BE881956A - Compositions photosensibles et systemes impressionnables comprenant de telles compositions - Google Patents
Compositions photosensibles et systemes impressionnables comprenant de telles compositionsInfo
- Publication number
- BE881956A BE881956A BE0/199576A BE199576A BE881956A BE 881956 A BE881956 A BE 881956A BE 0/199576 A BE0/199576 A BE 0/199576A BE 199576 A BE199576 A BE 199576A BE 881956 A BE881956 A BE 881956A
- Authority
- BE
- Belgium
- Prior art keywords
- compositions
- impressive
- systems
- photosensitive
- photosensitive compositions
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
- G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polymerisation Methods In General (AREA)
- Graft Or Block Polymers (AREA)
- Printing Plates And Materials Therefor (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US1558479A | 1979-02-27 | 1979-02-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
BE881956A true BE881956A (fr) | 1980-08-27 |
Family
ID=21772291
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BE0/199576A BE881956A (fr) | 1979-02-27 | 1980-02-27 | Compositions photosensibles et systemes impressionnables comprenant de telles compositions |
Country Status (10)
Country | Link |
---|---|
JP (1) | JPS55120028A (fr) |
BE (1) | BE881956A (fr) |
BR (1) | BR8001128A (fr) |
CA (1) | CA1144804A (fr) |
DE (1) | DE3007212A1 (fr) |
ES (1) | ES8103397A1 (fr) |
FR (1) | FR2450473A1 (fr) |
GB (1) | GB2044788B (fr) |
NL (1) | NL8001085A (fr) |
ZA (1) | ZA801085B (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111630206A (zh) * | 2018-01-24 | 2020-09-04 | 日本制铁株式会社 | 焊接钢管用防锈处理液、焊接钢管的化学转化处理方法、焊接钢管及焊接钢管的成型产品 |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57141640A (en) * | 1981-02-03 | 1982-09-02 | Konishiroku Photo Ind Co Ltd | Photosensitive image forming material |
JPS57197537A (en) * | 1981-05-29 | 1982-12-03 | Konishiroku Photo Ind Co Ltd | Photosensitive composition |
JPS582847A (ja) * | 1981-06-30 | 1983-01-08 | Konishiroku Photo Ind Co Ltd | 平版印刷版 |
JPS58199341A (ja) * | 1982-05-17 | 1983-11-19 | Tokyo Ohka Kogyo Co Ltd | 耐熱性感光性樹脂組成物 |
JPS5953836A (ja) * | 1982-09-21 | 1984-03-28 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
JPS59101644A (ja) * | 1982-12-01 | 1984-06-12 | Fuji Photo Film Co Ltd | 感光性組成物 |
US4600679A (en) * | 1984-05-25 | 1986-07-15 | W. R. Grace & Co. | Water-developable, negative-working, diazo lithographic printing plate with oleophilic ester overlayer |
DE3425328A1 (de) * | 1984-07-10 | 1986-01-16 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial |
EP0184725B1 (fr) * | 1984-12-06 | 1989-01-04 | Hoechst Celanese Corporation | Composition photosensible |
DE3504658A1 (de) * | 1985-02-12 | 1986-08-14 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches gemisch und damit hergestelltes aufzeichnungsmaterial |
US4851319A (en) * | 1985-02-28 | 1989-07-25 | Hoechst Celanese Corporation | Radiation polymerizable composition, photographic element, and method of making element with diazonium salt, and monofunctional and polyfunctional acrylic monomers |
DE3605717A1 (de) * | 1985-02-28 | 1986-08-28 | Hoechst Celanese Corp., Somerville, N.J. | Durch strahlung polymerisierbares gemisch |
US5080999A (en) * | 1985-06-10 | 1992-01-14 | Fuji Photo Film Co., Ltd. | Light-sensitive diazo resin composition containing a higher fatty acid or higher fatty acid amide |
US5120772A (en) * | 1985-08-02 | 1992-06-09 | Walls John E | Radiation-polymerizable composition and element containing a photopolymerizable mixture |
US4652604A (en) * | 1985-08-02 | 1987-03-24 | American Hoechst Corporation | Radiation-polymerizable composition and element containing a photopolymer composition |
US4772538A (en) * | 1985-08-02 | 1988-09-20 | American Hoechst Corporation | Water developable lithographic composition |
US4780392A (en) * | 1985-08-02 | 1988-10-25 | Hoechst Celanese Corporation | Radiation-polymerizable composition and element containing a photopolymerizable acrylic monomer |
US4707437A (en) * | 1985-08-02 | 1987-11-17 | Hoechst Celanese Corporation | Radiation-polymerizable composition and element containing a photopolymer composition |
US4822720A (en) * | 1985-08-02 | 1989-04-18 | Hoechst Celanese Corporation | Water developable screen printing composition |
DE3528309A1 (de) * | 1985-08-07 | 1987-02-12 | Hoechst Ag | Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial |
JPS6278544A (ja) * | 1985-10-01 | 1987-04-10 | Fuji Photo Film Co Ltd | 感光性組成物 |
JPS62238553A (ja) * | 1986-04-10 | 1987-10-19 | Nippon Foil Mfg Co Ltd | 感光性樹脂組成物 |
US4877711A (en) * | 1986-05-19 | 1989-10-31 | Fuji Photo Film Co., Ltd. | Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group |
DE3644160A1 (de) * | 1986-12-23 | 1988-07-14 | Hoechst Ag | Lichtempfindliches aufzeichnungsmaterial mit einer lichtempfindlichen zwischenschicht |
US4886731A (en) * | 1987-01-05 | 1989-12-12 | Cookson Graphics Inc. | Multilayer photopolymeric printing plates with photoreactive diazo compounds and photopolymerizable compositions |
JPH0727208B2 (ja) * | 1987-04-20 | 1995-03-29 | 富士写真フイルム株式会社 | 感光性組成物 |
DE3738863A1 (de) * | 1987-11-16 | 1989-05-24 | Hoechst Ag | Lichtempfindliche druckplatte fuer den wasserlosen offsetdruck |
US5340681A (en) * | 1988-01-29 | 1994-08-23 | International Paper Company | Method for preparing photographic elements having single photosensitive layer containing photopolymerizable compound, photoinitiator, diazonium compound and barrier material encapsulated pigment particles; and negative image formation process |
US5286594A (en) * | 1988-01-29 | 1994-02-15 | International Paper Company | Photographic elements utilizing a single photosensitive layer containing a photopolymerizable compound, photoinitiator, diazonium compound and barrier material encapsulated pigment particles |
CA2000712A1 (fr) * | 1988-10-21 | 1990-04-21 | Thomas Dunder | Film photopolymerisable negatif de controle des couleurs ne necessitant pas un bain d'oxygene triplet |
DE3903001A1 (de) * | 1989-02-02 | 1990-08-16 | Hoechst Ag | Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial |
CN113105570B (zh) * | 2021-04-12 | 2022-05-03 | 之江实验室 | 一种液体双光子引发剂及其制备方法与应用 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1547849A1 (de) * | 1966-07-13 | 1969-12-11 | Fmc Corp | Lichtempfindliche Masse |
US3905815A (en) * | 1971-12-17 | 1975-09-16 | Minnesota Mining & Mfg | Photopolymerizable sheet material with diazo resin layer |
IT1000315B (it) * | 1972-12-14 | 1976-03-30 | Polychrome Corp | Perfezionamento nelle composizioni monomere diazoiche insature potosensibili |
FI207474A (fr) * | 1973-08-16 | 1975-02-17 | Hercules Inc | |
JPS50108003A (fr) * | 1974-02-01 | 1975-08-26 | ||
JPS50114122A (fr) * | 1974-02-16 | 1975-09-06 | ||
GB1523762A (en) * | 1975-02-25 | 1978-09-06 | Oce Van Der Grinten Nv | Photocopying materials |
US4042386A (en) * | 1976-06-07 | 1977-08-16 | Napp Systems | Photosensitive compositions |
JPS549619A (en) * | 1977-06-23 | 1979-01-24 | Oji Paper Co | Photosensitive composition |
AU526602B2 (en) * | 1977-10-06 | 1983-01-20 | Polychrome Corp. | Lithographic printing plate |
-
1980
- 1980-02-22 NL NL8001085A patent/NL8001085A/nl not_active Application Discontinuation
- 1980-02-25 ES ES488890A patent/ES8103397A1/es not_active Expired
- 1980-02-26 CA CA000346444A patent/CA1144804A/fr not_active Expired
- 1980-02-26 GB GB8006481A patent/GB2044788B/en not_active Expired
- 1980-02-26 FR FR8004164A patent/FR2450473A1/fr not_active Withdrawn
- 1980-02-26 ZA ZA00801085A patent/ZA801085B/xx unknown
- 1980-02-26 DE DE19803007212 patent/DE3007212A1/de not_active Ceased
- 1980-02-26 BR BR8001128A patent/BR8001128A/pt unknown
- 1980-02-27 JP JP2394780A patent/JPS55120028A/ja active Pending
- 1980-02-27 BE BE0/199576A patent/BE881956A/fr not_active IP Right Cessation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111630206A (zh) * | 2018-01-24 | 2020-09-04 | 日本制铁株式会社 | 焊接钢管用防锈处理液、焊接钢管的化学转化处理方法、焊接钢管及焊接钢管的成型产品 |
CN111630206B (zh) * | 2018-01-24 | 2022-04-08 | 日本制铁株式会社 | 焊接钢管用防锈处理液、焊接钢管的化学转化处理方法、焊接钢管及焊接钢管的成型产品 |
Also Published As
Publication number | Publication date |
---|---|
ES488890A0 (es) | 1981-02-16 |
NL8001085A (nl) | 1980-08-29 |
JPS55120028A (en) | 1980-09-16 |
ZA801085B (en) | 1981-07-29 |
GB2044788B (en) | 1983-05-25 |
FR2450473A1 (fr) | 1980-09-26 |
ES8103397A1 (es) | 1981-02-16 |
BR8001128A (pt) | 1980-11-04 |
GB2044788A (en) | 1980-10-22 |
DE3007212A1 (de) | 1980-08-28 |
CA1144804A (fr) | 1983-04-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RE | Patent lapsed |
Owner name: MINNESOTA MINING AND MFG CY Effective date: 19860228 |