JP2021155274A (ja) * | 2020-03-27 | 2021-10-07 | 太平洋セメント株式会社 | 高純度シリカの製造方法 |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA2021229A1 (fr) * | 1989-07-18 | 1991-01-19 | Tadashi Mochizuki | Silice de haute purete; methode de preparation |
| FR2886285B1 (fr) * | 2005-05-27 | 2008-05-30 | Rhodia Chimie Sa | Procede de preparation de silice precipitee, silice precipitee et utilisations, notamment comme charge dans les matrices silicones |
| KR101450346B1 (ko) | 2006-03-15 | 2014-10-14 | 알이에스씨 인베스트먼츠 엘엘씨 | 태양 전지 및 다른 용도를 위한 규소 제조 방법 |
| CN111039298B (zh) * | 2020-01-13 | 2023-10-24 | 福建省三明正元化工有限公司 | 一种高分散二氧化硅的制备方法 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR580768A (fr) * | 1923-04-26 | 1924-11-15 | Elektro Osmose A G Graf Schwer | Procédé de fabrication d'une silice amorphe facile à laver |
| FR957887A (fr) * | 1942-11-27 | 1950-02-28 | ||
| DE1049834B (fr) * | 1951-10-09 | |||
| GB719918A (en) * | 1951-12-11 | 1954-12-08 | Wyandotte Chemicals Corp | Production of pigment grade silica |
| GB800694A (en) * | 1954-11-05 | 1958-09-03 | Columbia Southern Chem Corp | Improvements in or relating to silicas |
| AU497891B2 (en) * | 1974-05-22 | 1979-01-18 | J.M. Huber Corp. | Siliceous pigments & their production |
| JPS6025325B2 (ja) * | 1977-06-17 | 1985-06-18 | 石川島播磨重工業株式会社 | 円筒状物保管装置 |
| JPS6117416A (ja) * | 1984-07-03 | 1986-01-25 | Nippon Chem Ind Co Ltd:The | 高純度シリカおよびその製造方法 |
| CA1271307A (fr) * | 1985-06-27 | 1990-07-10 | Iwao Ohshima | Fabrication de silice extra-pur |
| JPS6212608A (ja) * | 1985-07-11 | 1987-01-21 | Nippon Chem Ind Co Ltd:The | 高純度シリカ及びその製造方法 |
-
1987
- 1987-05-25 JP JP12578587A patent/JPS63291808A/ja active Pending
-
1988
- 1988-09-09 DE DE19883830777 patent/DE3830777A1/de not_active Withdrawn
- 1988-09-16 GB GB8821722A patent/GB2222823B/en not_active Expired
- 1988-09-26 FR FR8812520A patent/FR2636938B1/fr not_active Expired - Lifetime
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003529518A (ja) * | 2000-03-31 | 2003-10-07 | アグリテック，インク． | バイオマス灰溶液からの沈着炭素を含む又は含まない沈降シリカ及びシリカ・ゲル、及びプロセス |
| JP2014514229A (ja) * | 2011-02-22 | 2014-06-19 | エボニック デグサ ゲーエムベーハー | 石英ガラス適用のための高純度シリカ顆粒並びにその製造法 |
| JP2013028479A (ja) * | 2011-07-27 | 2013-02-07 | Taiheiyo Cement Corp | 高純度シリカの製造方法 |
| JP2018532134A (ja) * | 2015-08-13 | 2018-11-01 | オスラム オプト セミコンダクターズ ゲゼルシャフト ミット ベシュレンクテル ハフツングＯｓｒａｍ Ｏｐｔｏ Ｓｅｍｉｃｏｎｄｕｃｔｏｒｓ ＧｍｂＨ | 変換素子を製造するための方法 |
| US10287492B2 (en) | 2015-08-13 | 2019-05-14 | Osram Opto Semiconductors Gmbh | Method for producing a conversion element |
| JP2021155274A (ja) * | 2020-03-27 | 2021-10-07 | 太平洋セメント株式会社 | 高純度シリカの製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| GB2222823B (en) | 1992-04-08 |
| DE3830777A1 (de) | 1990-03-15 |
| GB8821722D0 (en) | 1988-10-19 |
| FR2636938B1 (fr) | 1992-03-06 |
| GB2222823A (en) | 1990-03-21 |
| FR2636938A1 (fr) | 1990-03-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4973462A (en) | Process for producing high purity silica | |
| EP0557740B1 (fr) | Procédé de préparation d'un sol aqueux de silice de haute pureté | |
| JPS63291808A (ja) | 高純度シリカの製造方法 | |
| JPH0481526B2 (fr) | ||
| US7140201B2 (en) | Method for producing silica particles | |
| JP2542797B2 (ja) | 高純度シリカの製造方法 | |
| KR100349632B1 (ko) | 실리카졸의 제조방법 | |
| JPH0717370B2 (ja) | 高純度ケイ酸水溶液の製造方法 | |
| US4126665A (en) | Preparation of polymeric alkaline earth metaphosphate glasses | |
| JPS58110416A (ja) | シリカゾルの製造方法 | |
| JPS6090811A (ja) | 高純度シリカの製造法 | |
| JPH0118006B2 (fr) | ||
| GB1013983A (en) | Improvements in the hydrometallurgical production of aluminium sulphate | |
| JP2002241122A (ja) | 高純度シリカの製造方法 | |
| JPS6335413A (ja) | 純粋なホウ酸の製法 | |
| JPH01230422A (ja) | 高純度シリカ及びその製造方法 | |
| CN114920254B (zh) | 一种利用废弃明矾石尾矿制备聚硅酸氯化硫酸铝铁的方法 | |
| EP4450657A1 (fr) | Procédé de récupération d'ions lithium | |
| JPH02311310A (ja) | 高純度シリカ微粉末の製造方法 | |
| JPH0333730B2 (fr) | ||
| JPH0121093B2 (fr) | ||
| JPS60180911A (ja) | 高純度シリカおよびその製造法 | |
| JPS6321213A (ja) | 高純度シリカの製造方法 | |
| US3890428A (en) | Decolorization of ammonium thiosulfate | |
| CN112375904A (zh) | 一种从钙化碱性氧化球团浸钒母液中脱硅的方法 |