JPS6322304B2 - - Google Patents

Info

Publication number
JPS6322304B2
JPS6322304B2 JP56082445A JP8244581A JPS6322304B2 JP S6322304 B2 JPS6322304 B2 JP S6322304B2 JP 56082445 A JP56082445 A JP 56082445A JP 8244581 A JP8244581 A JP 8244581A JP S6322304 B2 JPS6322304 B2 JP S6322304B2
Authority
JP
Japan
Prior art keywords
silicone rubber
rubber layer
parts
layer
photosensitive layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56082445A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57198465A (en
Inventor
Sadao Kobashi
Norio Kawabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP8244581A priority Critical patent/JPS57198465A/ja
Publication of JPS57198465A publication Critical patent/JPS57198465A/ja
Publication of JPS6322304B2 publication Critical patent/JPS6322304B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP8244581A 1981-06-01 1981-06-01 Manufacture of negative type lithographic plate Granted JPS57198465A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8244581A JPS57198465A (en) 1981-06-01 1981-06-01 Manufacture of negative type lithographic plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8244581A JPS57198465A (en) 1981-06-01 1981-06-01 Manufacture of negative type lithographic plate

Publications (2)

Publication Number Publication Date
JPS57198465A JPS57198465A (en) 1982-12-06
JPS6322304B2 true JPS6322304B2 (en:Method) 1988-05-11

Family

ID=13774719

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8244581A Granted JPS57198465A (en) 1981-06-01 1981-06-01 Manufacture of negative type lithographic plate

Country Status (1)

Country Link
JP (1) JPS57198465A (en:Method)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59202467A (ja) * 1983-05-02 1984-11-16 Toray Ind Inc ネガ型湿し水不要平版印刷版の刷版
JPS6078452A (ja) * 1983-10-05 1985-05-04 Toray Ind Inc 湿し水不要平版印刷原版

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54103103A (en) * 1978-01-27 1979-08-14 Toray Industries Plate making method of lithograph printing block
JPS55110249A (en) * 1979-02-19 1980-08-25 Toray Ind Inc Lithographic printing plate requiring no wetting water

Also Published As

Publication number Publication date
JPS57198465A (en) 1982-12-06

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