JP2023502762A5 - - Google Patents

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Publication number
JP2023502762A5
JP2023502762A5 JP2022529916A JP2022529916A JP2023502762A5 JP 2023502762 A5 JP2023502762 A5 JP 2023502762A5 JP 2022529916 A JP2022529916 A JP 2022529916A JP 2022529916 A JP2022529916 A JP 2022529916A JP 2023502762 A5 JP2023502762 A5 JP 2023502762A5
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JP
Japan
Prior art keywords
composition according
moiety
novolac
compound
polymer
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JP2022529916A
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English (en)
Japanese (ja)
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JP2023502762A (ja
JP7637137B2 (ja
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Priority claimed from PCT/EP2020/083048 external-priority patent/WO2021105054A1/en
Publication of JP2023502762A publication Critical patent/JP2023502762A/ja
Publication of JP2023502762A5 publication Critical patent/JP2023502762A5/ja
Application granted granted Critical
Publication of JP7637137B2 publication Critical patent/JP7637137B2/ja
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JP2022529916A 2019-11-25 2020-11-23 化学増幅型フォトレジスト Active JP7637137B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201962939741P 2019-11-25 2019-11-25
US62/939,741 2019-11-25
PCT/EP2020/083048 WO2021105054A1 (en) 2019-11-25 2020-11-23 Chemically amplified photoresist

Publications (3)

Publication Number Publication Date
JP2023502762A JP2023502762A (ja) 2023-01-25
JP2023502762A5 true JP2023502762A5 (https=) 2023-11-10
JP7637137B2 JP7637137B2 (ja) 2025-02-27

Family

ID=73544198

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022529916A Active JP7637137B2 (ja) 2019-11-25 2020-11-23 化学増幅型フォトレジスト

Country Status (7)

Country Link
US (1) US20220365432A1 (https=)
EP (1) EP4066059B1 (https=)
JP (1) JP7637137B2 (https=)
KR (1) KR102865544B1 (https=)
CN (1) CN114730130B (https=)
TW (1) TWI862739B (https=)
WO (1) WO2021105054A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7645089B2 (ja) * 2020-02-21 2025-03-13 住友化学株式会社 レジスト組成物及びレジストパターンの製造方法並びにめっき造形物の製造方法
CN118284852A (zh) * 2021-11-17 2024-07-02 默克专利股份有限公司 通过湿式化学蚀刻以改善金属结构制造的组合物和方法
CN114153123B (zh) * 2021-12-10 2023-09-19 中国科学院光电技术研究所 光刻胶组合物及其应用

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3817012A1 (de) 1988-05-19 1989-11-30 Basf Ag Positiv und negativ arbeitende strahlungsempfindliche gemische sowie verfahren zur herstellung von reliefmustern
JPH11237737A (ja) * 1997-12-19 1999-08-31 Kansai Shingijutsu Kenkyusho:Kk 感光性樹脂組成物およびその製造方法
EP1126321A1 (en) * 2000-02-10 2001-08-22 Shipley Company LLC Positive photoresists containing crosslinked polymers
JP2001337456A (ja) * 2000-05-25 2001-12-07 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト組成物
JP3738420B2 (ja) * 2001-11-16 2006-01-25 東京応化工業株式会社 ポジ型ホトレジスト組成物および傾斜インプランテーションプロセス用薄膜レジストパターンの形成方法
US6911293B2 (en) * 2002-04-11 2005-06-28 Clariant Finance (Bvi) Limited Photoresist compositions comprising acetals and ketals as solvents
KR100813458B1 (ko) * 2003-05-20 2008-03-13 도오꾜오까고오교 가부시끼가이샤 화학증폭형 포지티브형 포토레지스트 조성물 및 레지스트패턴형성방법
US7255970B2 (en) * 2005-07-12 2007-08-14 Az Electronic Materials Usa Corp. Photoresist composition for imaging thick films
JP4862707B2 (ja) 2006-03-17 2012-01-25 住友化学株式会社 化学増幅型ポジ型レジスト組成物
US8715918B2 (en) * 2007-09-25 2014-05-06 Az Electronic Materials Usa Corp. Thick film resists
US20130108956A1 (en) * 2011-11-01 2013-05-02 Az Electronic Materials Usa Corp. Nanocomposite positive photosensitive composition and use thereof
JP6255717B2 (ja) * 2012-06-08 2018-01-10 住友化学株式会社 レジスト組成物及びレジストパターンの製造方法
JP6100500B2 (ja) * 2012-10-26 2017-03-22 富士フイルム株式会社 感光性転写材料、パターン形成方法およびエッチング方法
US9946157B2 (en) * 2015-03-31 2018-04-17 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
CN109844641B (zh) * 2016-08-09 2022-10-11 默克专利有限公司 环境稳定的厚膜的化学放大抗蚀剂
JP6397948B2 (ja) * 2017-03-01 2018-09-26 富士フイルム株式会社 感光性転写材料、パターン形成方法およびエッチング方法
US20230111506A1 (en) * 2020-03-10 2023-04-13 Mitsui Chemicals, Inc. Polymerizable composition for optical material, polymerizable prepolymer composition for optical material, cured product, and method for producing optical material

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