JPS5869217A - 感光性シリコ−ン樹脂組成物 - Google Patents

感光性シリコ−ン樹脂組成物

Info

Publication number
JPS5869217A
JPS5869217A JP56169178A JP16917881A JPS5869217A JP S5869217 A JPS5869217 A JP S5869217A JP 56169178 A JP56169178 A JP 56169178A JP 16917881 A JP16917881 A JP 16917881A JP S5869217 A JPS5869217 A JP S5869217A
Authority
JP
Japan
Prior art keywords
silicone resin
resin composition
group
photosensitive
mol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56169178A
Other languages
English (en)
Japanese (ja)
Other versions
JPH054421B2 (https=
Inventor
Ikuo Nozue
野末　幾男
Nagahiko Tomomitsu
友光　長彦
Yoshitsugu Isamoto
勇元　喜次
Yoshio Matsumura
松村　喜雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
JSR Corp
Original Assignee
Nippon Synthetic Chemical Industry Co Ltd
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Synthetic Chemical Industry Co Ltd, Japan Synthetic Rubber Co Ltd filed Critical Nippon Synthetic Chemical Industry Co Ltd
Priority to JP56169178A priority Critical patent/JPS5869217A/ja
Priority to DE8282305223T priority patent/DE3278567D1/de
Priority to EP82305223A priority patent/EP0076656B1/en
Publication of JPS5869217A publication Critical patent/JPS5869217A/ja
Priority to US06/779,617 priority patent/US4626556A/en
Publication of JPH054421B2 publication Critical patent/JPH054421B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Local Oxidation Of Silicon (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Formation Of Insulating Films (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP56169178A 1981-10-03 1981-10-22 感光性シリコ−ン樹脂組成物 Granted JPS5869217A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP56169178A JPS5869217A (ja) 1981-10-22 1981-10-22 感光性シリコ−ン樹脂組成物
DE8282305223T DE3278567D1 (en) 1981-10-03 1982-09-30 Solvent-soluble organopolysilsesquioxanes, processes for producing the same, and compositions and semiconductor devices using the same
EP82305223A EP0076656B1 (en) 1981-10-03 1982-09-30 Solvent-soluble organopolysilsesquioxanes, processes for producing the same, and compositions and semiconductor devices using the same
US06/779,617 US4626556A (en) 1981-10-03 1985-09-25 Solvent-soluble organopolysilsesquioxane, process for producing the same, and semi-conductor using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56169178A JPS5869217A (ja) 1981-10-22 1981-10-22 感光性シリコ−ン樹脂組成物

Publications (2)

Publication Number Publication Date
JPS5869217A true JPS5869217A (ja) 1983-04-25
JPH054421B2 JPH054421B2 (https=) 1993-01-20

Family

ID=15881686

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56169178A Granted JPS5869217A (ja) 1981-10-03 1981-10-22 感光性シリコ−ン樹脂組成物

Country Status (1)

Country Link
JP (1) JPS5869217A (https=)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61111330A (ja) * 1984-10-30 1986-05-29 ゼネラル・エレクトリツク・カンパニイ アクリル官能性シリコーン樹脂組成物
JPS61279852A (ja) * 1985-06-05 1986-12-10 Mitsubishi Electric Corp 感光性耐熱材料
US6787289B2 (en) 2001-12-21 2004-09-07 Jsr Corporation Radiation sensitive refractive index changing composition and refractive index changing method
US7108954B2 (en) 2000-12-11 2006-09-19 Jsr Corporation Radiation-sensitive composition changing in refractive index and method of changing refractive index
US7205085B2 (en) 2001-08-01 2007-04-17 Jsr Corporation Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern

Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4953410A (https=) * 1972-09-22 1974-05-24
JPS5158418A (ja) * 1974-11-20 1976-05-21 Toray Industries Setsukokokatai
JPS5386897A (en) * 1976-12-29 1978-07-31 Toray Industries Water repellent fiber or structure and production of glue solution used in production of said articles
JPS5417015A (en) * 1977-07-06 1979-02-08 Nec Corp Radiation sensitive composite
JPS5469197A (en) * 1977-11-15 1979-06-02 Toshiba Silicone Polyorganosiloxane composition containing azide group
JPS54162787A (en) * 1978-06-12 1979-12-24 Union Carbide Corp Radiationncurable silicone release composition
JPS55112262A (en) * 1979-02-23 1980-08-29 Shin Etsu Chem Co Ltd Photosetting organopolysiloxane compostion
JPS55120619A (en) * 1979-03-12 1980-09-17 Shin Etsu Chem Co Ltd Photosetting organopolysiloxane composition
JPS5643352A (en) * 1979-09-17 1981-04-22 Shin Etsu Chem Co Ltd Photocurable organopolysiloxane composition
JPS578248A (en) * 1980-06-19 1982-01-16 Toray Ind Inc Production of photosensitive resin
JPS5849717A (ja) * 1981-09-18 1983-03-24 Hitachi Ltd 光又は放射線硬化性ポリオルガノシロキサン組成物
JPS5893240A (ja) * 1981-11-30 1983-06-02 Japan Synthetic Rubber Co Ltd 半導体装置及びその製造方法

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4953410A (https=) * 1972-09-22 1974-05-24
JPS5158418A (ja) * 1974-11-20 1976-05-21 Toray Industries Setsukokokatai
JPS5386897A (en) * 1976-12-29 1978-07-31 Toray Industries Water repellent fiber or structure and production of glue solution used in production of said articles
JPS5417015A (en) * 1977-07-06 1979-02-08 Nec Corp Radiation sensitive composite
JPS5469197A (en) * 1977-11-15 1979-06-02 Toshiba Silicone Polyorganosiloxane composition containing azide group
JPS54162787A (en) * 1978-06-12 1979-12-24 Union Carbide Corp Radiationncurable silicone release composition
JPS55112262A (en) * 1979-02-23 1980-08-29 Shin Etsu Chem Co Ltd Photosetting organopolysiloxane compostion
JPS55120619A (en) * 1979-03-12 1980-09-17 Shin Etsu Chem Co Ltd Photosetting organopolysiloxane composition
JPS5643352A (en) * 1979-09-17 1981-04-22 Shin Etsu Chem Co Ltd Photocurable organopolysiloxane composition
JPS578248A (en) * 1980-06-19 1982-01-16 Toray Ind Inc Production of photosensitive resin
JPS5849717A (ja) * 1981-09-18 1983-03-24 Hitachi Ltd 光又は放射線硬化性ポリオルガノシロキサン組成物
JPS5893240A (ja) * 1981-11-30 1983-06-02 Japan Synthetic Rubber Co Ltd 半導体装置及びその製造方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61111330A (ja) * 1984-10-30 1986-05-29 ゼネラル・エレクトリツク・カンパニイ アクリル官能性シリコーン樹脂組成物
JPS61279852A (ja) * 1985-06-05 1986-12-10 Mitsubishi Electric Corp 感光性耐熱材料
US7108954B2 (en) 2000-12-11 2006-09-19 Jsr Corporation Radiation-sensitive composition changing in refractive index and method of changing refractive index
US7205085B2 (en) 2001-08-01 2007-04-17 Jsr Corporation Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern
US6787289B2 (en) 2001-12-21 2004-09-07 Jsr Corporation Radiation sensitive refractive index changing composition and refractive index changing method

Also Published As

Publication number Publication date
JPH054421B2 (https=) 1993-01-20

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