JPS5720733A - Photoresist composition - Google Patents
Photoresist compositionInfo
- Publication number
- JPS5720733A JPS5720733A JP9590180A JP9590180A JPS5720733A JP S5720733 A JPS5720733 A JP S5720733A JP 9590180 A JP9590180 A JP 9590180A JP 9590180 A JP9590180 A JP 9590180A JP S5720733 A JPS5720733 A JP S5720733A
- Authority
- JP
- Japan
- Prior art keywords
- contg
- substituent
- photoresist composition
- photocross
- 10pts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920002120 photoresistant polymer Polymers 0.000 title abstract 3
- 125000001424 substituent group Chemical group 0.000 abstract 5
- 239000003795 chemical substances by application Substances 0.000 abstract 2
- 150000001993 dienes Chemical class 0.000 abstract 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract 2
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 abstract 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 abstract 2
- 239000003504 photosensitizing agent Substances 0.000 abstract 2
- 229920000642 polymer Polymers 0.000 abstract 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 abstract 1
- 125000003342 alkenyl group Chemical group 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 125000003710 aryl alkyl group Chemical group 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 230000007797 corrosion Effects 0.000 abstract 1
- 238000005260 corrosion Methods 0.000 abstract 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 abstract 1
- 238000002156 mixing Methods 0.000 abstract 1
- 238000007363 ring formation reaction Methods 0.000 abstract 1
- 239000008096 xylene Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9590180A JPS5720733A (en) | 1980-07-14 | 1980-07-14 | Photoresist composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9590180A JPS5720733A (en) | 1980-07-14 | 1980-07-14 | Photoresist composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5720733A true JPS5720733A (en) | 1982-02-03 |
| JPS6314341B2 JPS6314341B2 (https=) | 1988-03-30 |
Family
ID=14150193
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9590180A Granted JPS5720733A (en) | 1980-07-14 | 1980-07-14 | Photoresist composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5720733A (https=) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003100524A1 (fr) * | 2002-05-27 | 2003-12-04 | Zeon Corporation | Composition de resine sensible au rayonnement, procede de production d'un substrat comprenant couche de resine a motifs, et utilisation de la composition de resine |
| JP2008281250A (ja) * | 2007-05-09 | 2008-11-20 | Mitsubishi Electric Corp | 加熱調理器 |
| WO2013114664A1 (ja) * | 2012-02-03 | 2013-08-08 | 東海ゴム工業株式会社 | 改質ポリマー体およびその製造方法ならびに表面処理液 |
-
1980
- 1980-07-14 JP JP9590180A patent/JPS5720733A/ja active Granted
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003100524A1 (fr) * | 2002-05-27 | 2003-12-04 | Zeon Corporation | Composition de resine sensible au rayonnement, procede de production d'un substrat comprenant couche de resine a motifs, et utilisation de la composition de resine |
| JP2008281250A (ja) * | 2007-05-09 | 2008-11-20 | Mitsubishi Electric Corp | 加熱調理器 |
| WO2013114664A1 (ja) * | 2012-02-03 | 2013-08-08 | 東海ゴム工業株式会社 | 改質ポリマー体およびその製造方法ならびに表面処理液 |
| US9617361B2 (en) | 2012-02-03 | 2017-04-11 | Sumitomo Riko Company Limited | Conductive member for electrophotographic image forming apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6314341B2 (https=) | 1988-03-30 |
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