JPS6325661B2 - - Google Patents

Info

Publication number
JPS6325661B2
JPS6325661B2 JP13982184A JP13982184A JPS6325661B2 JP S6325661 B2 JPS6325661 B2 JP S6325661B2 JP 13982184 A JP13982184 A JP 13982184A JP 13982184 A JP13982184 A JP 13982184A JP S6325661 B2 JPS6325661 B2 JP S6325661B2
Authority
JP
Japan
Prior art keywords
cleaning
glass mask
mask
glass
pure water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP13982184A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6118958A (ja
Inventor
Mitsunori Matsumoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP59139821A priority Critical patent/JPS6118958A/ja
Publication of JPS6118958A publication Critical patent/JPS6118958A/ja
Publication of JPS6325661B2 publication Critical patent/JPS6325661B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Cleaning By Liquid Or Steam (AREA)
JP59139821A 1984-07-04 1984-07-04 半導体装置用ガラスマスクの洗浄方法 Granted JPS6118958A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59139821A JPS6118958A (ja) 1984-07-04 1984-07-04 半導体装置用ガラスマスクの洗浄方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59139821A JPS6118958A (ja) 1984-07-04 1984-07-04 半導体装置用ガラスマスクの洗浄方法

Publications (2)

Publication Number Publication Date
JPS6118958A JPS6118958A (ja) 1986-01-27
JPS6325661B2 true JPS6325661B2 (enrdf_load_html_response) 1988-05-26

Family

ID=15254249

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59139821A Granted JPS6118958A (ja) 1984-07-04 1984-07-04 半導体装置用ガラスマスクの洗浄方法

Country Status (1)

Country Link
JP (1) JPS6118958A (enrdf_load_html_response)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62188323A (ja) * 1986-02-14 1987-08-17 Dainippon Screen Mfg Co Ltd 基板の洗浄並びに乾燥方法及び装置
JPH0695511B2 (ja) * 1986-09-17 1994-11-24 大日本スクリ−ン製造株式会社 洗浄乾燥処理方法
US4817652A (en) * 1987-03-26 1989-04-04 Regents Of The University Of Minnesota System for surface and fluid cleaning
JPH0745956Y2 (ja) * 1987-05-06 1995-10-18 株式会社ダン科学 キャリア洗浄処理装置
JPH0745957Y2 (ja) * 1987-05-06 1995-10-18 株式会社ダン科学 キャリア洗浄乾燥装置
JP2833762B2 (ja) * 1988-09-21 1998-12-09 株式会社芝浦製作所 ガラス基板の乾燥装置
JP2653511B2 (ja) * 1989-03-30 1997-09-17 株式会社東芝 半導体装置の洗浄方法及びその洗浄装置
JPH0320734A (ja) * 1989-06-16 1991-01-29 Matsushita Electron Corp 洗浄装置
JPH03139832A (ja) * 1989-10-25 1991-06-14 Ebara Corp ジェットスクラバー
JP2894450B2 (ja) * 1989-10-30 1999-05-24 株式会社荏原製作所 ジェットスクラバー
JP2894451B2 (ja) * 1989-11-06 1999-05-24 株式会社荏原製作所 ジェットスクラバー
KR20020029206A (ko) * 2000-10-12 2002-04-18 윤종용 세정 가능한 파티클 펠리클 디텍터 박스
JP2002292346A (ja) * 2001-03-29 2002-10-08 Sharp Corp 付着膜回収装置および付着膜の回収方法
CN102357482B (zh) * 2011-09-22 2013-07-17 无锡泰东机械有限公司 高效快速在线清洗机
CN116274069B (zh) * 2022-11-11 2025-09-12 湖南普照信息材料有限公司 一种掩膜版玻璃基底的清洗方法

Also Published As

Publication number Publication date
JPS6118958A (ja) 1986-01-27

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