FR2450473A1 - Compositions photosensibles et systemes impressionnables comprenant de telles compositions - Google Patents

Compositions photosensibles et systemes impressionnables comprenant de telles compositions

Info

Publication number
FR2450473A1
FR2450473A1 FR8004164A FR8004164A FR2450473A1 FR 2450473 A1 FR2450473 A1 FR 2450473A1 FR 8004164 A FR8004164 A FR 8004164A FR 8004164 A FR8004164 A FR 8004164A FR 2450473 A1 FR2450473 A1 FR 2450473A1
Authority
FR
France
Prior art keywords
compositions
weight
organic solvents
photosensitive
systems
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR8004164A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Publication of FR2450473A1 publication Critical patent/FR2450473A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Graft Or Block Polymers (AREA)
  • Materials For Photolithography (AREA)

Abstract

L'INVENTION EST RELATIVE A DES COMPOSITIONS PHOTOSENSIBLES ET A DES SYSTEMES IMPRESSIONNABLES EN COMPORTANT. CES COMPOSITIONS CONSISTENT EN UN MELANGE HOMOGENE DE 1 A 75 EN POIDS D'UNE RESINE FILMOGENE SOLUBLE DANS LES SOLVANTS ORGANIQUES, DE 10 A 65 EN POIDS DE COMPOSES POLYETHYLENIQUEMENT INSATURES, POUVANT SUBIR UNE POLYMERISATION RADICALAIRE, DE 0,5 A 15 EN POIDS D'UN SYSTEME PHOTO-INITIATEUR GENERATEUR DE RADICAUX LIBRES, DE 5 A 40 EN POIDS D'UN POLYMERE RAMOLLISSABLE DANS L'EAU ET SOLUBLE DANS LES SOLVANTS ORGANIQUES, ET DE 1 A 20 EN POIDS D'UNE RESINE DIAZOIQUE SOLUBLE DANS LES SOLVANTS ORGANIQUES. UTILISATION COMME COMPOSITIONS POUR PLAQUES D'IMPRESSION REELLEMENT DEVELOPPABLES DANS L'EAU.
FR8004164A 1979-02-27 1980-02-26 Compositions photosensibles et systemes impressionnables comprenant de telles compositions Withdrawn FR2450473A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US1558479A 1979-02-27 1979-02-27

Publications (1)

Publication Number Publication Date
FR2450473A1 true FR2450473A1 (fr) 1980-09-26

Family

ID=21772291

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8004164A Withdrawn FR2450473A1 (fr) 1979-02-27 1980-02-26 Compositions photosensibles et systemes impressionnables comprenant de telles compositions

Country Status (10)

Country Link
JP (1) JPS55120028A (fr)
BE (1) BE881956A (fr)
BR (1) BR8001128A (fr)
CA (1) CA1144804A (fr)
DE (1) DE3007212A1 (fr)
ES (1) ES8103397A1 (fr)
FR (1) FR2450473A1 (fr)
GB (1) GB2044788B (fr)
NL (1) NL8001085A (fr)
ZA (1) ZA801085B (fr)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0104863A2 (fr) * 1982-09-21 1984-04-04 Fuji Photo Film Co., Ltd. Plaque d'impression lithographique photosensible
EP0167963A2 (fr) * 1984-07-10 1986-01-15 Hoechst Aktiengesellschaft Composition photosensible et matériau photosensible pour l'enregistrement préparé avec cette composition
EP0184725A2 (fr) * 1984-12-06 1986-06-18 Hoechst Celanese Corporation Composition photosensible
EP0272550A2 (fr) * 1986-12-23 1988-06-29 Hoechst Aktiengesellschaft Matériau pour l'enregistrement avec couche photosensible intermédiaire
EP0365357A2 (fr) * 1988-10-21 1990-04-25 Hoechst Celanese Corporation Film d'épreuve en couleurs photopolymérisable nigatif sans extinction de l'état triplet de l'oxygène

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57141640A (en) * 1981-02-03 1982-09-02 Konishiroku Photo Ind Co Ltd Photosensitive image forming material
JPS57197537A (en) * 1981-05-29 1982-12-03 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS582847A (ja) * 1981-06-30 1983-01-08 Konishiroku Photo Ind Co Ltd 平版印刷版
JPS58199341A (ja) * 1982-05-17 1983-11-19 Tokyo Ohka Kogyo Co Ltd 耐熱性感光性樹脂組成物
JPS59101644A (ja) * 1982-12-01 1984-06-12 Fuji Photo Film Co Ltd 感光性組成物
US4600679A (en) * 1984-05-25 1986-07-15 W. R. Grace & Co. Water-developable, negative-working, diazo lithographic printing plate with oleophilic ester overlayer
DE3504658A1 (de) * 1985-02-12 1986-08-14 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und damit hergestelltes aufzeichnungsmaterial
DE3605717A1 (de) * 1985-02-28 1986-08-28 Hoechst Celanese Corp., Somerville, N.J. Durch strahlung polymerisierbares gemisch
US4851319A (en) * 1985-02-28 1989-07-25 Hoechst Celanese Corporation Radiation polymerizable composition, photographic element, and method of making element with diazonium salt, and monofunctional and polyfunctional acrylic monomers
US5080999A (en) * 1985-06-10 1992-01-14 Fuji Photo Film Co., Ltd. Light-sensitive diazo resin composition containing a higher fatty acid or higher fatty acid amide
US4780392A (en) * 1985-08-02 1988-10-25 Hoechst Celanese Corporation Radiation-polymerizable composition and element containing a photopolymerizable acrylic monomer
US5120772A (en) * 1985-08-02 1992-06-09 Walls John E Radiation-polymerizable composition and element containing a photopolymerizable mixture
US4652604A (en) * 1985-08-02 1987-03-24 American Hoechst Corporation Radiation-polymerizable composition and element containing a photopolymer composition
US4772538A (en) * 1985-08-02 1988-09-20 American Hoechst Corporation Water developable lithographic composition
US4707437A (en) * 1985-08-02 1987-11-17 Hoechst Celanese Corporation Radiation-polymerizable composition and element containing a photopolymer composition
US4822720A (en) * 1985-08-02 1989-04-18 Hoechst Celanese Corporation Water developable screen printing composition
DE3528309A1 (de) * 1985-08-07 1987-02-12 Hoechst Ag Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial
JPS6278544A (ja) * 1985-10-01 1987-04-10 Fuji Photo Film Co Ltd 感光性組成物
JPS62238553A (ja) * 1986-04-10 1987-10-19 Nippon Foil Mfg Co Ltd 感光性樹脂組成物
US4877711A (en) * 1986-05-19 1989-10-31 Fuji Photo Film Co., Ltd. Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group
US4886731A (en) * 1987-01-05 1989-12-12 Cookson Graphics Inc. Multilayer photopolymeric printing plates with photoreactive diazo compounds and photopolymerizable compositions
JPH0727208B2 (ja) * 1987-04-20 1995-03-29 富士写真フイルム株式会社 感光性組成物
DE3738863A1 (de) * 1987-11-16 1989-05-24 Hoechst Ag Lichtempfindliche druckplatte fuer den wasserlosen offsetdruck
US5340681A (en) * 1988-01-29 1994-08-23 International Paper Company Method for preparing photographic elements having single photosensitive layer containing photopolymerizable compound, photoinitiator, diazonium compound and barrier material encapsulated pigment particles; and negative image formation process
US5286594A (en) * 1988-01-29 1994-02-15 International Paper Company Photographic elements utilizing a single photosensitive layer containing a photopolymerizable compound, photoinitiator, diazonium compound and barrier material encapsulated pigment particles
DE3903001A1 (de) * 1989-02-02 1990-08-16 Hoechst Ag Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial
JP6962216B2 (ja) * 2018-01-24 2021-11-05 日本製鉄株式会社 溶接鋼管用防錆処理液、溶接鋼管の化成処理方法、溶接鋼管および溶接鋼管の成形加工品
CN113105570B (zh) * 2021-04-12 2022-05-03 之江实验室 一种液体双光子引发剂及其制备方法与应用

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1487028A (fr) * 1966-07-13 1967-06-30 Fmc Corp Compositions photo-sensibles
FR2241091A2 (fr) * 1973-08-16 1975-03-14 Hercules Inc
US3905815A (en) * 1971-12-17 1975-09-16 Minnesota Mining & Mfg Photopolymerizable sheet material with diazo resin layer
FR2302549A1 (fr) * 1975-02-25 1976-09-24 Oce Van Der Grinten Nv Mati
US4042386A (en) * 1976-06-07 1977-08-16 Napp Systems Photosensitive compositions
FR2405500A1 (fr) * 1977-10-06 1979-05-04 Polychrome Corp Plaque d'impression lithographique possedant une double couche photosensible, et son procede de preparation

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1000315B (it) * 1972-12-14 1976-03-30 Polychrome Corp Perfezionamento nelle composizioni monomere diazoiche insature potosensibili
JPS50108003A (fr) * 1974-02-01 1975-08-26
JPS50114122A (fr) * 1974-02-16 1975-09-06
JPS549619A (en) * 1977-06-23 1979-01-24 Oji Paper Co Photosensitive composition

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1487028A (fr) * 1966-07-13 1967-06-30 Fmc Corp Compositions photo-sensibles
US3905815A (en) * 1971-12-17 1975-09-16 Minnesota Mining & Mfg Photopolymerizable sheet material with diazo resin layer
FR2241091A2 (fr) * 1973-08-16 1975-03-14 Hercules Inc
GB1482953A (en) * 1973-08-16 1977-08-17 Hercules Inc Photopolymer composition
FR2302549A1 (fr) * 1975-02-25 1976-09-24 Oce Van Der Grinten Nv Mati
US4092170A (en) * 1975-02-25 1978-05-30 Oce-Van Der Grinten N.V. Photocopying materials
US4042386A (en) * 1976-06-07 1977-08-16 Napp Systems Photosensitive compositions
FR2405500A1 (fr) * 1977-10-06 1979-05-04 Polychrome Corp Plaque d'impression lithographique possedant une double couche photosensible, et son procede de preparation

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0104863A2 (fr) * 1982-09-21 1984-04-04 Fuji Photo Film Co., Ltd. Plaque d'impression lithographique photosensible
EP0104863A3 (en) * 1982-09-21 1986-04-16 Fuji Photo Film Co., Ltd. Light-sensitive planographic printing plate
EP0167963A2 (fr) * 1984-07-10 1986-01-15 Hoechst Aktiengesellschaft Composition photosensible et matériau photosensible pour l'enregistrement préparé avec cette composition
EP0167963A3 (en) * 1984-07-10 1987-07-29 Hoechst Aktiengesellschaft Light-sensitive composition and light sensitive registration material prepared therewith
EP0184725A2 (fr) * 1984-12-06 1986-06-18 Hoechst Celanese Corporation Composition photosensible
EP0184725A3 (en) * 1984-12-06 1986-08-27 American Hoechst Corporation Light-sensitive composition
EP0272550A2 (fr) * 1986-12-23 1988-06-29 Hoechst Aktiengesellschaft Matériau pour l'enregistrement avec couche photosensible intermédiaire
EP0272550A3 (en) * 1986-12-23 1989-06-07 Hoechst Aktiengesellschaft Light-sensitive registration material with a light-sensitive intermediate layer
EP0365357A2 (fr) * 1988-10-21 1990-04-25 Hoechst Celanese Corporation Film d'épreuve en couleurs photopolymérisable nigatif sans extinction de l'état triplet de l'oxygène
EP0365357A3 (fr) * 1988-10-21 1992-01-15 Hoechst Celanese Corporation Film d'épreuve en couleurs photopolymérisable nigatif sans extinction de l'état triplet de l'oxygène

Also Published As

Publication number Publication date
ES488890A0 (es) 1981-02-16
BE881956A (fr) 1980-08-27
ES8103397A1 (es) 1981-02-16
DE3007212A1 (de) 1980-08-28
GB2044788B (en) 1983-05-25
GB2044788A (en) 1980-10-22
NL8001085A (nl) 1980-08-29
CA1144804A (fr) 1983-04-19
JPS55120028A (en) 1980-09-16
BR8001128A (pt) 1980-11-04
ZA801085B (en) 1981-07-29

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Legal Events

Date Code Title Description
ST Notification of lapse