ZA801085B - Photosensitive compositions and articles - Google Patents

Photosensitive compositions and articles

Info

Publication number
ZA801085B
ZA801085B ZA00801085A ZA801085A ZA801085B ZA 801085 B ZA801085 B ZA 801085B ZA 00801085 A ZA00801085 A ZA 00801085A ZA 801085 A ZA801085 A ZA 801085A ZA 801085 B ZA801085 B ZA 801085B
Authority
ZA
South Africa
Prior art keywords
articles
photosensitive compositions
photosensitive
compositions
Prior art date
Application number
ZA00801085A
Other languages
English (en)
Inventor
P Fuchs
Original Assignee
Minnesota Mining & Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining & Mfg filed Critical Minnesota Mining & Mfg
Publication of ZA801085B publication Critical patent/ZA801085B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Materials For Photolithography (AREA)
ZA00801085A 1979-02-27 1980-02-26 Photosensitive compositions and articles ZA801085B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US1558479A 1979-02-27 1979-02-27

Publications (1)

Publication Number Publication Date
ZA801085B true ZA801085B (en) 1981-07-29

Family

ID=21772291

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA00801085A ZA801085B (en) 1979-02-27 1980-02-26 Photosensitive compositions and articles

Country Status (10)

Country Link
JP (1) JPS55120028A (fr)
BE (1) BE881956A (fr)
BR (1) BR8001128A (fr)
CA (1) CA1144804A (fr)
DE (1) DE3007212A1 (fr)
ES (1) ES488890A0 (fr)
FR (1) FR2450473A1 (fr)
GB (1) GB2044788B (fr)
NL (1) NL8001085A (fr)
ZA (1) ZA801085B (fr)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57141640A (en) * 1981-02-03 1982-09-02 Konishiroku Photo Ind Co Ltd Photosensitive image forming material
JPS57197537A (en) * 1981-05-29 1982-12-03 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS582847A (ja) * 1981-06-30 1983-01-08 Konishiroku Photo Ind Co Ltd 平版印刷版
JPS58199341A (ja) * 1982-05-17 1983-11-19 Tokyo Ohka Kogyo Co Ltd 耐熱性感光性樹脂組成物
JPS5953836A (ja) * 1982-09-21 1984-03-28 Fuji Photo Film Co Ltd 感光性平版印刷版
JPS59101644A (ja) * 1982-12-01 1984-06-12 Fuji Photo Film Co Ltd 感光性組成物
US4600679A (en) * 1984-05-25 1986-07-15 W. R. Grace & Co. Water-developable, negative-working, diazo lithographic printing plate with oleophilic ester overlayer
DE3425328A1 (de) * 1984-07-10 1986-01-16 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial
DE3567294D1 (en) * 1984-12-06 1989-02-09 Hoechst Celanese Corp Light-sensitive composition
DE3504658A1 (de) * 1985-02-12 1986-08-14 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und damit hergestelltes aufzeichnungsmaterial
DE3605717A1 (de) * 1985-02-28 1986-08-28 Hoechst Celanese Corp., Somerville, N.J. Durch strahlung polymerisierbares gemisch
US4851319A (en) * 1985-02-28 1989-07-25 Hoechst Celanese Corporation Radiation polymerizable composition, photographic element, and method of making element with diazonium salt, and monofunctional and polyfunctional acrylic monomers
US5080999A (en) * 1985-06-10 1992-01-14 Fuji Photo Film Co., Ltd. Light-sensitive diazo resin composition containing a higher fatty acid or higher fatty acid amide
US5120772A (en) * 1985-08-02 1992-06-09 Walls John E Radiation-polymerizable composition and element containing a photopolymerizable mixture
US4772538A (en) * 1985-08-02 1988-09-20 American Hoechst Corporation Water developable lithographic composition
US4652604A (en) * 1985-08-02 1987-03-24 American Hoechst Corporation Radiation-polymerizable composition and element containing a photopolymer composition
US4780392A (en) * 1985-08-02 1988-10-25 Hoechst Celanese Corporation Radiation-polymerizable composition and element containing a photopolymerizable acrylic monomer
US4707437A (en) * 1985-08-02 1987-11-17 Hoechst Celanese Corporation Radiation-polymerizable composition and element containing a photopolymer composition
US4822720A (en) * 1985-08-02 1989-04-18 Hoechst Celanese Corporation Water developable screen printing composition
DE3528309A1 (de) * 1985-08-07 1987-02-12 Hoechst Ag Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial
JPS6278544A (ja) * 1985-10-01 1987-04-10 Fuji Photo Film Co Ltd 感光性組成物
JPS62238553A (ja) * 1986-04-10 1987-10-19 Nippon Foil Mfg Co Ltd 感光性樹脂組成物
US4877711A (en) * 1986-05-19 1989-10-31 Fuji Photo Film Co., Ltd. Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group
DE3644160A1 (de) * 1986-12-23 1988-07-14 Hoechst Ag Lichtempfindliches aufzeichnungsmaterial mit einer lichtempfindlichen zwischenschicht
US4886731A (en) * 1987-01-05 1989-12-12 Cookson Graphics Inc. Multilayer photopolymeric printing plates with photoreactive diazo compounds and photopolymerizable compositions
JPH0727208B2 (ja) * 1987-04-20 1995-03-29 富士写真フイルム株式会社 感光性組成物
DE3738863A1 (de) * 1987-11-16 1989-05-24 Hoechst Ag Lichtempfindliche druckplatte fuer den wasserlosen offsetdruck
US5286594A (en) * 1988-01-29 1994-02-15 International Paper Company Photographic elements utilizing a single photosensitive layer containing a photopolymerizable compound, photoinitiator, diazonium compound and barrier material encapsulated pigment particles
US5340681A (en) * 1988-01-29 1994-08-23 International Paper Company Method for preparing photographic elements having single photosensitive layer containing photopolymerizable compound, photoinitiator, diazonium compound and barrier material encapsulated pigment particles; and negative image formation process
CA2000712A1 (fr) * 1988-10-21 1990-04-21 Thomas Dunder Film photopolymerisable negatif de controle des couleurs ne necessitant pas un bain d'oxygene triplet
DE3903001A1 (de) * 1989-02-02 1990-08-16 Hoechst Ag Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial
JP6962216B2 (ja) * 2018-01-24 2021-11-05 日本製鉄株式会社 溶接鋼管用防錆処理液、溶接鋼管の化成処理方法、溶接鋼管および溶接鋼管の成形加工品
CN113105570B (zh) * 2021-04-12 2022-05-03 之江实验室 一种液体双光子引发剂及其制备方法与应用

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1547849A1 (de) * 1966-07-13 1969-12-11 Fmc Corp Lichtempfindliche Masse
US3905815A (en) * 1971-12-17 1975-09-16 Minnesota Mining & Mfg Photopolymerizable sheet material with diazo resin layer
IT1000315B (it) * 1972-12-14 1976-03-30 Polychrome Corp Perfezionamento nelle composizioni monomere diazoiche insature potosensibili
FI207474A (fr) * 1973-08-16 1975-02-17 Hercules Inc
JPS50108003A (fr) * 1974-02-01 1975-08-26
JPS50114122A (fr) * 1974-02-16 1975-09-06
GB1523762A (en) * 1975-02-25 1978-09-06 Oce Van Der Grinten Nv Photocopying materials
US4042386A (en) * 1976-06-07 1977-08-16 Napp Systems Photosensitive compositions
JPS549619A (en) * 1977-06-23 1979-01-24 Oji Paper Co Photosensitive composition
AU526602B2 (en) * 1977-10-06 1983-01-20 Polychrome Corp. Lithographic printing plate

Also Published As

Publication number Publication date
ES8103397A1 (es) 1981-02-16
BR8001128A (pt) 1980-11-04
FR2450473A1 (fr) 1980-09-26
NL8001085A (nl) 1980-08-29
GB2044788A (en) 1980-10-22
GB2044788B (en) 1983-05-25
JPS55120028A (en) 1980-09-16
BE881956A (fr) 1980-08-27
CA1144804A (fr) 1983-04-19
DE3007212A1 (de) 1980-08-28
ES488890A0 (es) 1981-02-16

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