JPH0586074B2 - - Google Patents
Info
- Publication number
- JPH0586074B2 JPH0586074B2 JP62073253A JP7325387A JPH0586074B2 JP H0586074 B2 JPH0586074 B2 JP H0586074B2 JP 62073253 A JP62073253 A JP 62073253A JP 7325387 A JP7325387 A JP 7325387A JP H0586074 B2 JPH0586074 B2 JP H0586074B2
- Authority
- JP
- Japan
- Prior art keywords
- gate electrode
- insulating film
- film
- gate
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
Landscapes
- Thin Film Transistor (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62073253A JPS63237577A (ja) | 1987-03-26 | 1987-03-26 | Misfet製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62073253A JPS63237577A (ja) | 1987-03-26 | 1987-03-26 | Misfet製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63237577A JPS63237577A (ja) | 1988-10-04 |
| JPH0586074B2 true JPH0586074B2 (enrdf_load_stackoverflow) | 1993-12-09 |
Family
ID=13512825
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62073253A Granted JPS63237577A (ja) | 1987-03-26 | 1987-03-26 | Misfet製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63237577A (enrdf_load_stackoverflow) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2796175B2 (ja) * | 1990-06-05 | 1998-09-10 | 松下電器産業株式会社 | 薄膜トランジスターの製造方法 |
| JP3255942B2 (ja) | 1991-06-19 | 2002-02-12 | 株式会社半導体エネルギー研究所 | 逆スタガ薄膜トランジスタの作製方法 |
| JP3173854B2 (ja) | 1992-03-25 | 2001-06-04 | 株式会社半導体エネルギー研究所 | 薄膜状絶縁ゲイト型半導体装置の作製方法及び作成された半導体装置 |
| JP3173926B2 (ja) | 1993-08-12 | 2001-06-04 | 株式会社半導体エネルギー研究所 | 薄膜状絶縁ゲイト型半導体装置の作製方法及びその半導体装置 |
| US6331717B1 (en) | 1993-08-12 | 2001-12-18 | Semiconductor Energy Laboratory Co. Ltd. | Insulated gate semiconductor device and process for fabricating the same |
| JP5371144B2 (ja) * | 2007-06-29 | 2013-12-18 | 株式会社半導体エネルギー研究所 | 半導体装置及び半導体装置の作製方法、並びに電子機器 |
-
1987
- 1987-03-26 JP JP62073253A patent/JPS63237577A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63237577A (ja) | 1988-10-04 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |