KR880013186A - 광 조사에 의한 초전도 패턴의 제조방법 - Google Patents

광 조사에 의한 초전도 패턴의 제조방법 Download PDF

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KR880013186A
KR880013186A KR1019880003864A KR880003864A KR880013186A KR 880013186 A KR880013186 A KR 880013186A KR 1019880003864 A KR1019880003864 A KR 1019880003864A KR 880003864 A KR880003864 A KR 880003864A KR 880013186 A KR880013186 A KR 880013186A
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ceramic layer
light
superconducting
manufacturing
cylinder
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KR1019880003864A
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KR910004993B1 (ko
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슌페이 야마자기
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야마자끼 슌페이
가부시끼 가이샤 한도다이 에네르기 겐뀨쇼
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00Superconducting devices
    • H10N60/01Manufacture or treatment
    • H10N60/0268Manufacture or treatment of devices comprising copper oxide
    • H10N60/0661Processes performed after copper oxide formation, e.g. patterning
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/02Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
    • H01F41/04Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing coils
    • H01F41/048Superconductive coils
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F6/00Superconducting magnets; Superconducting coils
    • H01F6/06Coils, e.g. winding, insulating, terminating or casing arrangements therefor
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00Superconducting devices
    • H10N60/01Manufacture or treatment
    • H10N60/0268Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0408Processes for depositing or forming copper oxide superconductor layers by sputtering
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00Superconducting devices
    • H10N60/01Manufacture or treatment
    • H10N60/0268Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0521Processes for depositing or forming copper oxide superconductor layers by pulsed laser deposition, e.g. laser sputtering
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00Superconducting devices
    • H10N60/01Manufacture or treatment
    • H10N60/0268Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0576Processes for depositing or forming copper oxide superconductor layers characterised by the substrate
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00Stock material or miscellaneous articles
    • Y10S428/922Static electricity metal bleed-off metallic stock
    • Y10S428/9265Special properties
    • Y10S428/93Electric superconducting
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00Superconductor technology: apparatus, material, process
    • Y10S505/70High TC, above 30 k, superconducting device, article, or structured stock
    • Y10S505/701Coated or thin film device, i.e. active or passive
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00Superconductor technology: apparatus, material, process
    • Y10S505/70High TC, above 30 k, superconducting device, article, or structured stock
    • Y10S505/701Coated or thin film device, i.e. active or passive
    • Y10S505/703Microelectronic device with superconducting conduction line
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00Superconductor technology: apparatus, material, process
    • Y10S505/70High TC, above 30 k, superconducting device, article, or structured stock
    • Y10S505/704Wire, fiber, or cable
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00Superconductor technology: apparatus, material, process
    • Y10S505/70High TC, above 30 k, superconducting device, article, or structured stock
    • Y10S505/704Wire, fiber, or cable
    • Y10S505/705Magnetic coil
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00Superconductor technology: apparatus, material, process
    • Y10S505/725Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/728Etching
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00Superconductor technology: apparatus, material, process
    • Y10S505/725Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/73Vacuum treating or coating
    • Y10S505/731Sputter coating
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00Superconductor technology: apparatus, material, process
    • Y10S505/725Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/742Annealing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24926Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including ceramic, glass, porcelain or quartz layer

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

내용 없음

Description

광 조사에 의한 초전도 패턴의 제조방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제 1 도는 본 발명에 따른 초전도 세라믹 패턴의 제조과정을 도시한 투시도, 제 2 도는 본 발명에 따른 초전도 세라믹 패턴의 또다른 실시예를 도시한 투시도.

Claims (9)

  1. 초전도 세라믹 패턴을 제조하는 방법에 있어서, 표면에 초전도 세라믹 층을 형성하는 단계와, 상기 세라믹 층의 추사된 부분을 제거하기 위해 광으로써 상기 세라믹 층의 부분을 조사하고 승화하는 단계로 이루어진 것을 특징으로 하는 초전도 세라믹 패턴 제조방법.
  2. 제 1 항에 있어서, 상기 세라믹층은 스퍼터팅에 의해서 상기 표면에 부착되는 것을 특징으로 하는 초전도 세라믹 패턴 제조방법.
  3. 제 1 항에 있어서, 상기 광은 레이저 빔인 것을 특징으로 하는 초전도 세라믹 패턴 제조방법.
  4. 제 3 항에 있어서, 상기 광은 레이저 빔의 연속 펄스인 것을 특징으로 하는 초전도 세라믹 패턴 제조방법.
  5. 제 4 항중에 있어서, 상기 펄스는 세라믹층의 선정된 선을 추적하여 상기 세라믹층의 부분을 조사하는 것을 특징으로 하는 초전도 세라믹 패턴 제조방법.
  6. 제 1 항에 있어서, 상기 표면은 원통의 주변이며, 상기 광은 초전도 코일을 형성하도록 상기 표면의 선정된 헬릭스에 방사되는 것을 특징으로 하는 초전도 세라믹 패턴 제조방법.
  7. 제 6 항에 있어서, 상기 원통은 상기 광의 방사부분의 원통에 관해 2축방향으로 이동하며 반면에 상기 조사단계 동안 원통은 2측을 중심으로 회전하는 것을 특징으로 하는 초전도 세라믹 패턴 제조방법.
  8. 제 1 항에 있어서, 상기 표면은 상기 세라믹 필름의 열적팽창계수가 50내지 150%의 열적팽창 계수를 갖는 물질로 된 것을 특징으로 하는 초전도 세라믹 패턴 제조방법.
  9. 제 8 항에 있어서, 상기 기관은 YSZ으로 만들어진 것을 특징으로 하는 초전도 세라믹 패턴 제조방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019880003864A 1987-04-07 1988-04-07 광 조사에 의한 초전도 패턴의 제조방법 KR910004993B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP62086494A JPS63250881A (ja) 1987-04-07 1987-04-07 超電導体の作製方法
JP62-86494 1987-04-07

Publications (2)

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KR880013186A true KR880013186A (ko) 1988-11-30
KR910004993B1 KR910004993B1 (ko) 1991-07-20

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Country Status (6)

Country Link
US (2) US4957900A (ko)
EP (1) EP0286410B1 (ko)
JP (1) JPS63250881A (ko)
KR (1) KR910004993B1 (ko)
CN (1) CN1013906B (ko)
DE (1) DE3888003T2 (ko)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5248658A (en) * 1987-04-07 1993-09-28 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing a superconducting oxide pattern by laser sublimation
JPS63250881A (ja) * 1987-04-07 1988-10-18 Semiconductor Energy Lab Co Ltd 超電導体の作製方法
EP0286106B1 (en) * 1987-04-08 1995-08-02 Hitachi, Ltd. Process for manufacturing a superconductive device
EP0287258B1 (en) * 1987-04-10 1992-07-01 AT&T Corp. Method of producing a layer of superconductive material
JP2702711B2 (ja) * 1987-04-13 1998-01-26 松下電器産業株式会社 薄膜超電導体の製造方法
US5401716A (en) * 1987-04-15 1995-03-28 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing superconducting patterns
US5041420A (en) * 1987-06-26 1991-08-20 Hewlett-Packard Company Method for making superconductor films from organometallic precursors
US5225394A (en) * 1987-08-31 1993-07-06 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing high Tc superconducting circuits
US5034359A (en) * 1988-04-08 1991-07-23 Kabushiki Kaisha Toshiba Insulating composition
FR2647266A1 (fr) * 1989-05-17 1990-11-23 Ecole Cle Arts Manufactures Element de circuit electrique ou electronique comportant un supraconducteur sur lequel sont fixes des elements conducteurs
US5248657A (en) * 1991-05-13 1993-09-28 General Dynamics Corporation, Space Systems Division Method for forming internally helixed high temperature superconductor assembly
JPH0812821B2 (ja) * 1992-07-23 1996-02-07 株式会社超伝導センサ研究所 磁気ピックアップコイル
CA2074896C (en) * 1992-07-29 2002-07-30 Linh Ngo Phong Process for making cuo superconductors
JPH0870144A (ja) * 1994-08-26 1996-03-12 Sumitomo Electric Ind Ltd 超電導部品の作製方法
GB9624586D0 (en) * 1996-11-27 1997-01-15 British Nuclear Fuels Plc Improvements in and relating to coils
US6069714A (en) * 1996-12-05 2000-05-30 Applied Science Fiction, Inc. Method and apparatus for reducing noise in electronic film development
CA2305500C (en) * 1997-10-13 2008-01-22 Aventis Research & Technologies Gmbh & Co. Kg Method for producing a coil from a high temperature superconductive material, and a high temperature superconductive coil with low alternating current loss
US6066830A (en) * 1998-06-04 2000-05-23 Astronics Corporation Laser etching of electroluminescent lamp electrode structures, and electroluminescent lamps produced thereby
US6703137B2 (en) * 2001-08-02 2004-03-09 Siemens Westinghouse Power Corporation Segmented thermal barrier coating and method of manufacturing the same
GB0120697D0 (en) 2001-08-24 2001-10-17 Coated Conductors Consultancy Superconducting coil fabrication
GB0305146D0 (en) * 2003-03-06 2003-04-09 Coated Conductors Consultancy Superconducting coil testing
EP1622210B1 (en) * 2004-07-30 2009-11-04 Nexans Superconducting resistive current limiter with a shunt
EP1681731A1 (en) * 2005-01-12 2006-07-19 Nexans Compact superconducting current limiting component in coil configuration with low inductance
US7879685B2 (en) * 2006-08-04 2011-02-01 Solyndra, Inc. System and method for creating electric isolation between layers comprising solar cells
US20080029152A1 (en) * 2006-08-04 2008-02-07 Erel Milshtein Laser scribing apparatus, systems, and methods
JP5327932B2 (ja) * 2007-02-08 2013-10-30 独立行政法人産業技術総合研究所 超電導コーティング材料の製造方法
DE102010040272B4 (de) * 2010-09-06 2018-04-19 Siemens Aktiengesellschaft Hochtemperatur-Supraleiter (HTS)-Spule
DE102011081465A1 (de) * 2011-08-24 2013-02-28 Siemens Aktiengesellschaft Verfahren zur Herstellung von supraleitenden Spulen und Vorrichtung mit einer supraleitenden Spule hergestellt nach dem Verfahren

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5269297A (en) * 1975-12-05 1977-06-08 Nippon Telegr & Teleph Corp <Ntt> Manufacture of josephson element
JPS5325996A (en) * 1976-08-24 1978-03-10 Toshiba Corp Laser working method
US4081653A (en) * 1976-12-27 1978-03-28 Western Electric Co., Inc. Removal of thin films from substrates by laser induced explosion
JPS5845194B2 (ja) * 1980-07-11 1983-10-07 日本電信電話株式会社 超伝導集積回路およびその製法
JPS58176982A (ja) * 1982-04-12 1983-10-17 Agency Of Ind Science & Technol ジヨセフソン接合素子の製造方法
US4588947A (en) * 1983-12-30 1986-05-13 International Business Machines Corporation Integrated miniature DC SQUID susceptometer for measuring properties of very small samples
JPS61225807A (ja) * 1985-03-29 1986-10-07 Kobe Steel Ltd 超電導コイルの製造方法
US5232905A (en) * 1987-01-30 1993-08-03 Hitachi, Ltd. High Tc superconducting device with weak link between two superconducting electrodes
US4952554A (en) * 1987-04-01 1990-08-28 At&T Bell Laboratories Apparatus and systems comprising a clad superconductive oxide body, and method for producing such body
JPS63250881A (ja) * 1987-04-07 1988-10-18 Semiconductor Energy Lab Co Ltd 超電導体の作製方法
DE3718323A1 (de) * 1987-06-01 1988-12-22 Siemens Ag Verfahren zur oberflaechenbearbeitung, zum schneiden und dgl. von koerpern aus oxidwerkstoff
US4908346A (en) * 1987-07-01 1990-03-13 Eastman Kodak Company Crystalline rare earth alkaline earth copper oxide thick film circuit element with superconducting onset transition temperature in excess of 77%
JPS6411305A (en) * 1987-07-06 1989-01-13 Sumitomo Electric Industries Superconducting coil and manufacture thereof
JP2557486B2 (ja) * 1987-08-20 1996-11-27 住友電気工業株式会社 超電導セラミックス長尺体の製造方法および超電導セラミックス長尺体
US5079222A (en) * 1987-08-31 1992-01-07 Semiconductor Energy Laboratory Co., Ltd. Superconducting ceramic circuits and manufacturing method for the same
US4997809A (en) * 1987-11-18 1991-03-05 International Business Machines Corporation Fabrication of patterned lines of high Tc superconductors

Also Published As

Publication number Publication date
EP0286410A3 (en) 1990-02-28
DE3888003T2 (de) 1994-06-09
KR910004993B1 (ko) 1991-07-20
CN88101989A (zh) 1988-10-26
DE3888003D1 (de) 1994-04-07
JPS63250881A (ja) 1988-10-18
US4957900A (en) 1990-09-18
US5912211A (en) 1999-06-15
EP0286410A2 (en) 1988-10-12
CN1013906B (zh) 1991-09-11
EP0286410B1 (en) 1994-03-02

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