JPS5720733A - Photoresist composition - Google Patents

Photoresist composition

Info

Publication number
JPS5720733A
JPS5720733A JP9590180A JP9590180A JPS5720733A JP S5720733 A JPS5720733 A JP S5720733A JP 9590180 A JP9590180 A JP 9590180A JP 9590180 A JP9590180 A JP 9590180A JP S5720733 A JPS5720733 A JP S5720733A
Authority
JP
Japan
Prior art keywords
contg
substituent
photoresist composition
photocross
10pts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9590180A
Other languages
Japanese (ja)
Other versions
JPS6314341B2 (en
Inventor
Yoshiyuki Harita
Seiji Fukuhara
Yoichi Kamoshita
Toko Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP9590180A priority Critical patent/JPS5720733A/en
Publication of JPS5720733A publication Critical patent/JPS5720733A/en
Publication of JPS6314341B2 publication Critical patent/JPS6314341B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)

Abstract

PURPOSE:To obtain a photoresist composition with superior heat stability for minute working by blending a cyclized diene polymer and a photocross-linking agent or a photosensitizer with a specified isocyanuric acid deriv. CONSTITUTION:To 100pts.wt. cyclized diene polymer having 5-95% degree of cyclization is added 0.1-10pts.wt. compound represented by the formula (where each of R1-R3 is alkyl, alkenyl, aralkyl, aryl a substituent contg. an ether bond, a substituent contg. a thioether bond, a substituent contg. an amino bond or a substituent contg. a phenolic hydroxyl group and one or more among R1-R3 are substituents each contg. a phenolic hydroxyl group), and they are dissolved in xylene or the like together with 0.5-10pts.wt. photocross-linking agent or photosensitizer to obtain a photoresist composition. The composition is applied to a wafer or the like, dried at 80 deg.C, exposed, and developed to obtain a resist pattern with high resolution and high corrosion resistance.
JP9590180A 1980-07-14 1980-07-14 Photoresist composition Granted JPS5720733A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9590180A JPS5720733A (en) 1980-07-14 1980-07-14 Photoresist composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9590180A JPS5720733A (en) 1980-07-14 1980-07-14 Photoresist composition

Publications (2)

Publication Number Publication Date
JPS5720733A true JPS5720733A (en) 1982-02-03
JPS6314341B2 JPS6314341B2 (en) 1988-03-30

Family

ID=14150193

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9590180A Granted JPS5720733A (en) 1980-07-14 1980-07-14 Photoresist composition

Country Status (1)

Country Link
JP (1) JPS5720733A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003100524A1 (en) * 2002-05-27 2003-12-04 Zeon Corporation Radiation-sensitive resin composition, process for producing substrate having patterned resin film, and use of the resin composition
JP2008281250A (en) * 2007-05-09 2008-11-20 Mitsubishi Electric Corp Heating cooker
WO2013114664A1 (en) * 2012-02-03 2013-08-08 東海ゴム工業株式会社 Modified polymer, method for producing same, and surface treatment liquid

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003100524A1 (en) * 2002-05-27 2003-12-04 Zeon Corporation Radiation-sensitive resin composition, process for producing substrate having patterned resin film, and use of the resin composition
JP2008281250A (en) * 2007-05-09 2008-11-20 Mitsubishi Electric Corp Heating cooker
WO2013114664A1 (en) * 2012-02-03 2013-08-08 東海ゴム工業株式会社 Modified polymer, method for producing same, and surface treatment liquid
US9617361B2 (en) 2012-02-03 2017-04-11 Sumitomo Riko Company Limited Conductive member for electrophotographic image forming apparatus

Also Published As

Publication number Publication date
JPS6314341B2 (en) 1988-03-30

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