JPS57197537A - Photosensitive composition - Google Patents

Photosensitive composition

Info

Publication number
JPS57197537A
JPS57197537A JP8310481A JP8310481A JPS57197537A JP S57197537 A JPS57197537 A JP S57197537A JP 8310481 A JP8310481 A JP 8310481A JP 8310481 A JP8310481 A JP 8310481A JP S57197537 A JPS57197537 A JP S57197537A
Authority
JP
Japan
Prior art keywords
polymer
nitrogen atoms
silica particles
diazo compound
coated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8310481A
Other languages
Japanese (ja)
Inventor
Akira Nogami
Yuzuru Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP8310481A priority Critical patent/JPS57197537A/en
Publication of JPS57197537A publication Critical patent/JPS57197537A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

Abstract

PURPOSE:To obtain a water developable photosensitive composition providing high water repellency to the photoset part and forming a film with high strength by adding silica particles. CONSTITUTION:A support such as an Al plate is coated with an aqueous dispersion contg. silica particles having 1-100nm particle size, a polymer having quaternized nitrogen atoms in the principal chain such as ''Ionene '' or a polymer having quaternizd nitrogen atoms in the side chain, and a photosensitive diazo compound such as a poly-condensate of p-diazodiphenylamine with formaldehyde, and the coated support is dried to form a photosensitive layer having 1-10mum thickness. Said 3 components are added in a mixing ratio enabling the hydrophilic parts to disappear by photoreacting the highly hydrophilic silica particles and polymer having nitrogen atoms belonging to quat. salt with the diazo compound.
JP8310481A 1981-05-29 1981-05-29 Photosensitive composition Pending JPS57197537A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8310481A JPS57197537A (en) 1981-05-29 1981-05-29 Photosensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8310481A JPS57197537A (en) 1981-05-29 1981-05-29 Photosensitive composition

Publications (1)

Publication Number Publication Date
JPS57197537A true JPS57197537A (en) 1982-12-03

Family

ID=13792880

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8310481A Pending JPS57197537A (en) 1981-05-29 1981-05-29 Photosensitive composition

Country Status (1)

Country Link
JP (1) JPS57197537A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01200353A (en) * 1988-02-05 1989-08-11 Japan Synthetic Rubber Co Ltd Radiation sensitive coloring resin composition
JPH0572723A (en) * 1991-09-12 1993-03-26 Fuji Photo Film Co Ltd Photosensitive composition

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51134203A (en) * 1975-05-14 1976-11-20 Mitsui Toatsu Chemicals Photoosensitive resin composition for typographic plate
JPS5465027A (en) * 1977-10-11 1979-05-25 Eastman Kodak Co Washhoff photosensitive composition and proofing element
JPS55120028A (en) * 1979-02-27 1980-09-16 Minnesota Mining & Mfg Photooreactive composition and image forming system including same

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51134203A (en) * 1975-05-14 1976-11-20 Mitsui Toatsu Chemicals Photoosensitive resin composition for typographic plate
JPS5465027A (en) * 1977-10-11 1979-05-25 Eastman Kodak Co Washhoff photosensitive composition and proofing element
JPS55120028A (en) * 1979-02-27 1980-09-16 Minnesota Mining & Mfg Photooreactive composition and image forming system including same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01200353A (en) * 1988-02-05 1989-08-11 Japan Synthetic Rubber Co Ltd Radiation sensitive coloring resin composition
JPH0572723A (en) * 1991-09-12 1993-03-26 Fuji Photo Film Co Ltd Photosensitive composition

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