JPS63237577A - Misfet製造方法 - Google Patents
Misfet製造方法Info
- Publication number
- JPS63237577A JPS63237577A JP62073253A JP7325387A JPS63237577A JP S63237577 A JPS63237577 A JP S63237577A JP 62073253 A JP62073253 A JP 62073253A JP 7325387 A JP7325387 A JP 7325387A JP S63237577 A JPS63237577 A JP S63237577A
- Authority
- JP
- Japan
- Prior art keywords
- gate electrode
- insulating film
- film
- gate
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
Landscapes
- Thin Film Transistor (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62073253A JPS63237577A (ja) | 1987-03-26 | 1987-03-26 | Misfet製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62073253A JPS63237577A (ja) | 1987-03-26 | 1987-03-26 | Misfet製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63237577A true JPS63237577A (ja) | 1988-10-04 |
JPH0586074B2 JPH0586074B2 (enrdf_load_stackoverflow) | 1993-12-09 |
Family
ID=13512825
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62073253A Granted JPS63237577A (ja) | 1987-03-26 | 1987-03-26 | Misfet製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63237577A (enrdf_load_stackoverflow) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0439967A (ja) * | 1990-06-05 | 1992-02-10 | Matsushita Electric Ind Co Ltd | 薄膜トランジスターの製造方法 |
JPH05275452A (ja) * | 1992-03-25 | 1993-10-22 | Semiconductor Energy Lab Co Ltd | 薄膜状絶縁ゲイト型半導体装置およびその作製方法 |
JPH0799317A (ja) * | 1993-08-12 | 1995-04-11 | Semiconductor Energy Lab Co Ltd | 薄膜状絶縁ゲイト型半導体装置およびその作製方法 |
US6124155A (en) * | 1991-06-19 | 2000-09-26 | Semiconductor Energy Laboratory Co., Ltd. | Electro-optical device and thin film transistor and method for forming the same |
US6331717B1 (en) * | 1993-08-12 | 2001-12-18 | Semiconductor Energy Laboratory Co. Ltd. | Insulated gate semiconductor device and process for fabricating the same |
JP2009033134A (ja) * | 2007-06-29 | 2009-02-12 | Semiconductor Energy Lab Co Ltd | 半導体装置及び半導体装置の作製方法、並びに電子機器 |
-
1987
- 1987-03-26 JP JP62073253A patent/JPS63237577A/ja active Granted
Cited By (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0439967A (ja) * | 1990-06-05 | 1992-02-10 | Matsushita Electric Ind Co Ltd | 薄膜トランジスターの製造方法 |
US6797548B2 (en) | 1991-06-19 | 2004-09-28 | Semiconductor Energy Laboratory Co., Inc. | Electro-optical device and thin film transistor and method for forming the same |
US6847064B2 (en) | 1991-06-19 | 2005-01-25 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device having a thin film transistor |
US6124155A (en) * | 1991-06-19 | 2000-09-26 | Semiconductor Energy Laboratory Co., Ltd. | Electro-optical device and thin film transistor and method for forming the same |
US6166399A (en) * | 1991-06-19 | 2000-12-26 | Semiconductor Energy Laboratory Co., Ltd. | Active matrix device including thin film transistors |
US7507991B2 (en) | 1991-06-19 | 2009-03-24 | Semiconductor Energy Laboratory Co., Ltd. | Electro-optical device and thin film transistor and method for forming the same |
US6756258B2 (en) | 1991-06-19 | 2004-06-29 | Semiconductor Energy Laboratory Co., Ltd. | Method of manufacturing a semiconductor device |
US6335213B1 (en) | 1991-06-19 | 2002-01-01 | Semiconductor Energy Laboratory Co., Ltd. | Electro-optical device and thin film transistor and method for forming the same |
US6887746B2 (en) | 1992-03-25 | 2005-05-03 | Semiconductor Energy Lab | Insulated gate field effect transistor and method for forming the same |
US6569724B2 (en) | 1992-03-25 | 2003-05-27 | Semiconductor Energy Laboratory Co., Ltd. | Insulated gate field effect transistor and method for forming the same |
JPH05275452A (ja) * | 1992-03-25 | 1993-10-22 | Semiconductor Energy Lab Co Ltd | 薄膜状絶縁ゲイト型半導体装置およびその作製方法 |
US6323069B1 (en) | 1992-03-25 | 2001-11-27 | Semiconductor Energy Laboratory Co., Ltd. | Method of manufacturing a thin film transistor using light irradiation to form impurity regions |
JPH0799317A (ja) * | 1993-08-12 | 1995-04-11 | Semiconductor Energy Lab Co Ltd | 薄膜状絶縁ゲイト型半導体装置およびその作製方法 |
US6500703B1 (en) | 1993-08-12 | 2002-12-31 | Semicondcutor Energy Laboratory Co., Ltd. | Insulated gate semiconductor device and process for fabricating the same |
US6437366B1 (en) | 1993-08-12 | 2002-08-20 | Semiconductor Energy Laboratory Co., Ltd. | Insulated gate semiconductor device and process for fabricating the same |
US6331717B1 (en) * | 1993-08-12 | 2001-12-18 | Semiconductor Energy Laboratory Co. Ltd. | Insulated gate semiconductor device and process for fabricating the same |
US7381598B2 (en) | 1993-08-12 | 2008-06-03 | Semiconductor Energy Laboratory Co., Ltd. | Insulated gate semiconductor device and process for fabricating the same |
JP2009033134A (ja) * | 2007-06-29 | 2009-02-12 | Semiconductor Energy Lab Co Ltd | 半導体装置及び半導体装置の作製方法、並びに電子機器 |
Also Published As
Publication number | Publication date |
---|---|
JPH0586074B2 (enrdf_load_stackoverflow) | 1993-12-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5818085A (en) | Body contact for a MOSFET device fabricated in an SOI layer | |
GB1582061A (en) | Field effect transistors | |
JP2707433B2 (ja) | 薄膜トランジスタの製造方法 | |
JPS6151923A (ja) | 2つのポジテイブフオトレジスト層を重ねる方法 | |
JPS63237577A (ja) | Misfet製造方法 | |
JPH05865B2 (enrdf_load_stackoverflow) | ||
US5670395A (en) | Process for self-aligned twin wells without N-well and P-well height difference | |
JPS63237576A (ja) | 半導体素子製造方法 | |
JPH08167646A (ja) | Simox基板、simox基板の製造方法及び半導体装置の製造方法 | |
JPS60258957A (ja) | Soi型半導体装置の製造方法 | |
JPH0794721A (ja) | 半導体装置及びその製造方法 | |
JPH1012850A (ja) | Soi基板およびその製造方法 | |
JP2672596B2 (ja) | 半導体装置の製造方法 | |
JPH077157A (ja) | 薄膜トランジスタの製造方法 | |
JPS63237575A (ja) | 半導体素子製造方法 | |
JPH0223668A (ja) | 半導体装置 | |
JPH0369168A (ja) | 薄膜電界効果トランジスタ | |
JP2993039B2 (ja) | 能動層積層素子 | |
EP0481379A1 (en) | Thin film transistor and manufacturing method thereof | |
JPH04348077A (ja) | 薄膜トランジスタ | |
JP3232161B2 (ja) | 半導体装置の製造方法 | |
JPH04192472A (ja) | 薄膜トランジスタの製造方法 | |
JPS6126223B2 (enrdf_load_stackoverflow) | ||
JP2600298B2 (ja) | 半導体装置の製造方法 | |
JP2556619B2 (ja) | 半導体装置の製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |