JPS56154731A - Phtosensitive polyamide resin composition - Google Patents

Phtosensitive polyamide resin composition

Info

Publication number
JPS56154731A
JPS56154731A JP5807780A JP5807780A JPS56154731A JP S56154731 A JPS56154731 A JP S56154731A JP 5807780 A JP5807780 A JP 5807780A JP 5807780 A JP5807780 A JP 5807780A JP S56154731 A JPS56154731 A JP S56154731A
Authority
JP
Japan
Prior art keywords
soln
polyamide
incurls
photopolymn
haloalkyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5807780A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6314339B2 (enrdf_load_stackoverflow
Inventor
Masaharu Taniguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP5807780A priority Critical patent/JPS56154731A/ja
Publication of JPS56154731A publication Critical patent/JPS56154731A/ja
Publication of JPS6314339B2 publication Critical patent/JPS6314339B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polyamides (AREA)
  • Polymerisation Methods In General (AREA)
JP5807780A 1980-05-01 1980-05-01 Phtosensitive polyamide resin composition Granted JPS56154731A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5807780A JPS56154731A (en) 1980-05-01 1980-05-01 Phtosensitive polyamide resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5807780A JPS56154731A (en) 1980-05-01 1980-05-01 Phtosensitive polyamide resin composition

Publications (2)

Publication Number Publication Date
JPS56154731A true JPS56154731A (en) 1981-11-30
JPS6314339B2 JPS6314339B2 (enrdf_load_stackoverflow) 1988-03-30

Family

ID=13073846

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5807780A Granted JPS56154731A (en) 1980-05-01 1980-05-01 Phtosensitive polyamide resin composition

Country Status (1)

Country Link
JP (1) JPS56154731A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS6314339B2 (enrdf_load_stackoverflow) 1988-03-30

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