JPS63196064A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JPS63196064A
JPS63196064A JP2725187A JP2725187A JPS63196064A JP S63196064 A JPS63196064 A JP S63196064A JP 2725187 A JP2725187 A JP 2725187A JP 2725187 A JP2725187 A JP 2725187A JP S63196064 A JPS63196064 A JP S63196064A
Authority
JP
Japan
Prior art keywords
conductive layer
semiconductor device
film
manufacturing
impurity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2725187A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0567067B2 (enExample
Inventor
Hideki Shibata
英毅 柴田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP2725187A priority Critical patent/JPS63196064A/ja
Publication of JPS63196064A publication Critical patent/JPS63196064A/ja
Publication of JPH0567067B2 publication Critical patent/JPH0567067B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP2725187A 1987-02-10 1987-02-10 半導体装置の製造方法 Granted JPS63196064A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2725187A JPS63196064A (ja) 1987-02-10 1987-02-10 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2725187A JPS63196064A (ja) 1987-02-10 1987-02-10 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS63196064A true JPS63196064A (ja) 1988-08-15
JPH0567067B2 JPH0567067B2 (enExample) 1993-09-24

Family

ID=12215857

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2725187A Granted JPS63196064A (ja) 1987-02-10 1987-02-10 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS63196064A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5401673A (en) * 1992-09-02 1995-03-28 Fujitsu Limited Process for the formation of contact holes in semiconductor integrated circuit

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5401673A (en) * 1992-09-02 1995-03-28 Fujitsu Limited Process for the formation of contact holes in semiconductor integrated circuit

Also Published As

Publication number Publication date
JPH0567067B2 (enExample) 1993-09-24

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