JPH054421B2 - - Google Patents

Info

Publication number
JPH054421B2
JPH054421B2 JP56169178A JP16917881A JPH054421B2 JP H054421 B2 JPH054421 B2 JP H054421B2 JP 56169178 A JP56169178 A JP 56169178A JP 16917881 A JP16917881 A JP 16917881A JP H054421 B2 JPH054421 B2 JP H054421B2
Authority
JP
Japan
Prior art keywords
mol
silicone resin
resin composition
polysilsesquioxane
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56169178A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5869217A (ja
Inventor
Ikuo Nozue
Nagahiko Tomomitsu
Yoshitsugu Isamoto
Yoshio Matsumura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP56169178A priority Critical patent/JPS5869217A/ja
Priority to DE8282305223T priority patent/DE3278567D1/de
Priority to EP82305223A priority patent/EP0076656B1/en
Publication of JPS5869217A publication Critical patent/JPS5869217A/ja
Priority to US06/779,617 priority patent/US4626556A/en
Publication of JPH054421B2 publication Critical patent/JPH054421B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Local Oxidation Of Silicon (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Formation Of Insulating Films (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP56169178A 1981-10-03 1981-10-22 感光性シリコ−ン樹脂組成物 Granted JPS5869217A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP56169178A JPS5869217A (ja) 1981-10-22 1981-10-22 感光性シリコ−ン樹脂組成物
DE8282305223T DE3278567D1 (en) 1981-10-03 1982-09-30 Solvent-soluble organopolysilsesquioxanes, processes for producing the same, and compositions and semiconductor devices using the same
EP82305223A EP0076656B1 (en) 1981-10-03 1982-09-30 Solvent-soluble organopolysilsesquioxanes, processes for producing the same, and compositions and semiconductor devices using the same
US06/779,617 US4626556A (en) 1981-10-03 1985-09-25 Solvent-soluble organopolysilsesquioxane, process for producing the same, and semi-conductor using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56169178A JPS5869217A (ja) 1981-10-22 1981-10-22 感光性シリコ−ン樹脂組成物

Publications (2)

Publication Number Publication Date
JPS5869217A JPS5869217A (ja) 1983-04-25
JPH054421B2 true JPH054421B2 (https=) 1993-01-20

Family

ID=15881686

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56169178A Granted JPS5869217A (ja) 1981-10-03 1981-10-22 感光性シリコ−ン樹脂組成物

Country Status (1)

Country Link
JP (1) JPS5869217A (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4568566A (en) * 1984-10-30 1986-02-04 General Electric Company Acrylic-functional silicone resin compositions
JPS61279852A (ja) * 1985-06-05 1986-12-10 Mitsubishi Electric Corp 感光性耐熱材料
AU2258302A (en) 2000-12-11 2002-06-24 Jsr Corp Radiation-sensitive composition changing in refractive index and method of changing refractive index
JP2003043682A (ja) 2001-08-01 2003-02-13 Jsr Corp 感放射線性誘電率変化性組成物、誘電率変化法
JP2003185820A (ja) 2001-12-21 2003-07-03 Jsr Corp 感放射線性屈折率変化性組成物および屈折率変化法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4953410A (https=) * 1972-09-22 1974-05-24
JPS5158418A (ja) * 1974-11-20 1976-05-21 Toray Industries Setsukokokatai
JPS5917741B2 (ja) * 1976-12-29 1984-04-23 東レ株式会社 オルガノポリシロキサンの水性膠質液およびその製造法
JPS5417015A (en) * 1977-07-06 1979-02-08 Nec Corp Radiation sensitive composite
JPS6038693B2 (ja) * 1977-11-15 1985-09-02 東芝シリコ−ン株式会社 アジド基含有ポリオルガノシロキサン組成物
US4201808A (en) * 1978-06-12 1980-05-06 Union Carbide Corporation Radiation curable silicone release compositions
JPS55120619A (en) * 1979-03-12 1980-09-17 Shin Etsu Chem Co Ltd Photosetting organopolysiloxane composition
JPS55112262A (en) * 1979-02-23 1980-08-29 Shin Etsu Chem Co Ltd Photosetting organopolysiloxane compostion
JPS5643352A (en) * 1979-09-17 1981-04-22 Shin Etsu Chem Co Ltd Photocurable organopolysiloxane composition
JPS578248A (en) * 1980-06-19 1982-01-16 Toray Ind Inc Production of photosensitive resin
JPS6049647B2 (ja) * 1981-09-18 1985-11-02 株式会社日立製作所 光又は放射線硬化性ポリオルガノシロキサン組成物
JPS5893240A (ja) * 1981-11-30 1983-06-02 Japan Synthetic Rubber Co Ltd 半導体装置及びその製造方法

Also Published As

Publication number Publication date
JPS5869217A (ja) 1983-04-25

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