JPS63124737U - - Google Patents
Info
- Publication number
- JPS63124737U JPS63124737U JP1521587U JP1521587U JPS63124737U JP S63124737 U JPS63124737 U JP S63124737U JP 1521587 U JP1521587 U JP 1521587U JP 1521587 U JP1521587 U JP 1521587U JP S63124737 U JPS63124737 U JP S63124737U
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor wafer
- coating device
- spin
- spin chuck
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 4
- 239000004065 semiconductor Substances 0.000 claims description 3
- 239000007788 liquid Substances 0.000 claims 2
- 229920002120 photoresistant polymer Polymers 0.000 claims 1
Description
第１図は本考案の第１の実施例を示す平面図、
第２図は同側面図、第３図は従来の塗布装置を示
す側面図、第４図は本考案の第２の実施例を示す
平面図、第５図は同側面図である。
１…半導体ウエーハ、２…スピンチヤツク、３
…スピンカツプ、４…チヤツク回転用モーター、
５，６ａ〜６ｎ…塗布ノズル、７…シリンダー、
８ａ，９ａ…投光器、８ｂ，９ｂ…受光器、１０
…投光部、１１…受光部、Ａ…チヤツク回転中止
位置、Ｂ…心ずれを発生している位置。
FIG. 1 is a plan view showing a first embodiment of the present invention;
2 is a side view of the same, FIG. 3 is a side view of a conventional coating device, FIG. 4 is a plan view of a second embodiment of the present invention, and FIG. 5 is a side view of the same. 1... Semiconductor wafer, 2... Spin chuck, 3
...spin cup, 4...chuck rotation motor,
5, 6a to 6n...application nozzle, 7...cylinder,
8a, 9a... Emitter, 8b, 9b... Light receiver, 10
...Light emitter, 11...Light receiver, A...Chuck rotation stop position, B...Position where misalignment occurs.
Claims (1)
を回転塗布する塗布装置において、スピンチヤツ
クの中心軸をはさんで相対する直径方向の位置に
、スピンチヤツク上に装着された半導体ウエーハ
上に滴下する塗布液のウエーハ中心に対する心ず
れを検出する検出器を設けたことを特徴とする塗
布装置。 In a coating device that spin-coats a drop-in liquid such as photoresist onto a semiconductor wafer, the coating liquid is dropped onto the semiconductor wafer mounted on the spin chuck at diametrically opposite positions across the center axis of the spin chuck. A coating device characterized by being provided with a detector for detecting misalignment with respect to the center of a wafer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1521587U JPH0521863Y2 (en) | 1987-02-04 | 1987-02-04 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1521587U JPH0521863Y2 (en) | 1987-02-04 | 1987-02-04 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63124737U true JPS63124737U (en) | 1988-08-15 |
| JPH0521863Y2 JPH0521863Y2 (en) | 1993-06-04 |
Family
ID=30805941
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1521587U Expired - Lifetime JPH0521863Y2 (en) | 1987-02-04 | 1987-02-04 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0521863Y2 (en) |
-
1987
- 1987-02-04 JP JP1521587U patent/JPH0521863Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0521863Y2 (en) | 1993-06-04 |