JPS6314339B2 - - Google Patents

Info

Publication number
JPS6314339B2
JPS6314339B2 JP5807780A JP5807780A JPS6314339B2 JP S6314339 B2 JPS6314339 B2 JP S6314339B2 JP 5807780 A JP5807780 A JP 5807780A JP 5807780 A JP5807780 A JP 5807780A JP S6314339 B2 JPS6314339 B2 JP S6314339B2
Authority
JP
Japan
Prior art keywords
polyamide
photosensitive
parts
modified
reaction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP5807780A
Other languages
English (en)
Japanese (ja)
Other versions
JPS56154731A (en
Inventor
Masaharu Taniguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP5807780A priority Critical patent/JPS56154731A/ja
Publication of JPS56154731A publication Critical patent/JPS56154731A/ja
Publication of JPS6314339B2 publication Critical patent/JPS6314339B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polyamides (AREA)
  • Polymerisation Methods In General (AREA)
JP5807780A 1980-05-01 1980-05-01 Phtosensitive polyamide resin composition Granted JPS56154731A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5807780A JPS56154731A (en) 1980-05-01 1980-05-01 Phtosensitive polyamide resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5807780A JPS56154731A (en) 1980-05-01 1980-05-01 Phtosensitive polyamide resin composition

Publications (2)

Publication Number Publication Date
JPS56154731A JPS56154731A (en) 1981-11-30
JPS6314339B2 true JPS6314339B2 (enrdf_load_stackoverflow) 1988-03-30

Family

ID=13073846

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5807780A Granted JPS56154731A (en) 1980-05-01 1980-05-01 Phtosensitive polyamide resin composition

Country Status (1)

Country Link
JP (1) JPS56154731A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS56154731A (en) 1981-11-30

Similar Documents

Publication Publication Date Title
EP0085472B1 (en) Photosensitive polymer composition
JPS6122048A (ja) 重合可能な化合物、その製法、およびこれを含有する放射線感性複写層
JPS6338361B2 (enrdf_load_stackoverflow)
EP0036301B1 (en) Photosensitive polyamide resin composition
JPH01245245A (ja) 凸版印刷版用感光性樹脂組成物
EP0273113A2 (en) Photosensitive polymer composition and master printing plate
US4188221A (en) Photosensitive polyamide resin composition useful for making relief printing plate
JPS6314339B2 (enrdf_load_stackoverflow)
JPH06313966A (ja) 感光性樹脂積層体
EP0020782A1 (en) Light-sensitive polyamide resin composition
JPS63278053A (ja) フレキソ印刷版用感光性樹脂組成物およびフレキソ印刷版材
JPS6412378B2 (enrdf_load_stackoverflow)
JPH01131548A (ja) 感光性樹脂組成物および印刷版材
JPH02125262A (ja) 感光性樹脂組成物
JP2001092132A (ja) 感光性樹脂組成物
JPH0197949A (ja) 感光性樹脂組成物
JPS63287845A (ja) 感光性樹脂組成物および印刷版材
JP5028865B2 (ja) 感光性樹脂凸版組成物およびそれからなる感光性樹脂凸版材
JPS6012622B2 (ja) ポリアミド系感光性樹脂印刷版用組成物
JPS6163837A (ja) 感光性樹脂組成物
WO2024070139A1 (ja) 凸版印刷原版用感光性樹脂組成物、凸版印刷原版、及び印刷版
JPS6348328B2 (enrdf_load_stackoverflow)
JPH05303201A (ja) 感光性樹脂組成物
JPH0363736B2 (enrdf_load_stackoverflow)
JPH06317903A (ja) 感光性樹脂組成物