JPS6314341B2 - - Google Patents

Info

Publication number
JPS6314341B2
JPS6314341B2 JP9590180A JP9590180A JPS6314341B2 JP S6314341 B2 JPS6314341 B2 JP S6314341B2 JP 9590180 A JP9590180 A JP 9590180A JP 9590180 A JP9590180 A JP 9590180A JP S6314341 B2 JPS6314341 B2 JP S6314341B2
Authority
JP
Japan
Prior art keywords
butyl
substituent containing
isocyanuric acid
bond
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP9590180A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5720733A (en
Inventor
Yoshuki Harita
Seiji Fukuhara
Yoichi Kamoshita
Toko Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP9590180A priority Critical patent/JPS5720733A/ja
Publication of JPS5720733A publication Critical patent/JPS5720733A/ja
Publication of JPS6314341B2 publication Critical patent/JPS6314341B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
JP9590180A 1980-07-14 1980-07-14 Photoresist composition Granted JPS5720733A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9590180A JPS5720733A (en) 1980-07-14 1980-07-14 Photoresist composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9590180A JPS5720733A (en) 1980-07-14 1980-07-14 Photoresist composition

Publications (2)

Publication Number Publication Date
JPS5720733A JPS5720733A (en) 1982-02-03
JPS6314341B2 true JPS6314341B2 (https=) 1988-03-30

Family

ID=14150193

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9590180A Granted JPS5720733A (en) 1980-07-14 1980-07-14 Photoresist composition

Country Status (1)

Country Link
JP (1) JPS5720733A (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3843995B2 (ja) * 2002-05-27 2006-11-08 日本ゼオン株式会社 感放射線性樹脂組成物、パターン状樹脂膜を有する基板の製造方法、及び該樹脂組成物の利用
JP4912213B2 (ja) * 2007-05-09 2012-04-11 三菱電機株式会社 加熱調理器
EP2810981A4 (en) 2012-02-03 2016-01-20 Sumitomo Riko Co Ltd MODIFIED POLYMER, PROCESS FOR PRODUCING THE SAME, AND SURFACE TREATING LIQUID

Also Published As

Publication number Publication date
JPS5720733A (en) 1982-02-03

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