JPS63250881A - 超電導体の作製方法 - Google Patents
超電導体の作製方法Info
- Publication number
- JPS63250881A JPS63250881A JP62086494A JP8649487A JPS63250881A JP S63250881 A JPS63250881 A JP S63250881A JP 62086494 A JP62086494 A JP 62086494A JP 8649487 A JP8649487 A JP 8649487A JP S63250881 A JPS63250881 A JP S63250881A
- Authority
- JP
- Japan
- Prior art keywords
- superconducting
- substrate
- laser
- ceramic
- ceramics
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002887 superconductor Substances 0.000 title claims abstract description 9
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 239000000758 substrate Substances 0.000 claims abstract description 16
- 229910010293 ceramic material Inorganic materials 0.000 claims abstract description 14
- 230000001678 irradiating effect Effects 0.000 claims abstract description 6
- 230000001590 oxidative effect Effects 0.000 claims abstract description 4
- 239000000463 material Substances 0.000 claims description 21
- 238000010438 heat treatment Methods 0.000 claims description 2
- 239000000919 ceramic Substances 0.000 abstract description 25
- 238000000034 method Methods 0.000 abstract description 7
- 238000007639 printing Methods 0.000 abstract description 4
- 238000004544 sputter deposition Methods 0.000 abstract description 4
- 230000000717 retained effect Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 11
- 239000010409 thin film Substances 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910052574 oxide ceramic Inorganic materials 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000005224 laser annealing Methods 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004146 energy storage Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- -1 ittria Chemical compound 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000013081 microcrystal Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000011224 oxide ceramic Substances 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0268—Manufacture or treatment of devices comprising copper oxide
- H10N60/0661—Processes performed after copper oxide formation, e.g. patterning
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
- H01F41/04—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing coils
- H01F41/048—Superconductive coils
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F6/00—Superconducting magnets; Superconducting coils
- H01F6/06—Coils, e.g. winding, insulating, terminating or casing arrangements therefor
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0268—Manufacture or treatment of devices comprising copper oxide
- H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
- H10N60/0408—Processes for depositing or forming copper oxide superconductor layers by sputtering
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0268—Manufacture or treatment of devices comprising copper oxide
- H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
- H10N60/0521—Processes for depositing or forming copper oxide superconductor layers by pulsed laser deposition, e.g. laser sputtering
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0268—Manufacture or treatment of devices comprising copper oxide
- H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
- H10N60/0576—Processes for depositing or forming copper oxide superconductor layers characterised by the substrate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/922—Static electricity metal bleed-off metallic stock
- Y10S428/9265—Special properties
- Y10S428/93—Electric superconducting
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S505/00—Superconductor technology: apparatus, material, process
- Y10S505/70—High TC, above 30 k, superconducting device, article, or structured stock
- Y10S505/701—Coated or thin film device, i.e. active or passive
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S505/00—Superconductor technology: apparatus, material, process
- Y10S505/70—High TC, above 30 k, superconducting device, article, or structured stock
- Y10S505/701—Coated or thin film device, i.e. active or passive
- Y10S505/703—Microelectronic device with superconducting conduction line
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S505/00—Superconductor technology: apparatus, material, process
- Y10S505/70—High TC, above 30 k, superconducting device, article, or structured stock
- Y10S505/704—Wire, fiber, or cable
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S505/00—Superconductor technology: apparatus, material, process
- Y10S505/70—High TC, above 30 k, superconducting device, article, or structured stock
- Y10S505/704—Wire, fiber, or cable
- Y10S505/705—Magnetic coil
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S505/00—Superconductor technology: apparatus, material, process
- Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
- Y10S505/728—Etching
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S505/00—Superconductor technology: apparatus, material, process
- Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
- Y10S505/73—Vacuum treating or coating
- Y10S505/731—Sputter coating
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S505/00—Superconductor technology: apparatus, material, process
- Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
- Y10S505/742—Annealing
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/24926—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including ceramic, glass, porcelain or quartz layer
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Superconductors And Manufacturing Methods Therefor (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62086494A JPS63250881A (ja) | 1987-04-07 | 1987-04-07 | 超電導体の作製方法 |
| US07/174,503 US4957900A (en) | 1987-04-07 | 1988-03-28 | Method of manufacturing a superconducting pattern by light irradiation |
| DE3888003T DE3888003T2 (de) | 1987-04-07 | 1988-04-07 | Verfahren zur Herstellung keramischer Supraleiter. |
| EP88303124A EP0286410B1 (de) | 1987-04-07 | 1988-04-07 | Verfahren zur Herstellung keramischer Supraleiter |
| CN88101989A CN1013906B (zh) | 1987-04-07 | 1988-04-07 | 用光照制造超导图形的方法 |
| KR1019880003864A KR910004993B1 (ko) | 1987-04-07 | 1988-04-07 | 광 조사에 의한 초전도 패턴의 제조방법 |
| US07/538,740 US5912211A (en) | 1987-04-07 | 1990-06-15 | Method of manufacturing a superconducting pattern by light irradiation |
| US07/763,596 US5248658A (en) | 1987-04-07 | 1991-09-23 | Method of manufacturing a superconducting oxide pattern by laser sublimation |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62086494A JPS63250881A (ja) | 1987-04-07 | 1987-04-07 | 超電導体の作製方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63250881A true JPS63250881A (ja) | 1988-10-18 |
Family
ID=13888534
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62086494A Pending JPS63250881A (ja) | 1987-04-07 | 1987-04-07 | 超電導体の作製方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US4957900A (de) |
| EP (1) | EP0286410B1 (de) |
| JP (1) | JPS63250881A (de) |
| KR (1) | KR910004993B1 (de) |
| CN (1) | CN1013906B (de) |
| DE (1) | DE3888003T2 (de) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63257127A (ja) * | 1987-04-13 | 1988-10-25 | Matsushita Electric Ind Co Ltd | 薄膜超電導体の製造方法 |
| JPS6433006A (en) * | 1987-04-08 | 1989-02-02 | Hitachi Ltd | Production of superconducting oxide and superconducting device |
| JPS6448325A (en) * | 1987-04-10 | 1989-02-22 | American Telephone & Telegraph | Manufacture of superconducting material layer |
| JP2006108637A (ja) * | 2004-07-30 | 2006-04-20 | Nexans | シャント抵抗を有する超電導抵抗性電流制限器 |
| JP2006237578A (ja) * | 2005-01-12 | 2006-09-07 | Nexans | 超伝導電流制限部品 |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5248658A (en) * | 1987-04-07 | 1993-09-28 | Semiconductor Energy Laboratory Co., Ltd. | Method of manufacturing a superconducting oxide pattern by laser sublimation |
| JPS63250881A (ja) * | 1987-04-07 | 1988-10-18 | Semiconductor Energy Lab Co Ltd | 超電導体の作製方法 |
| US5401716A (en) * | 1987-04-15 | 1995-03-28 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing superconducting patterns |
| US5041420A (en) * | 1987-06-26 | 1991-08-20 | Hewlett-Packard Company | Method for making superconductor films from organometallic precursors |
| US5225394A (en) * | 1987-08-31 | 1993-07-06 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing high Tc superconducting circuits |
| US5034359A (en) * | 1988-04-08 | 1991-07-23 | Kabushiki Kaisha Toshiba | Insulating composition |
| FR2647266A1 (fr) * | 1989-05-17 | 1990-11-23 | Ecole Cle Arts Manufactures | Element de circuit electrique ou electronique comportant un supraconducteur sur lequel sont fixes des elements conducteurs |
| US5248657A (en) * | 1991-05-13 | 1993-09-28 | General Dynamics Corporation, Space Systems Division | Method for forming internally helixed high temperature superconductor assembly |
| JPH0812821B2 (ja) * | 1992-07-23 | 1996-02-07 | 株式会社超伝導センサ研究所 | 磁気ピックアップコイル |
| CA2074896C (en) * | 1992-07-29 | 2002-07-30 | Linh Ngo Phong | Process for making cuo superconductors |
| JPH0870144A (ja) * | 1994-08-26 | 1996-03-12 | Sumitomo Electric Ind Ltd | 超電導部品の作製方法 |
| GB9624586D0 (en) * | 1996-11-27 | 1997-01-15 | British Nuclear Fuels Plc | Improvements in and relating to coils |
| US6069714A (en) * | 1996-12-05 | 2000-05-30 | Applied Science Fiction, Inc. | Method and apparatus for reducing noise in electronic film development |
| JP4362009B2 (ja) * | 1997-10-13 | 2009-11-11 | ネクサン・スーパーコンダクターズ・ゲー・エム・ベー・ハー | 高温超伝導材料からコイルを製造する方法及び低交流損失高温超伝導コイル |
| US6066830A (en) * | 1998-06-04 | 2000-05-23 | Astronics Corporation | Laser etching of electroluminescent lamp electrode structures, and electroluminescent lamps produced thereby |
| US6703137B2 (en) * | 2001-08-02 | 2004-03-09 | Siemens Westinghouse Power Corporation | Segmented thermal barrier coating and method of manufacturing the same |
| GB0120697D0 (en) | 2001-08-24 | 2001-10-17 | Coated Conductors Consultancy | Superconducting coil fabrication |
| GB0305146D0 (en) * | 2003-03-06 | 2003-04-09 | Coated Conductors Consultancy | Superconducting coil testing |
| US7879685B2 (en) * | 2006-08-04 | 2011-02-01 | Solyndra, Inc. | System and method for creating electric isolation between layers comprising solar cells |
| US20080029152A1 (en) * | 2006-08-04 | 2008-02-07 | Erel Milshtein | Laser scribing apparatus, systems, and methods |
| JP5327932B2 (ja) * | 2007-02-08 | 2013-10-30 | 独立行政法人産業技術総合研究所 | 超電導コーティング材料の製造方法 |
| DE102010040272B4 (de) * | 2010-09-06 | 2018-04-19 | Siemens Aktiengesellschaft | Hochtemperatur-Supraleiter (HTS)-Spule |
| DE102011081465A1 (de) * | 2011-08-24 | 2013-02-28 | Siemens Aktiengesellschaft | Verfahren zur Herstellung von supraleitenden Spulen und Vorrichtung mit einer supraleitenden Spule hergestellt nach dem Verfahren |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5269297A (en) * | 1975-12-05 | 1977-06-08 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of josephson element |
| JPS5325996A (en) * | 1976-08-24 | 1978-03-10 | Toshiba Corp | Laser working method |
| JPS5720486A (en) * | 1980-07-11 | 1982-02-02 | Nippon Telegr & Teleph Corp <Ntt> | Superconductive integrated circuit and preparation thereof |
| JPS58176982A (ja) * | 1982-04-12 | 1983-10-17 | Agency Of Ind Science & Technol | ジヨセフソン接合素子の製造方法 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4081653A (en) * | 1976-12-27 | 1978-03-28 | Western Electric Co., Inc. | Removal of thin films from substrates by laser induced explosion |
| US4588947A (en) * | 1983-12-30 | 1986-05-13 | International Business Machines Corporation | Integrated miniature DC SQUID susceptometer for measuring properties of very small samples |
| JPS61225807A (ja) * | 1985-03-29 | 1986-10-07 | Kobe Steel Ltd | 超電導コイルの製造方法 |
| US5232905A (en) * | 1987-01-30 | 1993-08-03 | Hitachi, Ltd. | High Tc superconducting device with weak link between two superconducting electrodes |
| US4952554A (en) * | 1987-04-01 | 1990-08-28 | At&T Bell Laboratories | Apparatus and systems comprising a clad superconductive oxide body, and method for producing such body |
| JPS63250881A (ja) * | 1987-04-07 | 1988-10-18 | Semiconductor Energy Lab Co Ltd | 超電導体の作製方法 |
| DE3718323A1 (de) * | 1987-06-01 | 1988-12-22 | Siemens Ag | Verfahren zur oberflaechenbearbeitung, zum schneiden und dgl. von koerpern aus oxidwerkstoff |
| US4908346A (en) * | 1987-07-01 | 1990-03-13 | Eastman Kodak Company | Crystalline rare earth alkaline earth copper oxide thick film circuit element with superconducting onset transition temperature in excess of 77% |
| JPS6411305A (en) * | 1987-07-06 | 1989-01-13 | Sumitomo Electric Industries | Superconducting coil and manufacture thereof |
| JP2557486B2 (ja) * | 1987-08-20 | 1996-11-27 | 住友電気工業株式会社 | 超電導セラミックス長尺体の製造方法および超電導セラミックス長尺体 |
| US5079222A (en) * | 1987-08-31 | 1992-01-07 | Semiconductor Energy Laboratory Co., Ltd. | Superconducting ceramic circuits and manufacturing method for the same |
| US4997809A (en) * | 1987-11-18 | 1991-03-05 | International Business Machines Corporation | Fabrication of patterned lines of high Tc superconductors |
-
1987
- 1987-04-07 JP JP62086494A patent/JPS63250881A/ja active Pending
-
1988
- 1988-03-28 US US07/174,503 patent/US4957900A/en not_active Expired - Fee Related
- 1988-04-07 CN CN88101989A patent/CN1013906B/zh not_active Expired
- 1988-04-07 KR KR1019880003864A patent/KR910004993B1/ko not_active IP Right Cessation
- 1988-04-07 EP EP88303124A patent/EP0286410B1/de not_active Expired - Lifetime
- 1988-04-07 DE DE3888003T patent/DE3888003T2/de not_active Expired - Fee Related
-
1990
- 1990-06-15 US US07/538,740 patent/US5912211A/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5269297A (en) * | 1975-12-05 | 1977-06-08 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of josephson element |
| JPS5325996A (en) * | 1976-08-24 | 1978-03-10 | Toshiba Corp | Laser working method |
| JPS5720486A (en) * | 1980-07-11 | 1982-02-02 | Nippon Telegr & Teleph Corp <Ntt> | Superconductive integrated circuit and preparation thereof |
| JPS58176982A (ja) * | 1982-04-12 | 1983-10-17 | Agency Of Ind Science & Technol | ジヨセフソン接合素子の製造方法 |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6433006A (en) * | 1987-04-08 | 1989-02-02 | Hitachi Ltd | Production of superconducting oxide and superconducting device |
| JPS6448325A (en) * | 1987-04-10 | 1989-02-22 | American Telephone & Telegraph | Manufacture of superconducting material layer |
| JPS63257127A (ja) * | 1987-04-13 | 1988-10-25 | Matsushita Electric Ind Co Ltd | 薄膜超電導体の製造方法 |
| JP2006108637A (ja) * | 2004-07-30 | 2006-04-20 | Nexans | シャント抵抗を有する超電導抵抗性電流制限器 |
| JP2006237578A (ja) * | 2005-01-12 | 2006-09-07 | Nexans | 超伝導電流制限部品 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE3888003T2 (de) | 1994-06-09 |
| EP0286410A2 (de) | 1988-10-12 |
| CN1013906B (zh) | 1991-09-11 |
| DE3888003D1 (de) | 1994-04-07 |
| US4957900A (en) | 1990-09-18 |
| KR880013186A (ko) | 1988-11-30 |
| EP0286410B1 (de) | 1994-03-02 |
| CN88101989A (zh) | 1988-10-26 |
| EP0286410A3 (en) | 1990-02-28 |
| KR910004993B1 (ko) | 1991-07-20 |
| US5912211A (en) | 1999-06-15 |
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