JPH0192131U - - Google Patents
Info
- Publication number
- JPH0192131U JPH0192131U JP18693187U JP18693187U JPH0192131U JP H0192131 U JPH0192131 U JP H0192131U JP 18693187 U JP18693187 U JP 18693187U JP 18693187 U JP18693187 U JP 18693187U JP H0192131 U JPH0192131 U JP H0192131U
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor wafer
- photoresist
- wafer
- nozzle
- coating apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002904 solvent Substances 0.000 claims description 3
- 229920002120 photoresistant polymer Polymers 0.000 claims 4
- 239000004065 semiconductor Substances 0.000 claims 4
- 239000011248 coating agent Substances 0.000 claims 2
- 238000000576 coating method Methods 0.000 claims 2
- 238000007599 discharging Methods 0.000 claims 1
- 230000002093 peripheral effect Effects 0.000 claims 1
Landscapes
- Coating Apparatus (AREA)
Description
第１図は本考案の実施例１を示す側面図、第２
図は本考案の実施例１を示す平面図、第３図は本
考案の実施例２を示す側面図、第４図は本考案の
実施例２を示す平面図、第５図は従来のレジスト
除去機構を示す図、第６図はレジストウエハーの
表面に回転塗布したときのレジストの状態を示す
縦断面図である。
１……スピンチヤツク、２……ウエハー、３…
…溶剤ノズル、４……レジスト、５……気体ノズ
ル、６……ノズル支持具、７……ローラー、８…
…リニアスライダー、９……リニアスライダー支
持具、１０……バネ、１１……支持台。
Fig. 1 is a side view showing Embodiment 1 of the present invention;
The figure is a plan view showing Embodiment 1 of the present invention, Fig. 3 is a side view showing Embodiment 2 of the present invention, Fig. 4 is a plan view showing Embodiment 2 of the present invention, and Fig. 5 is a conventional resist. FIG. 6, which shows the removal mechanism, is a vertical sectional view showing the state of the resist when it is spin-coated onto the surface of the resist wafer. 1... spin chuck, 2... wafer, 3...
...Solvent nozzle, 4...Resist, 5...Gas nozzle, 6...Nozzle support, 7...Roller, 8...
... Linear slider, 9 ... Linear slider support, 10 ... Spring, 11 ... Support stand.
Claims (1)
チヤツクと、該半導体ウエハーの中心部にフオト
レジストを滴下するレジストノズルとを備えたフ
オトレジスト塗布装置において、前記ウエハーチ
ヤツク上の半導体ウエハーの周辺部に倣い、フオ
トレジスト溶剤の吐出用溶剤ノズルを半導体ウエ
ハーの周辺部に指向させるノズル保持機構を有す
ることを特徴とするフオトレジスト塗布装置。 In a photoresist coating apparatus equipped with a wafer chuck that holds and rotates a semiconductor wafer, and a resist nozzle that drops photoresist onto the center of the semiconductor wafer, a photoresist solvent is applied along the periphery of the semiconductor wafer on the wafer chuck. 1. A photoresist coating apparatus comprising a nozzle holding mechanism that directs a discharging solvent nozzle toward a peripheral portion of a semiconductor wafer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18693187U JPH0192131U (en) | 1987-12-08 | 1987-12-08 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18693187U JPH0192131U (en) | 1987-12-08 | 1987-12-08 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0192131U true JPH0192131U (en) | 1989-06-16 |
Family
ID=31478126
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18693187U Pending JPH0192131U (en) | 1987-12-08 | 1987-12-08 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0192131U (en) |
-
1987
- 1987-12-08 JP JP18693187U patent/JPH0192131U/ja active Pending